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Ion Implantation and Synthesis of Materials - Studium

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15 <strong>Ion</strong> <strong>Implantation</strong> in CMOS Technology:Machine ChallengesContributed by Aditya Agarwal 1 , Hans-Joachim Gossmann 1 , MichaelGraf, Thomas Parrill 2 , Leonard Rubin, <strong>and</strong> John Poate 3 (AxcelisTechnologies, Inc.)15.1 IntroductionThe history <strong>of</strong> ion implantation in semiconductors stretches back some 50 years.The first published report <strong>of</strong> the bombardment <strong>of</strong> semiconductor surfaces tochange electrical properties appears to be that <strong>of</strong> Ohl at Bell Laboratories in 1952(Ohl 1952). Shockley, at the same institution in 1954, filed a remarkably propheticpatent in which he detailed the doping possibilities <strong>of</strong> implanting donor oracceptor impurities to control the electrical properties (Shockley 1954). Thispatent basically describes the art as it is practiced today, including the annealing toremove damage <strong>and</strong> diffuse the dopant. There was much worldwide research inthe 1960s investigating the implantation phenomenon, but the technique was notwidely accepted into production until the 1970s. It was then that the value <strong>of</strong>implantation for threshold voltage adjustment <strong>and</strong> highly doped, self-alignedstructures contributed significantly to the integrated circuit (IC) revolution.The sophistication <strong>of</strong> implant machines <strong>and</strong> the devices they producehave evolved continuously over the past 50 years, <strong>and</strong> this chapter will give aflavor <strong>of</strong> the state-<strong>of</strong>-the-art <strong>of</strong> the technology <strong>and</strong> current challenges. At the sametime, the economic challenges or drivers cannot be overemphasized. Economicshave been an important factor in ion implantation from its inception in chipmanufacturing because the implanter cost was incremental to the diffusionsystems with which implant competed (McKenna 2000; Rose 1985).Silicon technology drives the modern world. A manifestation <strong>of</strong> its importanceis Moore’s Law, which describes the continuous shrinking <strong>of</strong> devices to improveperformance <strong>and</strong> cost. Tremendous investment is required to meet the dem<strong>and</strong>s <strong>of</strong>1Advanced Micro Devices, Inc.2Varian Semiconductor Equipment Associates3Colorado School <strong>of</strong> Mines213

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