PCT/2002/18 - World Intellectual Property Organization
PCT/2002/18 - World Intellectual Property Organization
PCT/2002/18 - World Intellectual Property Organization
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<strong>18</strong>/<strong>2002</strong><br />
8692 <strong>PCT</strong> Gazette - Section I - Gazette du <strong>PCT</strong> 2 May/mai <strong>2002</strong><br />
Tokyo 144-8510 (JP). SAKAMOTO,<br />
Hideyuki [JP/JP]; c/o Ebara Corporation,<br />
11-1, Haneda Asahi-cho, Ohta-ku, Tokyo<br />
144-8510 (JP). OKABE, Michio [JP/JP]; c/o<br />
Daido Tokushuko Kabushiki Kaisha, 2-30,<br />
Daido-cho, Minami-ku, Nagoya-shi, Aichi<br />
457-8545 (JP). SAWADA, Yoshiyuki [JP/JP];<br />
c/o Daido Tokushuko Kabushiki Kaisha, 10,<br />
Ryugu-cho, Minato-ku, Nagoya-shi, Aichi<br />
455-0022 (JP). UETA, Shigeki [JP/JP]; c/o<br />
Daido Tokushuko Kabushiki Kaisha, 2-30,<br />
Daido-cho, Minami-ku, Nagoya-shi, Aichi<br />
457-8545 (JP).<br />
(74) WATANABE, Isamu et al. / etc.; GOWA<br />
Nishi-Shinjuku 4F, 5-8, Nishi-Shinjuku<br />
7-chome, Shinjuku-ku, Tokyo 160-0023 (JP).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EC EE ES FI GB GD GE GH GM<br />
HR HU ID IL IN IS KE KG KP KR KZ LC<br />
LK LR LS LT LU LV MA MD MG MK MN<br />
MW MX MZ NO NZ PH PL PT RO RU SD<br />
SE SG SI SK SL TJ TM TR TT TZ UA UG<br />
US UZ VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GQ GW ML<br />
MR NE SN TD TG).<br />
(51) 7 C22C 38/12<br />
(11) WO 02/34957<br />
(21) <strong>PCT</strong>/JP01/05210<br />
(13) A1<br />
(22) 19 Jun/juin 2001 (19.06.2001)<br />
(25) ja (26) ja<br />
(30) 2000-326149 25 Oct/oct 2000<br />
(25.10.2000)<br />
JP<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) SINTERED SPROCKET<br />
ROUE DENTEE SINTERISEE<br />
(71) HONDA GIKEN KOGYO KABUSHIKI<br />
KAISHA [JP/JP]; 1-1, Minami-Aoyama<br />
2-chome, Minato-ku, Tokyo 107-0062 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) FUJIWARA, Akira [JP/JP]; c/o<br />
Kabushiki Kaisha Honda Gijutsu Kenkyusho,<br />
4-1, Chuo 1-chome, Wako-shi, Saitama<br />
351-0113 (JP).<br />
(74) SUENARI, Mikio; Hitachi 6th Building 4th<br />
floor, 6-14, Kyobashi 2-chome, Chuo-ku,<br />
Tokyo 104-0031 (JP).<br />
(81) BR CA CN US.<br />
(84) EP (DE FR GB).<br />
(51) 7 C22C 38/38<br />
(11) WO 02/34958<br />
(21) <strong>PCT</strong>/IB01/02009<br />
(13) A1<br />
(22) 26 Oct/oct 2001 (26.10.2001)<br />
(25) en (26) en<br />
(30) 00 125769.2 26 Oct/oct 2000<br />
(26.10.2000)<br />
CN<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) IRON-MANGANESE-SILICON-BASED<br />
SHAPE MEMORY ALLOYS CONTAIN-<br />
ING CHROMIUM AND NITROGEN<br />
ALLIAGES A MEMOIRE A BASE<br />
DE SILICONE-MANGANESE-FER<br />
CONTENANT DU CHROME ET DE<br />
L’AZOTE<br />
(71) EMERSON ELECTRIC (CHINA)<br />
HOLDINGS CO. LTD. [CN/CN]; 10th<br />
floor, Pidemco Tower, 3<strong>18</strong> Fuzhou Road,<br />
Shanghai (CN).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) ZUYAO, Xu [CN/CN]; School of Materials<br />
Science and Engineering, Shanghai<br />
Jiao Tong University, 1954 Huashan Road,<br />
Shanghai 200030 (CN). SHIPU, Chen<br />
[CN/CN]; School of Materials Science and<br />
Engineering, Shanghai Jiao Tong University,<br />
1954 Huashan Road, Shanghai 200030 (CN).<br />
JAINFENG, Wan [CN/CN]; School of Materials<br />
Science and Engineering, Shanghai<br />
Jiao Tong University, 1954 Huashan Road,<br />
Shanghai 200030 (CN). ZHENGHONG,<br />
Guo [CN/CN]; School of Materials Science<br />
and Engineering, Shanghai Jiao Tong University,<br />
1954 Huashan Road, Shanghai 200030<br />
(CN). JIHUA, Zhang [CN/CN]; School of<br />
Materials Science and Engineering, Shanghai<br />
