Ion Implantation and Synthesis of Materials - Studium

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250 Table <strong>of</strong> the elementselement atomic isotopic relative atomic weight atomic massnumber mass abundance (amu) density density(Z) (amu)(atoms cm −3 ) (g cm −3 )Tb 65 158.9253 100 158.92534 3.13 × 10 22 8.27Dy 66 155.9243 0.06 162.5 3.16 × 10 22 8.53157.9244 0.1159.9252 2.34160.9269 18.9161.9268 25.5162.9287 24.9163.9292 28.2Ho 67 164.9303 100 164.93032 3.21 × 10 22 8.80Er 68 161.9288 0.14 167.26 3.26 × 10 22 9.05163.9292 1.61165.9303 33.6166.9320 22.95167.9324 26.8169.9355 14.9Tm 69 168.9342 100 168.93421 3.33 × 10 22 9.33Yb 70 167.9339 0.13 173.04 2.43 × 10 22 6.98169.9348 3.05170.9363 14.30171.9364 21.90
Appendix A 251element atomicnumber(Z)isotopicmass(amu)relativeabundance172.9382 16.12atomic weight(amu)atomicdensity(atoms cm −3 )massdensity(g cm −3 )173.9389 31.80175.9426 12.70Lu 71 174.9408 97.4 174.967 3.39 × 10 22 9.84175.9427 2.6Hf 72 173.9400 0.16 178.49 4.42 × 10 22 13.1175.9414 5.20176.9432 18.60177.9437 27.10178.9458 13.74179.9465 35.20Ta 73 179.9475 0.012 180.9479 5.52 × 10 22 16.6180.9480 99.988W 74 179.9467 0.13 183.85 6.32 × 10 22 19.3181.9482 26.30182.9502 14.30183.9509 30.67185.9544 28.60Re 75 184.9530 37.4 186.207 6.79 × 10 22 21.0186.9557 62.6
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M. Nastasi J.W. MayerIon Implantati
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To our loved ones
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xContents4 Cross-Section ..........
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Contentsxiii14.3.2 Punch-Through St
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2 1 General Features and Fundamenta
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10 1 General Features and Fundament
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12 2 Particle InteractionsThe restr
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142 Particle Interactions(a)V(r)r 0
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162 Particle InteractionsHowever, a
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182 Particle Interactionswhere the
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202 Particle Interactionsa0.8853a0L
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3 Dynamics of Binary Elastic Collis
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3.3 Kinematics of Elastic Collision
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3.4 Center-of-Mass Coordinates 27Fi
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3.4 Center-of-Mass Coordinates 29an
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3.5 Motion under a Central Force 31
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3.5 Motion under a Central Force 33
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Problems 35The reduced energy for 1
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4 Cross-Section4.1 IntroductionIn C
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4.2 Scattering Cross-Section 39unit
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4.2 Scattering Cross-Section 41Rdθ
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4.3 Energy-Transfer Cross-Section 4
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4.4 Approximation to the Energy-Tra
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Problems 47ReferencesNastasi, M., M
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5 Ion Stopping5.1 IntroductionWhen
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5.3 Nuclear Stopping 51MeV mg −1
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5.3 Nuclear Stopping 531−m1−2mC
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5.4 ZBL Nuclear Stopping Cross-Sect
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5.5 Electronic Stopping 575.5.1 Hig
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5.5 Electronic Stopping 59Table 5.1
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Problems 61Problems5.1 Calculate th
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64 6 Ion Range and Range Distributi
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78 7 Displacements and Radiation Da
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94 8 Channeling1.00.8Non-aligned Im
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96 8 ChannelingMeV ION BEAMSUBSTITU
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98 8 ChannelingThe channeling effec
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100 8 Channeling4.0Silicon2.0P (mic
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102 8 ChannelingdσσD( ψc) = ∫
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104 8 ChannelingDechanneled fractio
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106 8 ChannelingProblems8.1 Calcula
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108 9 Doping, Diffusion and Defects
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128 10 Crystallization and Regrowth
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144 11 Si Slicing and Layer Transfe
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160 12 Surface Erosion During Impla
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180 13 Ion-Induced Atomic Intermixi
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194 14 Application of Ion Implantat
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Page 247 and 248: References 237No. of implants504540
Page 249 and 250: Appendix ATable of the Elementselem
Page 251 and 252: Appendix A 241elementatomicnumber(Z
Page 253 and 254: Appendix A 243element atomicnumber(
Page 259: Appendix A 249element atomicnumber(
Page 265 and 266: Appendix BPhysical constants, conve
Page 267 and 268: IndexAlpha particle 8amorphization
Page 269 and 270: Index 259differential cross-section
Page 271 and 272: Index 261layer transfer 143Lennard-
Page 273: Index 263thermodynamiceffect ion be
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