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Semiconductor Equipment - Berenberg Bank

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ASML Holding NV<br />

Technology Hardware<br />

Gross margin expansion<br />

We expect ASML’s group adjusted gross margin to reach 45.9% in 2016 from<br />

41.9% in 2013. The following factors will contribute to this increase.<br />

1. We expect the EUV gross margin to improve after a two-year ramp-up<br />

period: We expect the EUV tools gross margin to reach ~45% in mid-2015,<br />

after volume shipment has begun. The EUV gross margin currently stands at<br />

25%.<br />

2. Intel’s €829m investment in R&D will be recognised in ASML’s gross<br />

margin over the next five years: Based on the level of business activity<br />

between ASML and Intel, we assume that a fifth of Intel’s investment (€166m)<br />

will be included in the figure in 2015, producing a minimum gross margin<br />

contribution in 2016 of 1.8%.<br />

3. We expect the group margin excluding EUV to reach 43.5% in 2016 due<br />

to the increased top line and growth in the high-margin service and software<br />

segment (€1.2bn revenue in 2016 versus €930m in 2012).<br />

4. Cymer’s positive gross margin impact: Cymer’s adjusted gross margin was<br />

56% in Q2 2013, higher than ASML’s average group gross margin (41.8% in<br />

Q2 2013). We expect the Cymer acquisition to lead to a 50bp increase in the<br />

group gross margin by 2016.<br />

We expect that with its current product portfolio, ASML will be able to maintain<br />

its existing profitability level given ASP stability. In addition, chip-makers look at<br />

total cost of ownership – ie the cost saving from a more efficient process or higher<br />

yield rate usually justifies the higher ASPs of new generation tools.<br />

Figure 12: ASML tool ASP will not decrease over time<br />

EUR mn<br />

35<br />

30<br />

25<br />

20<br />

15<br />

10<br />

5<br />

0<br />

2006 2007 2008 2009 2010 2011 2012 2013E 2014E 2015E 2016E<br />

Source: ASML data, <strong>Berenberg</strong> <strong>Bank</strong> estimates<br />

Source: AMSL data, <strong>Berenberg</strong> estimates<br />

ArFi NXT:1950i roadmap: 2011 2012 extensions 2013+ extensions<br />

Matched Machine Overlay 5.5nm 4.5nm 3.5nm<br />

On Product Overlay 9nm 6nm 4nm<br />

CDU 3nm 1.5nm 1nm<br />

Total focus control budget 110nm 90nm 70nm<br />

Throughput 190WPH 230WPH 250WPH<br />

Defects 10 defects/wafer 10 defects/wafer

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