Jiao Tong University, 1954 Huashan Road,<br />
Shanghai 200030 (CN). YONGHUA, Rong<br />
[CN/CN]; School of Materials Science and<br />
Engineering, Shanghai Jiao Tong University,<br />
1954 Huashan Road, Shanghai 200030 (CN).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EC EE ES FI GB GD GE GH GM<br />
HR HU ID IL IN IS JP KE KG KP KR KZ<br />
LC LK LR LS LT LU LV MA MD MG MK<br />
MN MW MX MZ NO NZ OM PH PL PT RO<br />
RU SD SE SG SI SK SL TJ TM TR TT TZ<br />
UA UG US UZ VN YU ZA ZW.<br />
Published / Publiée :(c)<br />
Declaration / Déclaration :<br />
(u) for / pour US only / seulement<br />
(51) 7 C23C 16/00<br />
(11) WO 02/34959<br />
(21) <strong>PCT</strong>/IL01/00990<br />
(13) A2<br />
(22) 25 Oct/oct 2001 (25.10.2001)<br />
(25) en (26) en<br />
(30) 139266 25 Oct/oct 2000<br />
(25.10.2000)<br />
IL<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) A METHOD AND APPARATUS<br />
FOR PRODUCING INORGANIC<br />
FULLERENE-LIKE NANOPARTICLES<br />
PROCEDE ET APPAREIL DE PRO-<br />
DUCTION DE NANOPARTICULES<br />
INORGANIQUES DE TYPE FULLE-<br />
RENE<br />
(71) YEDA RESEARCH AND DEVELOP-<br />
MENT CO. LTD. [IL/IL]; at The Weizmann<br />
Institute of Science, P.O. Box 95, 76100<br />
Rehovot (IL).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) TENNE, Reshef [IL/IL]; 21 Hashomrin<br />
Street, 76231 Rehovot (IL). FELD-<br />
MAN, Yishay [IL/IL]; 30 Hapalmach<br />
Street, 77391 Ashdod (IL). ZAK, Alla<br />
[IL/IL]; 43B Gordon Street, 76287 Rehovot<br />
(IL). ROSENTSVEIG, Rita [IL/IL]; 22/26<br />
Gluskin Street, 76273 Rehovot (IL).<br />
(74) REINHOLD COHN AND PARTNERS;<br />
P.O. Box 4060, 61040 Tel Aviv (IL).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EC EE ES FI GB GD GE GH GM<br />
HR HU ID IL IN IS JP KE KG KP KR KZ<br />
LC LK LR LS LT LU LV MA MD MG MK<br />
MN MW MX MZ NO NZ PH PL PT RO RU<br />
SD SE SG SI SK SL TJ TM TR TT TZ UA<br />
UG US UZ VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GQ GW ML<br />
MR NE SN TD TG).<br />
(51) 7 C23C 16/00<br />
(11) WO 02/34960 (13) A2<br />
(21) <strong>PCT</strong>/US01/49681<br />
(22) 19 Oct/oct 2001 (19.10.2001)<br />
(25) en (26) en<br />
(30) 09/698,522 27 Oct/oct 2000 US<br />
(27.10.2000)<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) METHODS FOR SYNTHESIZING<br />
HIGH-EFFICIENCY DIAMOND AND<br />
MATERIAL AND DIAMOND MATE-<br />
RIAL PRODUCED THEREBY<br />
PROCEDES DE SYNTHESE D’UNE<br />
MATIERE ET D’UN DIAMANT A<br />
HAUTE EFFICACITE, MATIERE DE<br />
DIAMANT AINSI PRODUITE<br />
(71) P1 DIAMOND, INC. [US/US]; 3571<br />
Leonard Court, Santa Clara, CA 95054 (US).<br />
(72) PINNEO, John, M.; 124 Santa Maria Avenue,<br />
Portola Valley, CA 94028 (US).<br />
(74) D’ALESSANDRO, Kenneth et al. / etc.;<br />
Sierra Patent Group, Ltd., P.O. Box 6149,<br />
Stateline, NV 89449 (US).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CR CU CZ DE DK DM<br />
DZ EE ES FI GB GD GE GH GM HR HU<br />
ID IL IN IS JP KE KG KP KR KZ LC LK<br />
LR LS LT LU LV MA MD MG MK MN MW<br />
MX MZ NO NZ PL PT RO RU SD SE SG SI<br />
SK SL TJ TM TR TT TZ UA UG UZ VN YU<br />
ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GQ GW ML<br />
MR NE SN TD TG).<br />
(51) 7 C23C 16/06, 14/34, B05D 3/02<br />
(11) WO 02/34961<br />
(21) <strong>PCT</strong>/US01/32568<br />
(13) A1<br />
(22) <strong>18</strong> Oct/oct 2001 (<strong>18</strong>.10.2001)<br />
(25) en (26) en<br />
(30) 09/695,509 24 Oct/oct 2000<br />
(24.10.2000)<br />
US<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) VACUUM METALIZATION PROCESS<br />
FOR CHROMING SUBSTRATES<br />
PROCEDE DE METALLISATION SOUS<br />
VIDE POUR LE CHROMAGE DE SUB-<br />
STRATS