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Online proceedings - EDA Publishing Association

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7-9 October 2009, Leuven, Belgium<br />

Fig. 10. Schematic representation of the experimental set up to validate the<br />

thermal modeling [14].<br />

IV. DISCUSSION OF SIMULATION RESULTS<br />

Fig. 8 shows the temperature distribution in the ‘metal 2’<br />

layer of the top die. This is the layer where the power is<br />

dissipated. A sharp temperature peak can be observed at the<br />

location of the hot spots. As expected the temperature peak<br />

is higher in the smaller hotspots due to the higher power<br />

density. In this case with the power dissipation in the metal<br />

layer of the BEOL structure a very sharp peak is observed<br />

due to the poorly conductive oxide layers surrounding it. For<br />

normal operation with heat dissipation in the bulk of the Si a<br />

less pronounced peak is expected. The influence of the TSV<br />

density can be seen on Fig. 8: in the case without TSVs the<br />

maximum temperature amounts to 8.08°C in the 50x50µm²<br />

hot spot. For the TSV density of 7x7µm² and 11x11µm² the<br />

temperature peak is 7.15°C and 5.51°C respectively. In the<br />

case of the 50x50µm² hotspots the effect of TSV density is<br />

less pronounced. Fig. 9 shows a surface plot of the heat flux<br />

in the bulk of the Si of the top die. At the top of the TSV an<br />

influx of heat can be seen. The heat is generated fairly<br />

uniform in the layers on top the Cu TSVs. The heat will flow<br />

down through the stack concentrated through the Cu TSVs.<br />

V. EXPERIMENTAL VALIDATION APPROACH<br />

To trust and improve the proposed approach of the<br />

detailed thermal modeling the simulations need to be<br />

validated by experimental results. To be able to evaluate the<br />

thermal modeling early in the development of the 3D<br />

integration including the TSVs a more simplified version of<br />

the packaged die stack is considered. Therefore a dedicated<br />

thermal test vehicle has been developed to experimentally<br />

characterize the thermal effects in the stacked die structure<br />

and to validate the modeling approach [14]. Fig. 10 shows a<br />

schematic of the simplified package on which transient<br />

thermal measurements are performed. The die stack is glued<br />

to a Cu interposer plate. This Cu plate is attached to a watercooled<br />

cooling block. On top of the outer edge of the Cu<br />

plate a PCB is connected. In this PCB an opening is<br />

provided to fit the die stack. Wirebonds from both the top<br />

and bottom die to bonding pads on the PCB provide the<br />

electrical connections to access the heaters and diodes in the<br />

die stack. The power is dissipated in heaters located in the<br />

BEOL structure of the top die. Temperature is measured<br />

using temperature sensitive diodes which are located in both<br />

top and bottom die. Assembly and testing of experimental<br />

set-up is ongoing at the time of publication.<br />

TIM 1<br />

glue<br />

Cu plate<br />

TIM 2<br />

Water cooled heat sink<br />

PCB<br />

VI. CONCLUSIONS<br />

In this paper a methodology to perform a detailed, fine<br />

grain thermal analysis of the stacked die structure is<br />

presented. This methodology allows to include the complete<br />

detail of the design layout and the full description of the<br />

BEOL structure of all the dies in the stack. The approach is<br />

demonstrated on a test case of a stacked die structure of two<br />

dies BGA package. Both the complete design layout of the<br />

top and bottom die, including the interconnections, such as<br />

TSVs and solder balls, between both dies are combined to a<br />

3D design. A detailed thermal simulation with a spatial<br />

resolution of 100 nm is performed based on the 3D layout<br />

specified in the GDSII file and the definition of the stack of<br />

materials. Using this approach the thermal influence of the<br />

proximity and array density of the below the heat sources<br />

TSVs in the top die is studied.<br />

REFERENCES<br />

[1] The International technology Roadmap for semiconductors (ITRS),<br />

2008 edition. URL:<br />

http://www.itrs.net/Links/2008ITRS/Home2008.htm<br />

[2] E. Beyne, “The Rise of the 3 rd Dimension for System Integration”<br />

Proc. IEEE Int. Interconnect Technology Conference, pp. 1-5, 2006.<br />

[3] M. Rencz, “Thermal Issues in Stacked Die Packages”, 21 st IEEE<br />

SEMI-THERM Symposium, pp.307-312, March 2005.<br />

[4 ] FireBolt (Nanoscale Full-Chip Thermal Simulator), Gradient<br />

Design Automation, Inc, http://www.gradient-da.com/<br />

[5] M. Turowski,, S. Dooley, A. Raman, M. Casto, Multiscale 3D<br />

thermal analysis of analog ICs: From full-chip to device level, 14th<br />

International Workshop on Thermal Inveatigation of ICs and<br />

Systems, pp. 64-69, 2008.<br />

[6] M. Rencz, V. Székely: Structure function evaluation of stacked<br />

dies, Proceedings of the XXth SEMI-THERM Symposium, March<br />

9-11, San Jose, CA, USA, pp 50-55, 2004.<br />

[7] Enrico A. Garcia, Chia-Pin Chiu: Compact Modeling Approaches to<br />

Multiple Die Stacked Chip Scale Packages. , 19th IEEE SEMI-<br />

THERM Symposium, pp. 160-167, 2003.<br />

[8] Li Zhang, Noella Howard, Vijaylaxmi Gumaste, Amindya Poddar,<br />

Luu Nguyen: Thermal Characterization of Stacked-Die Packages,<br />

20th IEEE SEMI-THERM Symposium, pp. 55-63, 2004.<br />

[9] R. Gillon, P. Joris, H. Oprins, B. Vandevelde, A.Srinivasan, R.<br />

Chandra, Practical chip-centric electro-thermal simulations,<br />

Proceedings of THERMINIC, Rome, Italy, pp. 220-223, 24-26<br />

September 2008.<br />

[10] C. Chiang, S. Sinha, The road to 3D <strong>EDA</strong> tool readiness,<br />

Proceedings of the 2009 Asia and South Pacific Design Automation<br />

Conference, pp. 429 – 436, 2009.<br />

[11] E.R. Eckert and D. Eckert, "Analysis Of Heat And Mass Transfer",<br />

eq (1-14), p.11, CRC Press, 1986.<br />

[12] S. Melamed, T. Thorolfsson, A. Srinivasan, E. Cheng, P. Franzon<br />

and R. Davis, "Junction-level Thermal Extraction and Simulation<br />

of 3DICs", IEEE International Conference on 3D System<br />

Integration (3D IC), Sep 2009.<br />

[13] B. Swinnen et al., “3D Integration by Cu-Cu Thermo-Compression<br />

Bonding of Extremely Thinned Bulk-Si Die Containing 10 μm<br />

Pitch Through-Si Vias”, Int. Electron Devices Meeting, pp. 1-4,<br />

December 2006.<br />

[14] C. Torregiani, V. Cherman, F. Duflos, R. Labie, B. Vandevelde,<br />

3D-SIC: Thermal modeling & experimental validation, presentation<br />

at IMEC Core Partner Week: 3D Integration, 20 - 24 October 2008.<br />

©<strong>EDA</strong> <strong>Publishing</strong>/THERMINIC 2009 49<br />

ISBN: 978-2-35500-010-2

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