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Semiconductor Equipment - Berenberg Bank

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<strong>Semiconductor</strong> <strong>Equipment</strong><br />

Technology Hardware<br />

exposure to legacy markets such as dielectric etching.<br />

In the table below, we rank the market growth potential of the various markets,<br />

and relevant exposure of each of the key vendors. The vendors with high<br />

exposures to the growing markets are likely to outperform.<br />

Figure 5: Ranking by growth potential<br />

Lithography 18.0%<br />

Deposition - ALD<br />

3D bonding<br />

CAGR<br />

Comment<br />

<strong>Equipment</strong> Vendor's Main market exposure (market share 2012)<br />

2012-2017 ASML ASMI AMAT TEL SUSS KLA LAM<br />

15.0%<br />

14.0%<br />

Deposition - Epitaxy 7.5%<br />

Printing smaller chips requires<br />

leading edge lithography tools<br />

Demand increase as HKMG is<br />

required for 20nm and smaller<br />

node.<br />

Revenue may triple once volume<br />

adoption starts in 2016/17<br />

Extensively used for new chip<br />

designs, such as FinFET, 3D NAND<br />

100%<br />

(74% share)<br />

60%<br />

(44% share)<br />

11%<br />

(89%<br />

share)<br />

6%<br />

(44% share)<br />

13%<br />

(no.1 share)<br />

Process control 6.0%<br />

Demand increases as chip design<br />

gets more complex<br />

9%<br />

(76% share)<br />

100%<br />

(54% share)<br />

Deposition - PE CVD 5.0% Demand driven by 3D NAND<br />

Etching - Silicon 4.0% Demand driven by FinFET, 20nm<br />

19%<br />

(47% share)<br />

8% 8%<br />

(14% share) (9% share)<br />

50%<br />

(59% share)<br />

Photoresist processing 1.4%<br />

Demand decrease as legacy<br />

lithography tool demand declines,<br />

hence total lithography tool<br />

shipment decreases.<br />

34%<br />

(89% share)<br />

Deposition - PVD 0.5% Grow slower than PE CVD<br />

Etching - Dielectric 0.5%<br />

Ion Implanter<br />

Source: Gartner data, <strong>Berenberg</strong> estimates<br />

Demand shifts to silicon etching as<br />

new chip designs like FinFET,<br />

20nm.<br />

-2.5% HKMG require less implant steps<br />

21%<br />

(78% share)<br />

11%<br />

(76% share)<br />

20%<br />

(63% share)<br />

11

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