- Page 1 and 2:
SUPERCONDUCTING TECHNOLOGY ASSESSME
- Page 3 and 4:
Summary of Findings The STA conclud
- Page 5 and 6:
CHAPTER 02: ARCHITECTURAL CONSIDERA
- Page 7 and 8:
CHAPTER 06: SYSTEM INTEGRATION 6.1
- Page 9 and 10:
INDEX OF FIGURES CHAPTER 01: INTROD
- Page 11 and 12:
APPENDIX G: ISSUES AFFECTING RSFQ C
- Page 13 and 14:
CONTENTS OF CD EXECUTIVE SUMMARY CH
- Page 15 and 16:
LIMITATIONS OF CURRENT TECHNOLOGY C
- Page 17 and 18:
State of the Industry Today, expert
- Page 19 and 20:
01 This document presents the resul
- Page 21 and 22:
1.2 LIMITATIONS OF CONVENTIONAL TEC
- Page 23 and 24:
1.3.2 RSFQ ATTRIBUTES Important att
- Page 25 and 26:
The end point of this roadmap defin
- Page 27 and 28:
Structurally, a high-end computer w
- Page 29 and 30:
16 ■ Chalmers University in Swede
- Page 31 and 32:
Random Access Memory Options Random
- Page 33 and 34:
Compact Package Feasible Thousands
- Page 35 and 36: MCMs The design of MCMs for SCE chi
- Page 37 and 38: 02 No radical execution paradigm sh
- Page 39 and 40: The key challenges at the processor
- Page 41 and 42: 2.2 MICROPROCESSORS - CURRENT STATU
- Page 43 and 44: 2.2.3 CORE1 BIT-SERIAL MICROPROCESS
- Page 45 and 46: Potential Problems The initial vers
- Page 47 and 48: The microarchitecture of supercondu
- Page 49 and 50: 2.5 MICROPROCESSORS - CONCLUSIONS A
- Page 51: 2.7 MICROPROCESSORS - FUNDING In th
- Page 54 and 55: SUPERCONDUCTIVE RSFQ PROCESSOR AND
- Page 56 and 57: 3.1 RSFQ PROCESSORS The panel devel
- Page 58 and 59: Circuits/ Organizations Flux-1/ NG,
- Page 60 and 61: 3.1.2 RSFQ PROCESSORS - READINESS F
- Page 62 and 63: 3.1.3 RSFQ PROCESSORS - ROADMAP The
- Page 64 and 65: 3.1.5 RSFQ PROCESSORS - ISSUES AND
- Page 66 and 67: Since these memory concepts are so
- Page 68 and 69: Simulations show that the input int
- Page 70 and 71: SFQ RAM Status The results of five
- Page 72 and 73: Investment for SFQ Memory The inves
- Page 74 and 75: 4MB MRAM BIT CELL: 1 MTJ & 1 TRANSL
- Page 76 and 77: The roadmap identifies early analyt
- Page 78 and 79: MRAM Major Issues and Concerns Mate
- Page 80 and 81: 3.3 CAD TOOLS AND DESIGN METHODOLOG
- Page 82 and 83: Issues and Concerns Present simulat
- Page 84 and 85: Investment The investment estimated
- Page 88 and 89: SUPERCONDUCTIVE CHIP MANUFACTURE Th
- Page 90 and 91: Technology Node Current Density Sup
- Page 92 and 93: All IC chips on completed wafers un
- Page 94 and 95: Table 4-3 lists the major active in
- Page 96 and 97: TABLE 4-4. READINESS OF RSFQ CHIP F
- Page 98 and 99: Ground Plane Counter/B arrier/Base
- Page 100 and 101: Figure 4-5. Projections of RSFQ cir
- Page 102 and 103: The extensive modeling of defect de
- Page 104 and 105: The panel believes that the most co
- Page 106 and 107: Process stability is key to the suc
- Page 108 and 109: The panel has described an aggressi
- Page 110 and 111: INTERCONNECTS AND SYSTEM INPUT/OUTP
- Page 112 and 113: 5.1 OPTICAL INTERCONNECT TECHNOLOGY
- Page 114 and 115: Univ. of Colorado Univ. of Texas at
