Semiconductor Equipment - Berenberg Bank
Semiconductor Equipment - Berenberg Bank
Semiconductor Equipment - Berenberg Bank
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<strong>Semiconductor</strong> <strong>Equipment</strong><br />
Technology Hardware<br />
exposure to legacy markets such as dielectric etching.<br />
In the table below, we rank the market growth potential of the various markets,<br />
and relevant exposure of each of the key vendors. The vendors with high<br />
exposures to the growing markets are likely to outperform.<br />
Figure 5: Ranking by growth potential<br />
Lithography 18.0%<br />
Deposition - ALD<br />
3D bonding<br />
CAGR<br />
Comment<br />
<strong>Equipment</strong> Vendor's Main market exposure (market share 2012)<br />
2012-2017 ASML ASMI AMAT TEL SUSS KLA LAM<br />
15.0%<br />
14.0%<br />
Deposition - Epitaxy 7.5%<br />
Printing smaller chips requires<br />
leading edge lithography tools<br />
Demand increase as HKMG is<br />
required for 20nm and smaller<br />
node.<br />
Revenue may triple once volume<br />
adoption starts in 2016/17<br />
Extensively used for new chip<br />
designs, such as FinFET, 3D NAND<br />
100%<br />
(74% share)<br />
60%<br />
(44% share)<br />
11%<br />
(89%<br />
share)<br />
6%<br />
(44% share)<br />
13%<br />
(no.1 share)<br />
Process control 6.0%<br />
Demand increases as chip design<br />
gets more complex<br />
9%<br />
(76% share)<br />
100%<br />
(54% share)<br />
Deposition - PE CVD 5.0% Demand driven by 3D NAND<br />
Etching - Silicon 4.0% Demand driven by FinFET, 20nm<br />
19%<br />
(47% share)<br />
8% 8%<br />
(14% share) (9% share)<br />
50%<br />
(59% share)<br />
Photoresist processing 1.4%<br />
Demand decrease as legacy<br />
lithography tool demand declines,<br />
hence total lithography tool<br />
shipment decreases.<br />
34%<br />
(89% share)<br />
Deposition - PVD 0.5% Grow slower than PE CVD<br />
Etching - Dielectric 0.5%<br />
Ion Implanter<br />
Source: Gartner data, <strong>Berenberg</strong> estimates<br />
Demand shifts to silicon etching as<br />
new chip designs like FinFET,<br />
20nm.<br />
-2.5% HKMG require less implant steps<br />
21%<br />
(78% share)<br />
11%<br />
(76% share)<br />
20%<br />
(63% share)<br />
11