Ion Implantation and Synthesis of Materials - Studium

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256 Appendix Bconversions1 nm = 10 −9 m = 1 Å = 10 −7 cm1 eV = 1.602 × 10 −19 J = 1.602 × 10 −12 erg1 eV per particle = 23.06 kcal mol −1 = 96.5 kJ mol −11 N = 0.102 kgf (kilogram force)10 6 N m −2 = 146 psi = 10 7 dyne cm −21 µm = 10 −4 cm0.001 in. = 1 mil = 25.4 µm1 bar = 10 6 dyne cm −2 = 10 5 N m −21 Wb m −2 = 10 4 gauss = 1 T1 Pa = 1 N m −2 = 7.5 × 10 −3 torr1 erg = 10 −7 J = 1 dyne cm1 calorie = 4.184 J1 J = 1 N m = 1 W s
IndexAlpha particle 8amorphization 128amorphouscrystallization kinetics 138phase 117Si 127solid 3analyzer magnet 216angular differential scatteringcross-section 37momentum 31anomalous dopant diffusion 195areal density 6atomicdensities 5, 7jump frequency 124mass unit 8number 2volume 6Avogadro’s number 6Backscattered particles 94base 109beamline architectures 215beamangular alignment 232blow-up 208ribbon 234scan mechanism 234shadowing effect 208size expansion 216steering 232transport 223travel path length effect 234utilization 226binary collisions 23binding energy 12bipolar transistor 109amplifier 110switch 110Bohratom 8radius 9, 15screening length 19velocity 9Calculationsprojected range 69range 67straggling 70cascade 86energy 127ion beam mixing 184temperature 87center-<strong>of</strong>-masscoordinates 27total energy 29velocity 28central forceenergy conservation 31force field 12motion 30centrifugal energy 32channel area 102channeling 93critical angle 95, 97damage 105dechanneling 98, 100defects 94distribution 93energy loss 97implantation 93, 102impurity atoms 94ion trajectories 97maximum range 99measurements 130range 93scattering yield 94charge neutralization 208classical theory, scattering 24257
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M. Nastasi J.W. MayerIon Implantati
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To our loved ones
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xContents4 Cross-Section ..........
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Contentsxiii14.3.2 Punch-Through St
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2 1 General Features and Fundamenta
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10 1 General Features and Fundament
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12 2 Particle InteractionsThe restr
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142 Particle Interactions(a)V(r)r 0
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162 Particle InteractionsHowever, a
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182 Particle Interactionswhere the
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202 Particle Interactionsa0.8853a0L
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3 Dynamics of Binary Elastic Collis
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3.3 Kinematics of Elastic Collision
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3.4 Center-of-Mass Coordinates 27Fi
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3.4 Center-of-Mass Coordinates 29an
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3.5 Motion under a Central Force 31
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3.5 Motion under a Central Force 33
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Problems 35The reduced energy for 1
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4 Cross-Section4.1 IntroductionIn C
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4.2 Scattering Cross-Section 39unit
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4.2 Scattering Cross-Section 41Rdθ
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4.3 Energy-Transfer Cross-Section 4
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4.4 Approximation to the Energy-Tra
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Problems 47ReferencesNastasi, M., M
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5 Ion Stopping5.1 IntroductionWhen
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5.3 Nuclear Stopping 51MeV mg −1
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5.3 Nuclear Stopping 531−m1−2mC
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5.4 ZBL Nuclear Stopping Cross-Sect
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5.5 Electronic Stopping 575.5.1 Hig
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5.5 Electronic Stopping 59Table 5.1
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Problems 61Problems5.1 Calculate th
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64 6 Ion Range and Range Distributi
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78 7 Displacements and Radiation Da
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94 8 Channeling1.00.8Non-aligned Im
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96 8 ChannelingMeV ION BEAMSUBSTITU
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98 8 ChannelingThe channeling effec
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100 8 Channeling4.0Silicon2.0P (mic
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102 8 ChannelingdσσD( ψc) = ∫
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104 8 ChannelingDechanneled fractio
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106 8 ChannelingProblems8.1 Calcula
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108 9 Doping, Diffusion and Defects
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128 10 Crystallization and Regrowth
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144 11 Si Slicing and Layer Transfe
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160 12 Surface Erosion During Impla
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180 13 Ion-Induced Atomic Intermixi
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194 14 Application of Ion Implantat
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Page 247 and 248: References 237No. of implants504540
Page 249 and 250: Appendix ATable of the Elementselem
Page 251 and 252: Appendix A 241elementatomicnumber(Z
Page 253 and 254: Appendix A 243element atomicnumber(
Page 265: Appendix BPhysical constants, conve
Page 269 and 270: Index 259differential cross-section
Page 271 and 272: Index 261layer transfer 143Lennard-
Page 273: Index 263thermodynamiceffect ion be
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