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Ion Implantation and Synthesis of Materials - Studium

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182 13 <strong>Ion</strong>-Induced Atomic Intermixing at the Interface: <strong>Ion</strong> Beam MixingFig. 13.3. An example <strong>of</strong> mass <strong>and</strong> dose effects in the ion mixing <strong>of</strong> Pt/Si. Mixing increaseswith both increasing mass <strong>of</strong> the incident ion <strong>and</strong> increasing dose φ. The mixing rate for allirradiating ions is proportional to φ 1/2 (from Tsaur et al. 1979)critical temperature the mixing is very temperature-dependent. This behavior canbe seen in Fig. 13.4 for the case <strong>of</strong> Cr/Si irradiated with 300 keV Xe ions to a dose<strong>of</strong> 1 × 10 16 cm −2 . For temperatures below 0°C, the amount <strong>of</strong> mixing that occursis relatively insensitive to the sample temperature during irradiation; thistemperature interval is known as the temperature-independent ion mixing regime.However, as the sample temperature is increased to above ~100°C, the mixingrate changes rapidly with temperature <strong>and</strong> is observed to increase with increasingtemperature; this temperature interval is known as the temperature-dependent ionmixing regime.13.2 Ballistic MixingThe interaction <strong>of</strong> an energetic ion with a solid involves several processes. As an ionpenetrates a solid, it slows down by depositing energy both to the atoms <strong>and</strong> tothe electrons <strong>of</strong> the solid. During the nuclear collision portion <strong>of</strong> this process, target

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