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Semiconductor Equipment - Berenberg Bank

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Suess Microtec AG<br />

Small/Mid-Cap: Technology Hardware<br />

Figure 10: Products used in different end-markets<br />

Front end<br />

Back end<br />

Segment Photomask equipment Lithography<br />

Substrate Bonder<br />

Products used MaskTrack Pro Exposure system Mask Aligher Coater/developer Wafer bonders<br />

Process step Photomask cleaning Stepper, Scanner<br />

Mask Aligner<br />

(proximity exposure)<br />

coating/developing Bond Alignment<br />

(UV projection) Nano imprinting Permanent Bonding<br />

Temporary Bonding<br />

Mask manufacturing<br />

Advanced Packaging<br />

Markets<br />

3D Integration<br />

MEMS<br />

LED<br />

Source: Company data<br />

Mask manufacturing: Photomask equipment is used for cleaning and processing<br />

the photomasks used in the lithography process. SUSS currently holds an 80% share<br />

of the mask cleaning equipment market for ArFi lithography tools. The most<br />

advanced EUV lithography tools require the use of highly sensitive reflecting masks<br />

instead of optical transmission masks, and operators need to use advanced mask<br />

cleaning equipment: SUSS is currently the only provider of EUV mask cleaning<br />

tools.<br />

Advanced packaging (such as flip chip and wafer level packaging): With the<br />

growing spread of Ultrabooks, tablets and smartphones which demand thin, light<br />

designs, advanced packaging is preferred over traditional wire bonding for producing<br />

thin, light designs. Flip chips are used as a cost effective solution for forming<br />

electrical connections with small bump pitches instead of tradition wire. As a result,<br />

the completed chip is much smaller and thinner, and the short wires allow higher<br />

speed data processing. Wafer level packaging allows all steps of integrated circuit<br />

packaging to be performed at wafer level, and reduces the size of the packaging<br />

footprint so that no plastic housing and wires are needed.<br />

3D integration: New 3D integration technology is likely to be developed in parallel<br />

with shrinking as part of the constant requirement for smaller components, and is<br />

expected to drive smaller chip sizes once shrinkage has reached its physical limit. 3D<br />

stacking using through-silicon vias (TSV) is the one of the main 3D integration<br />

solutions being considered. By stacking the chips or wafers on top of each other<br />

instead of laying them out on a planar surface, 3D integration offers the advantages<br />

of shorter signal paths, reduced power consumption, enhanced bandwidths and a<br />

smaller surface area. Thinner wafers are usually required in 3D integration to reduce<br />

the thickness of chips.<br />

MEMS: MEMS are key components for automotive, industrial, medical, aerospace<br />

and consumer electronics. MEMS sensors are used in applications ranging from<br />

gaming, smartphone and medical testing to satellites. The manufacturing process for<br />

MEMS requires highly specialised equipment to create mechanical structures. SUSS<br />

has been supplying equipment to the MEMS industry ever since such products have<br />

been produced in volume.<br />

LED: SUSS solutions are used in three stages of the LED process: the structuring<br />

of substrates, the structuring of LED chips and chip packaging.<br />

87

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