PCT/2002/18 - World Intellectual Property Organization
PCT/2002/18 - World Intellectual Property Organization
PCT/2002/18 - World Intellectual Property Organization
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<strong>18</strong>/<strong>2002</strong><br />
2 May/mai <strong>2002</strong> <strong>PCT</strong> Gazette - Section I - Gazette du <strong>PCT</strong> 8693<br />
(71) GOODRICH TECHNOLOGY CORPO-<br />
RATION [US/US]; 670-A Garcia Avenue,<br />
Pittsburg, CA 94565 (US).<br />
(72) GARY, D., Goodrich; 5008 Brookhaven<br />
Way, Antioch, CA 94565 (US).<br />
(74) EGGINK, Anthony, G.; 3100 First National<br />
Bank Bldg., 332 Minnesota Street, Saint Paul,<br />
MN 55101 (US).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EC EE ES FI GB GD GE GH GM<br />
HR HU ID IL IN IS JP KE KG KP KR KZ<br />
LC LK LR LS LT LU LV MA MD MG MK<br />
MN MW MX MZ NO NZ PH PL PT RO RU<br />
SD SE SG SI SK SL TJ TM TR TT TZ UA<br />
UG UZ VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GQ GW ML<br />
MR NE SN TD TG).<br />
(51) 7 C23C <strong>18</strong>/16, H01L 21/288, 21/768<br />
(11) WO 02/34962<br />
(21) <strong>PCT</strong>/JP01/09337<br />
(13) A1<br />
(22) 24 Oct/oct 2001 (24.10.2001)<br />
(25) ja (26) ja<br />
(30) 2000-327800 26 Oct/oct 2000<br />
(26.10.2000)<br />
JP<br />
(30) 2000-376<strong>18</strong>9 11 Dec/déc 2000<br />
(11.12.2000)<br />
JP<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) DEVICE AND METHOD FOR ELEC-<br />
TROLESS PLATING<br />
DISPOSITIF ET PROCEDE POUR DE-<br />
POT AUTOCATALYTIQUE<br />
(71) EBARA CORPORATION [JP/JP]; 11-1,<br />
Haneda Asahi-cho, Ohta-ku, Tokyo 144-8510<br />
(JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) HONGO, Akihisa [JP/JP]; 46-23,<br />
Zenbu-cho, Asahi-ku, Yokohama-shi,<br />
Kanagawa 241-0823 (JP). MISHIMA,<br />
Koji [JP/JP]; 3-22-9, Mirokuji, Fujisawa-shi,<br />
Kanagawa 251-0016 (JP). IN-<br />
OUE, Hiroaki [JP/JP]; 4-17-<strong>18</strong>, Tamagawagakuen,<br />
Machida-shi, Tokyo 194-0041 (JP).<br />
KIMURA, Norio [JP/JP]; 1-5-11-408, Kugenuma<br />
Shinmei, Fujisawa-shi, Kanagawa<br />
251-0021 (JP). KARIMATA, Tsutomu<br />
[JP/JP]; Ebarashataku 3207-723, 3-2-3, Shiomidai,<br />
Isogo-ku, Yokohama-shi, Kanagawa<br />
235-0022 (JP).<br />
(74) WATANABE, Isamu et al. / etc.; GOWA<br />
Nishi-Shinjuku 4F, 5-8, Nishi-Shinjuku<br />
7-chome, Shinjuku-ku, Tokyo 160-0023 (JP).<br />
(81) KR US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
(51) 7 C23C <strong>18</strong>/16, H01L 21/288, 21/768<br />
(11) WO 02/34963 (13) A1<br />
(21) <strong>PCT</strong>/JP01/09338<br />
(22) 24 Oct/oct 2001 (24.10.2001)<br />
(25) ja (26) ja<br />
(30) 2000-327798 26 Oct/oct 2000<br />
(26.10.2000)<br />
JP<br />
(30) 2000-327801 26 Oct/oct 2000<br />
(26.10.2000)<br />
JP<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) DEVICE AND METHOD FOR PLATING<br />
DISPOSITIF ET PROCEDE POUR DE-<br />
POT ELECTROLYTIQUE<br />
(71) EBARA CORPORATION [JP/JP]; 11-1,<br />
Haneda Asahi-cho, Ohta-ku, Tokyo 144-8510<br />
(JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) INOUE, Hiroaki [JP/JP]; 4-17-<strong>18</strong>,<br />
Tamagawagakuen, Machida-shi, Tokyo<br />
194-0041 (JP). MISHIMA, Koji [JP/JP];<br />
3-22-9, Mirokuji, Fujisawa-shi, Kanagawa<br />
251-0016 (JP). KARIMATA, Tsutomu<br />
[JP/JP]; Ebarashataku 3207-723, 3-2-3,<br />
Shiomidai, Isogo-ku, Yokohama-shi, Kanagawa<br />
235-0022 (JP). NAKAMURA, Kenji<br />
[JP/JP]; 1-4-14, Tsujido Higashikaigan, Fujisawa-shi,<br />
Kanagawa 251-0045 (JP). MAT-<br />
SUMOTO, Moriji [JP/JP]; 2-14-23-302,<br />
