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Superconducting Technology Assessment - nitrd

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SMT MRAM<br />

Another direct selection scheme makes use of the recently observed interaction between a spin-polarized current<br />

and the bit magnetization, through so-called spin-momentum transfer (SMT). If a spin-polarized current is incident<br />

on a magnetic bit, the spin of the current-carrying spin-polarized electrons will experience a torque trying to align<br />

the electrons with their new magnetic environment inside the bit. By conservation of angular momentum, the<br />

spin-polarized current will also exert a torque on the bit magnetization. Above a critical current density, typically<br />

10 7 to 10 8 A/cm 2 , the current can switch the magnetic polarization by spin-transfer. SMT switching is most effective<br />

for bit diameters less than ~ 300 nm and gains importance as IC geometries continue to shrink.<br />

Figure 2. Schematic of a proposed SMT MRAM cell structure showing the common current path for sense and program operations.<br />

Successful development of this architecture would result in a high-density, low power MRAM.<br />

The main advantages of SMT switching are lower switching currents, improved write selectivity, and bits highly stable<br />

against thermal agitation and external field disturbances. However, SMT research is currently focused on<br />

understanding and controlling the fundamentals of spin-transfer switching. Several significant challenges remain<br />

before defining a product based on this approach. One such challenge is making a cell with a reasonable output<br />

signal level, as observations of spin-transfer so far have been confined to GMR systems, which have lower<br />

resistance, MR, and operating voltages compared to magnetic tunnel junctions. However, MTJ materials have very<br />

recently been identified with MR > 100% at very low resistances, and MR > 200% with moderate resistances. Such<br />

materials could potentially improve both the signal from SMT devices and lower the minimum currents needed for<br />

switching. Ongoing R&D in this area is directed at further decreasing the minimum switching currents and<br />

establishing materials with the necessary reproducibility and reliability for the low-resistance range. The outcome<br />

of these R&D activities will determine which SMT architectures can be used and at what lithography node. If switching<br />

currents are driven low enough for a minimum-size transistor to supply the switching current, this technology will<br />

meet or exceed the density of the established semiconductor memories, while providing high speed and<br />

non-volatility. Although SMT technology is less developed than MTJ MRAM is, it has the potential for higher density<br />

and orders-of-magnitude reduction in power dissipation<br />

We note here that for the specific case of MRAM integrated with RSFQ electronics, the low resistance of the<br />

all-metal GMR devices (instead of the MTJ) may be beneficial, as described in the follow-on section Integrated<br />

MRAM and RSFQ Electronics.<br />

178<br />

DC<br />

�<br />

� �<br />

�<br />

Free Magnet<br />

Tunnel Barrier<br />

Fixed Magnet<br />

Isolation Transistor

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