27.01.2015 Views

Online proceedings - EDA Publishing Association

Online proceedings - EDA Publishing Association

Online proceedings - EDA Publishing Association

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

7-9 October 2009, Leuven, Belgium<br />

and produced (chip A and chip B) with two different sizes: A1=64mm² @ big Chip<br />

The big chips is 30 mm x 20 mm and the small one is 20 mm<br />

A2=14mm² @ small chip<br />

x 10mm. Chip A has on the top side thin film heater, 70nm<br />

of TiW layer, which enable power up to 120W and d= 10µm… 100µm<br />

homogeneous temperature distribution. On the bottom side<br />

of chip A five thin film micro temperature sensors and four<br />

60<br />

equipotential surfaces as capacity sensors to measure and<br />

capture distance and tilt in-situ are integrated. Chip B has on<br />

50<br />

the both sides the same configurations, five T-sensors and<br />

four C-sensors. 12 shows the layout of the bottom side of<br />

40<br />

chip A and the bottom and the top side of chip B.<br />

30<br />

Following the main components of the test system will be<br />

20<br />

described:<br />

10<br />

Heater<br />

A 70 nm thin film TiW layer with ρ=5e-7 Ohm*m<br />

electrical resistivity of TiW allows electrical power up to<br />

120W under using a low voltage until 42V. The full area of<br />

the heater structure enables a homogeneous temperature<br />

distribution on the TIM surfaces below.<br />

Temperature sensors<br />

Proper measurements of temperature are very important to<br />

improve the accuracies of the test system. Semiconductor<br />

diodes which are integrated in e.g. flip chip can give proper<br />

temperature measurements but they cannot measure the<br />

interface temperatures. In Sissy-tester thin film micro scale<br />

meander structures of 60nm Au with 30nm TiW adhesion<br />

layer were realised for temperature measurement. The<br />

meander structures have the following technological<br />

parameters: width 20µm, line space 35µm and length<br />

42.5mm for the big chips and 30mm for the small chips, it<br />

yields from that 760 ohm electrical resistance for big<br />

variants and 454 ohm for small variants. The sensivity of<br />

temperature sensors will be than about 10mV/K at<br />

I const =3 mA. T-sensors will be measured separate with using<br />

a four point measurement method.<br />

Capacity sensors<br />

Equipotential surfaces are integrated on the surface to<br />

capture tilt and distance between the dies and between the<br />

lower die and micro cooler to control the homogeneity of a<br />

heat flow through TIM and dies. The equipotenial surfaces<br />

have a defined area 8mm x 8mm for big chips and 3.75mm x<br />

3.75mm for the small one. To determine the distance<br />

between the surfaces the capacity can be measured.<br />

C = ⋅ε<br />

ε 0<br />

r<br />

⋅<br />

A<br />

d<br />

Where C: capacity, ε 0 : permittivity of free space ε r :<br />

relative static permittivity, A: area, d: distance or BLT of<br />

TIM.<br />

The relative static permittivity ε r should be determined<br />

separate for each material. In the worst case ε r will be equal<br />

to 1 (air). To evaluate the measurement range and sensitvity<br />

of the capacity sensors a sample calculation will be estimate<br />

for difference BLT:<br />

C [pF]<br />

big chip<br />

small chip<br />

0<br />

0 20 40 60 80 100<br />

BLT [µm]<br />

Fig. 13: Minimum capacity yvalues vs. BLT for the both<br />

chips with no TIM present.<br />

Figure 13 shows the relationship between capacity and<br />

distance for difference sizes of areas. It can be seen that the<br />

capacity values for a big chip are between 55pF und 5.5pF<br />

and for a small one are between 12pF and 1.2pF at BLT<br />

between 10µm and 100µm, with an increased sensitivity<br />

versus the interesting small BLT values. Such capacitance<br />

values can easily be measured by today’s impedance gauges.<br />

Electrical and mechanical connections<br />

The chips are soldered and wire-bonded to AlN-substrate,<br />

AlN was chosen because of his coefficient of thermal<br />

expansion (CTE). The mean thermal expansion coefficients<br />

obtained in the range 20–300 °C are 4.2e-6 1/K for AlN and<br />

2.8e-6 1/K for silicon. The CTE of silicon and AlN ceramic<br />

is quite close to each other, which minimizes thermomechanical<br />

stresses.<br />

Micro water cooler<br />

AlN-substrate<br />

Si-die<br />

TIM<br />

Si-die<br />

AlN-substrate<br />

Fig. 14: Electrical and mechanical connection of Sissytester<br />

The top of chip A and the bottom of chip B are first<br />

assembled on AlN substrates using AuSn. AuSn solder is<br />

preferably applied using preforms or paste instead of<br />

bumping to maintain some degree of freedom in the process<br />

flow. The bottom of chip A and the top of chip B are wirebonded<br />

after the assembling. To provide mechanical support<br />

and exclude contaminants such as fingerprint residues which<br />

could disrupt circuit operation glob-top encapsulation is<br />

©<strong>EDA</strong> <strong>Publishing</strong>/THERMINIC 2009 228<br />

ISBN: 978-2-35500-010-2

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!