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Online proceedings - EDA Publishing Association

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7-9 October 2009, Leuven, Belgium<br />

Equivalent Electrothermal Circuit Model for<br />

Vertical-Cavity Surface-Emitting Lasers on Silicon<br />

Optical Bench<br />

C. C. Chen 1 , C. Singh 1 , Y. C. Chen 1 , Hsu-Liang Hsiao 2 , Chia-Yu Lee 2 , Y. T. Cheng 1 , and Mount-Learn Wu 2<br />

1 National Chiao Tung University, Dept. of Electronics Engineering, Hsinchu 300, Taiwan, R.O.C.,<br />

2 National Central University, Institute of Optical Sciences, Jhongli 32001, Taiwan, R.O.C.<br />

Abstract-This paper physically and conceptually provides a<br />

general electrothermal network π-model. Basing on the<br />

proposed network π-model, an equivalent electrothermal circuit<br />

model (ETCM) and the associated thermal behavior analysis are<br />

also demonstrated for the SiOB with VCSELs in terms of<br />

characteristics of device materials and geometries. The<br />

introduced complicated structure of VCSELs constructed in<br />

simulators can be greatly simplified by using the equivalent<br />

ETCM to predict the probable thermal flow paths, and<br />

eventually can achieve the goal of CPU time-saving without<br />

having complex mesh studying or scaling. In the case,<br />

comparison results between measured data, simulation and the<br />

equivalent ETCM calculation show an excellent temperature<br />

matching within ±2°C as well as achieving 90% CPU<br />

time-saving.<br />

Keywords: equivalent electrothermal circuit model, general<br />

electrothermal network π-model, SiOB, VCSELs.<br />

this paper, by analog with a common π-circuit model, we<br />

physically and conceptually introduced a general<br />

electrothermal network π-model, shown in Fig. 1. Meanwhile,<br />

an equivalent ETCM established according to the network<br />

π-model is also presented for the thermal behavior analysis of<br />

silicon optical bench (SiOB) with vertical-cavity<br />

surface-emitting lasers (VCSELs) as shown in Fig. 2 for<br />

160Gbp/s high speed interconnected optical data<br />

communication application.<br />

Since late 1980’s, it has been proposed to utilize silicon<br />

substrate as a cost effective functional carrier to integrate<br />

optical and microelectronic components. The implementation<br />

I. INTRODUCTION<br />

Inevitable non-uniform thermal effect due to increasing<br />

power dissipation within intensive operating chips has been<br />

one of significant hindrances for the developments of next<br />

generation high performance microsystem [1-3], that would<br />

promote the design consideration of associated configurations<br />

and arrangements of device packaging and cooling system,<br />

and limitation of maximum power in IC design stage [2].<br />

Therefore, there has been a drastic proliferation of strategy<br />

and technique concerned with the predictions of thermal<br />

effect on microsystem performance and reliability in terms of<br />

circuit design. So far, the establishment of equivalent<br />

electrothermal circuit model (ETCM) is the most efficient<br />

thermal analysis scheme which can be easily incorporated<br />

with CAD tool for optimal system-IC designs to avoid<br />

unexpected functionality degradation or even device failure<br />

due to excess thermal accumulation. In comparison with<br />

other analysis methods for the predictions of non-uniform<br />

thermal effect, such as numerical solutions based on<br />

Laplace’s equation [2], finite-element analysis (FEA), or<br />

boundary element method (BEM) for simulators [5-7],…etc.,<br />

ETCM can effectively avoid the issues of data unwieldiness<br />

and time-consuming due to complicated boundary conditions<br />

resulted by system configuration. Nevertheless, the proposed<br />

ETCM analysis is still case-dependent which requires detail<br />

system configurable for model development. Therefore, in<br />

Fig. 1. Scheme of the general electrothermal network π-model. By<br />

analysis with the common π-circuit model, there are three main blocks,<br />

heating source, propagated resistance, and common base resistance, are<br />

adopted to present the thermal source, thermal flow path, and the common<br />

base, respectively.<br />

SiOB<br />

4700µm<br />

Contact Pad<br />

Ground<br />

BCB<br />

Thermal Via<br />

625µm<br />

VCSELs<br />

Fig. 2. Scheme of the Vertical-Cavity Surface-Emitting Lasers<br />

(VCSELs) on Silicon Optical Bench (SiOB). It is obviously that there<br />

should be complicated thermal behavior inside the SiOB due to its large<br />

volume and aspect ratio. The insertion of upper-right corner shows<br />

complicated structure of the VCSELs, the adjacent contact pads, and the<br />

thermal via in detail.<br />

©<strong>EDA</strong> <strong>Publishing</strong>/THERMINIC 2009 8<br />

ISBN: 978-2-35500-010-2

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