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Ion Implantation and Synthesis of Materials - Studium

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114 9 Doping, Diffusion <strong>and</strong> Defects in <strong>Ion</strong>-Implanted Si9.2 Defects<strong>Ion</strong> implantation <strong>and</strong> subsequent thermal processing will form defects. Defectsmay be categorized as (1) point defects, (2) line defects, (3) planar defects, <strong>and</strong> (4)volume defects. Table 9.1 lists examples <strong>of</strong> these four types <strong>of</strong> defects, <strong>and</strong>Fig. 9.7 shows schematically some <strong>of</strong> the point defects in a two-dimensionalsimple cubic lattice.9.2.1 Point DefectsA point defect is a deviation in the periodicity <strong>of</strong> the lattice arising from a singlepoint. Other defects, such as dislocations <strong>and</strong> stacking faults, extend over manylattice sites. Point defects may form due to nonequilibrium conditions such asthose that occur during crystal growth or during thermal or mechanical processing<strong>of</strong> the material. Point defects may be categorized as (1) native defects, such as avacancy, <strong>and</strong> (2) impurity-related defects due to the introduction <strong>of</strong> an impurityatom into the lattice. For semiconductors, point defects not only cause structuraldisturbances but also <strong>of</strong>ten introduce electronic states in the b<strong>and</strong> gap. If anattractive potential exists between a native defect <strong>and</strong> an impurity atom, they mayinteract <strong>and</strong> form a defect complex, such as a vacancy-impurity pair.9.2.2 Native Defects <strong>and</strong> Shallow DopantsFor Si, there are three types <strong>of</strong> native defects: the vacancy, the interstitial, <strong>and</strong>the interstitialcy. The vacancy, V, is an empty lattice site. Depending on theconfiguration <strong>of</strong> the unsatisfied bonds due to the missing atom, a vacancy in Sican be either neutral, negatively or positively charged. A vacancy is also referredto as a Schottky defect. A Si atom residing in the interstices <strong>of</strong> the Si lattice isdefined as a self-interstitial. A Frenkel pair is a vacancy-interstitial pair formedwhen an atom is displaced from a lattice site to an interstitial site. An interstitialcyTable 9.1. Defects in SemiconductorsDefect typePointLinePlanarVolumeExamplesvacancies, interstitials, impurity atoms, antisite defectsdislocationsstacking faults, twins, <strong>and</strong> grain boundariesprecipitates <strong>and</strong> voids

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