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Online proceedings - EDA Publishing Association

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7-9 October 2009, Leuven, Belgium<br />

of the silicon bench can greatly reduce package size and<br />

interconnection length within components, which result in<br />

reduction of parasitic capacitance and inductance in the<br />

package suitable for high-speed applications. Meanwhile, the<br />

SiOB provides exclusive advantages of high precisely optical<br />

alignment for low insertion loss coupling from optical<br />

components to fiber core, good thermal mismatch, excellent<br />

thermal conductivity, and better resistor fabrication for<br />

impedance matching of signal transmission. On the other<br />

hand, SiOB still has its intrinsic shortcoming. Silicon<br />

substrate is lossy material in the RF/microwave/millimeter<br />

wave regimes. Electrical signals transmitted between on-chip<br />

circuitries can easily leak into silicon substrate and be coupled<br />

to generate substrate noise. Electrical losses of the signals<br />

due to induced eddy current in the substrate also degrade the<br />

quality of the performance of passive components in the<br />

driving circuitry. In order to resolve this issue, a layer of 3µm<br />

BCB (benzo-cyclo-butene) is utilized for passive fabrication<br />

where the loss can be greatly reduced. Owing to high thermal<br />

resistance characteristic of BCB, laser diode directly mounted<br />

on the top of it would have inevitable working temperature<br />

raise that could affect the laser performance.<br />

Therefore, in this paper, the equivalent ETCM of SiOB<br />

mounted with 160Gbp/s VCSELs will be developed by<br />

considering the characteristics of device materials and<br />

geometries. The presented model can not only reasonably<br />

simplify the complicated configuration but also provide an<br />

indication for system optimization.<br />

II.<br />

MODEL ANALYSIS<br />

According to the essential meanings and emphases of<br />

common π-circuit model, three main blocks, labeled heating<br />

source, propagated resistance, and common base resistance,<br />

are employed in the general electrothermal network π-model,<br />

shown in Fig. 1, representing the thermal source, thermal flow<br />

path, and the common base of thermal conducting system,<br />

respectively. As mentioned by A. M. Darwish et al. that it is<br />

appropriate to assign adiabatic surface between each heating<br />

source and the next [2], the adopted dash-lines in the network<br />

π-model represent an adiabatic surface enclosed each<br />

presented blocks where the effective contact area can be<br />

eventually well defined. Meanwhile, the impedance<br />

parameters Z i , where i present 1, 2, 3, and 4, can be defined as<br />

the thermal resistance of heating source itself, source-source,<br />

nature or forced air convection, thermal capacitance, and<br />

other specified boundary conditions, and so on. Boundary A<br />

and B can be the ground level of the thermal flows, other<br />

heating components of thermal conducting system with<br />

specified thermal conditions, or interconnections between<br />

different systems. It should be specially emphasized that<br />

icons of the source of thermal flow and the block of heating<br />

source represent the thermal generation and flow and main<br />

heated component, respectively.<br />

Fig. 3(a) and (b) show the modified electrothermal<br />

π-network model and the associated equivalent ETCM of the<br />

VCSELs on SiOB, respectively, where Z 1 and Z 2 , Z 3 , and Z 4<br />

are thermal resistance of a VCSEL (R VCSEL ) itself, an infinite<br />

thermal resistance due to the negligence of nature air<br />

convention here, and thermal capacitance of SiOB (C SiOB ),<br />

respectively. Boundary A and B are the adjacent R VCSEL of the<br />

operating VCSEL and ground level for entire thermal<br />

conducting system, respectively. It is noted that two<br />

parameters, the source of thermal flow and Z 1 , are the<br />

components of the heating source in the modified network<br />

π-model since the VCSELs are main thermal flow generators<br />

and also the heated components themselves in our case.<br />

Additionally, the blocks of propagated resistances and<br />

common base resistances are represented by parallel<br />

connection of thermal resistance of gold (R Gold ), air (R Air ), and<br />

BCB (R BCB ) and SiOB (R SiOB ), respectively.<br />

Four switches adopted in the structure mean the VCSEL<br />

can be single operated. According to Fourier’s conduction<br />

law, R VCSEL , R Gold , R Air , and R BCB can be easily calculated as R i<br />

=t i /k i A i , where i, t, k, and A are adopted material, thickness,<br />

thermal conductivity, and contact area of the materials,<br />

respectively. Then, C SiOB is equal to Q/∆T where Q and ∆T<br />

represent dissipated power and temperature difference,<br />

respectively. Parameter R SiOB , however, has complicated<br />

thermal behavior due to its large volume and aspect ratio. It<br />

can be calculated as follows [2]:<br />

[ f ( g[ 2s]<br />

1)<br />

]<br />

1 ⎛ V + ⎞ 1 ⎛ h( 2.<br />

3t)<br />

⎞<br />

R SiOB<br />

= ln⎜<br />

+ ⎜ ⎟<br />

[ ( [ ])] ⎟<br />

ln , (1)<br />

2π Wk ⎝ V f g L ⎠ 4π sk ⎝ h(s) ⎠<br />

where<br />

(a)<br />

(b)<br />

Fig. 3. (a)Scheme of the modified general electrothermal network π-model.<br />

The source of thermal flow and Z 1 are the components of the heating source<br />

due to the VCSELs are main heating generators themselves in our case.<br />

(b)The equivalent electrothermal circuit model of the VCSELs on the SiOB,<br />

where Z 1 and Z 2, Z 3, and Z 4 are thermal resistance of VCSEL (R VCSEL), an<br />

infinite thermal resistance due to without nature air convention here, and<br />

thermal capacitance of SiOB (C SiOB), respectively.<br />

©<strong>EDA</strong> <strong>Publishing</strong>/THERMINIC 2009 9<br />

ISBN: 978-2-35500-010-2

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