Honfujisawa, Fujisawa-shi, Kanagawa<br />
251-0875 (JP). KUNISAWA, Junji [JP/JP];<br />
1-7-2-307, Kamisouyagi, Yamato-shi, Kanagawa<br />
242-0029 (JP).<br />
(74) WATANABE, Isamu et al. / etc.; GOWA<br />
Nishi-Shinjuku 4F, 5-8, Nishi-Shinjuku<br />
7-chome, Shinjuku-ku, Tokyo 160-0023 (JP).<br />
(81) KR US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
(51) 7 C23C <strong>18</strong>/32, <strong>18</strong>/36<br />
(11) WO 02/34964 (13) A1<br />
(21) <strong>PCT</strong>/DE01/04014<br />
(22) 25 Oct/oct 2001 (25.10.2001)<br />
(25) de (26) de<br />
(30) 100 52 960.7 25 Oct/oct 2000 DE<br />
(25.10.2000)<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) LEADFREE CHEMICAL NICKEL AL-<br />
LOY<br />
ALLIAGE DE NICKEL OBTENU CHI-<br />
MIQUEMENT, EXEMPT DE PLOMB<br />
(71) AHC OBBERFLÄCHENTECHNIK<br />
GMBH & CO. OHG [DE/DE]; Boelckestr.<br />
25-57, 50171 Kerpen (DE).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) HOLLÄNDER, Alfons [DE/DE]; Am<br />
Langen Weiher, 50170 Kerpen-Buir (DE).<br />
BECKER, Heinz-Peter [DE/DE]; Marienstr.<br />
34, 50171 Kerpen (DE).<br />
(74) DUNKELBERG, Oliver; Brandenburg<br />
Dunkelberg & Franke, Partnerschaft Patentanwälte,<br />
Trarbacher Strasse 21, 47259<br />
Duisburg (DE).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DK DM<br />
DZ EC EE ES FI GB GD GE GH GM HR HU<br />
ID IL IN IS JP KE KG KP KR KZ LC LK LR<br />
LS LT LU LV MA MD MG MK MN MW MX<br />
MZ NO NZ PH PL PT RO RU SD SE SG SI<br />
SK SL TJ TM TR TT TZ UA UG US UZ VN<br />
YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GQ GW ML<br />
MR NE SN TD TG).<br />
Published / Publiée :(c)<br />
(51) 7 C23C 22/00, C01F 5/02, C21D 9/46, 1/70<br />
(11) WO 02/34965 (13) A1<br />
(21) <strong>PCT</strong>/JP01/09354<br />
(22) 25 Oct/oct 2001 (25.10.2001)<br />
(25) ja (26) ja<br />
(30) 2000-325274 25 Oct/oct 2000 JP<br />
(25.10.2000)<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) MAGNESIUM OXIDE PARTICLE AG-<br />
GREGATE<br />
AGREGAT DE PARTICULES A BASE<br />
D’OXYDE DE MAGNESIUM<br />
(71) TATEHO CHEMICAL INDUSTRIES<br />
CO., LTD. [JP/JP]; 974, Aza Kato, Kariya,<br />
Ako-shi, Hyogo 678-0239 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) TOUTSUKA, Atsuo [JP/JP]; c/o<br />
TATEHO CHEMICAL INDUSTRIES CO.,<br />
LTD., 974, Aza Kato, Kariya, Ako-shi,<br />
Hyogo 678-0239 (JP). HIRATSU, Yutaka<br />
[JP/JP]; c/o TATEHO CHEMICAL INDUS-<br />
TRIES CO., LTD., 974, Aza Kato, Kariya,<br />
Ako-shi, Hyogo 678-0239 (JP).<br />
(74) TSUKUNI, Hajime; SVAX TS Bldg., 22-12,<br />
Toranomon 1-chome, Minato-ku, Tokyo 105-<br />
0001 (JP).<br />
(81) AE AG AL AU BA BB BG BR BZ CA CN<br />
CO CR CU CZ DM DZ EC EE GD GE HR<br />
HU ID IL IN IS JP KR LC LK LR LT LV MA<br />
MG MK MN MX NO NZ PH PL RO SG SI<br />
SK TT UA US UZ VN YU ZA.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GQ GW ML<br />
MR NE SN TD TG).<br />
(51) 7 C23C 24/00<br />
(11) WO 02/34966<br />
(21) <strong>PCT</strong>/JP01/09305<br />
(13) A1<br />
(22) 23 Oct/oct 2001 (23.10.2001)<br />
(25) ja (26) ja<br />
(30) 2000-322843 23 Oct/oct 2000<br />
(23.10.2000)<br />
JP<br />
(43) 2 May/mai <strong>2002</strong> (02.05.<strong>2002</strong>)<br />
(54) COMPOSITE STRUCTURE AND<br />
METHOD AND APPARATUS FOR<br />
MANUFACTURE THEREOF<br />
STRUCTURE COMPOSITE ET PRO-<br />
CEDE ET APPAREIL DESTINES A SA<br />
FABRICATION<br />
(71) NATIONAL INSTITUTE OF AD-<br />
VANCED INDUSTRIAL SCIENCE<br />
AND TECHNOLOGY [JP/JP]; 3-1, Kasumigaseki<br />
1-chome, Chiyoda-ku, Tokyo<br />
100-8921 (JP). TOTO LTD. [JP/JP]; 1-1,<br />
Nakashima 2-chome, Kokura-kita-ku,