Online proceedings - EDA Publishing Association
Online proceedings - EDA Publishing Association
Online proceedings - EDA Publishing Association
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
7-9 October 2009, Leuven, Belgium<br />
Equivalent Electrothermal Circuit Model for<br />
Vertical-Cavity Surface-Emitting Lasers on Silicon<br />
Optical Bench<br />
C. C. Chen 1 , C. Singh 1 , Y. C. Chen 1 , Hsu-Liang Hsiao 2 , Chia-Yu Lee 2 , Y. T. Cheng 1 , and Mount-Learn Wu 2<br />
1 National Chiao Tung University, Dept. of Electronics Engineering, Hsinchu 300, Taiwan, R.O.C.,<br />
2 National Central University, Institute of Optical Sciences, Jhongli 32001, Taiwan, R.O.C.<br />
Abstract-This paper physically and conceptually provides a<br />
general electrothermal network π-model. Basing on the<br />
proposed network π-model, an equivalent electrothermal circuit<br />
model (ETCM) and the associated thermal behavior analysis are<br />
also demonstrated for the SiOB with VCSELs in terms of<br />
characteristics of device materials and geometries. The<br />
introduced complicated structure of VCSELs constructed in<br />
simulators can be greatly simplified by using the equivalent<br />
ETCM to predict the probable thermal flow paths, and<br />
eventually can achieve the goal of CPU time-saving without<br />
having complex mesh studying or scaling. In the case,<br />
comparison results between measured data, simulation and the<br />
equivalent ETCM calculation show an excellent temperature<br />
matching within ±2°C as well as achieving 90% CPU<br />
time-saving.<br />
Keywords: equivalent electrothermal circuit model, general<br />
electrothermal network π-model, SiOB, VCSELs.<br />
this paper, by analog with a common π-circuit model, we<br />
physically and conceptually introduced a general<br />
electrothermal network π-model, shown in Fig. 1. Meanwhile,<br />
an equivalent ETCM established according to the network<br />
π-model is also presented for the thermal behavior analysis of<br />
silicon optical bench (SiOB) with vertical-cavity<br />
surface-emitting lasers (VCSELs) as shown in Fig. 2 for<br />
160Gbp/s high speed interconnected optical data<br />
communication application.<br />
Since late 1980’s, it has been proposed to utilize silicon<br />
substrate as a cost effective functional carrier to integrate<br />
optical and microelectronic components. The implementation<br />
I. INTRODUCTION<br />
Inevitable non-uniform thermal effect due to increasing<br />
power dissipation within intensive operating chips has been<br />
one of significant hindrances for the developments of next<br />
generation high performance microsystem [1-3], that would<br />
promote the design consideration of associated configurations<br />
and arrangements of device packaging and cooling system,<br />
and limitation of maximum power in IC design stage [2].<br />
Therefore, there has been a drastic proliferation of strategy<br />
and technique concerned with the predictions of thermal<br />
effect on microsystem performance and reliability in terms of<br />
circuit design. So far, the establishment of equivalent<br />
electrothermal circuit model (ETCM) is the most efficient<br />
thermal analysis scheme which can be easily incorporated<br />
with CAD tool for optimal system-IC designs to avoid<br />
unexpected functionality degradation or even device failure<br />
due to excess thermal accumulation. In comparison with<br />
other analysis methods for the predictions of non-uniform<br />
thermal effect, such as numerical solutions based on<br />
Laplace’s equation [2], finite-element analysis (FEA), or<br />
boundary element method (BEM) for simulators [5-7],…etc.,<br />
ETCM can effectively avoid the issues of data unwieldiness<br />
and time-consuming due to complicated boundary conditions<br />
resulted by system configuration. Nevertheless, the proposed<br />
ETCM analysis is still case-dependent which requires detail<br />
system configurable for model development. Therefore, in<br />
Fig. 1. Scheme of the general electrothermal network π-model. By<br />
analysis with the common π-circuit model, there are three main blocks,<br />
heating source, propagated resistance, and common base resistance, are<br />
adopted to present the thermal source, thermal flow path, and the common<br />
base, respectively.<br />
SiOB<br />
4700µm<br />
Contact Pad<br />
Ground<br />
BCB<br />
Thermal Via<br />
625µm<br />
VCSELs<br />
Fig. 2. Scheme of the Vertical-Cavity Surface-Emitting Lasers<br />
(VCSELs) on Silicon Optical Bench (SiOB). It is obviously that there<br />
should be complicated thermal behavior inside the SiOB due to its large<br />
volume and aspect ratio. The insertion of upper-right corner shows<br />
complicated structure of the VCSELs, the adjacent contact pads, and the<br />
thermal via in detail.<br />
©<strong>EDA</strong> <strong>Publishing</strong>/THERMINIC 2009 8<br />
ISBN: 978-2-35500-010-2