- Page 116 and 117: 5.1.4 OPTICAL INTERCONNECT TECHNOLO
- Page 118 and 119: TABLE 5-4. FUNDING FOR ROOM TEMPERA
- Page 120 and 121: Josephson output interfaces have de
- Page 122 and 123: PROCESSOR MEMORY L1 MEMORY L2 MEMOR
- Page 124 and 125: 5.4.4 DATA ROUTING: 4 K RSFQ TO 4 K
- Page 126 and 127: SYSTEM INTEGRATION System integrati
- Page 128 and 129: Figure 6.3. A multi-chip module wit
- Page 130 and 131: ■ Find a vendor willing to custom
- Page 132 and 133: 2-4 layers 4-16 layers � 16 - 100
- Page 134 and 135: 6.3 ENCLOSURES AND SHIELDS TABLE 6-
- Page 136 and 137:
6.3.5 ENCLOSURES AND SHIELDS - ROAD
- Page 138 and 139:
Large Cryocoolers There are two Eur
- Page 140 and 141:
6.5 POWER DISTRIBUTION AND CABLES S
- Page 142 and 143:
6.5.2 POWER DISTRIBUTION AND CABLES
- Page 144 and 145:
6.6. SYSTEM INTEGRITY AND TESTING B
- Page 146 and 147:
133
- Page 148 and 149:
TERMS OF REFERENCE Date: 10 Septemb
- Page 150 and 151:
137
- Page 152 and 153:
PANEL MEMBERS John T. Pinkston (Cha
- Page 154 and 155:
141
- Page 156 and 157:
GLOSSARY BER Bit Error Rate CDR Cri
- Page 158 and 159:
SIA Silicon Industry Association TE
- Page 160 and 161:
INTRODUCTION TO SUPERCONDUCTOR SING
- Page 162 and 163:
Single flux quantum is the latest g
- Page 164 and 165:
SFQ logic operates by generating, s
- Page 166 and 167:
153
- Page 168 and 169:
SOME APPLICATIONS FOR RSFQ The prim
- Page 170 and 171:
Each class will utilize RSFQ logic
- Page 172 and 173:
In imaging and surveillance systems
- Page 174 and 175:
SYSTEM ARCHITECTURES System-level H
- Page 176 and 177:
CNET Crossbar DRAM-PIM 16 TB Since
- Page 178 and 179:
Software Considerations Program exe
- Page 180 and 181:
167
- Page 182 and 183:
ISSUES AFFECTING RSFQ CIRCUITS Marg
- Page 184 and 185:
Yield Figure 2. Yield as a function
- Page 186 and 187:
Different sections of a large chip,
- Page 188 and 189:
Various moat protocols have been pr
- Page 190 and 191:
MRAM TECHNOLOGY FOR RSFQ HIGH-END C
- Page 192 and 193:
Potential for Scaling and Associate
- Page 194 and 195:
Integrated MRAM and RSFQ Electronic
- Page 196 and 197:
Stand-alone Cryogenic MRAM Whether
- Page 198 and 199:
Superconductor Integrated Circuit F
- Page 200 and 201:
Fig. 1. Cross section of NGST’s 8
- Page 202 and 203:
Fig. 2. Current density @t A versus
- Page 204 and 205:
Fig. 5. SEM photograph of a 1.0-"m
- Page 206 and 207:
Fig. 10. SEM photograph showing the
- Page 208 and 209:
Fig. 12. Trend chart of leakage con
- Page 210 and 211:
Fig. 15. Typical current-voltage ch
- Page 212 and 213:
[6] K. B. Theobald, G. R. Gao, and
- Page 214 and 215:
[90] L. A. Abelson, S. L. Thomasson
- Page 216 and 217:
CAD PRESENT CAD CAPABILITY The inte
- Page 218 and 219:
Fig. 3. The Symbol View is instanci
- Page 220 and 221:
Fig. 5. The Physical Layout View us
- Page 222 and 223:
Fig. 7. VHDL simulation performed o
- Page 224 and 225:
Fig. 9. First-pass success is routi
- Page 226 and 227:
DATA SIGNAL TRANSMISSION ABSTRACT T
- Page 228 and 229:
Some studies, such as those at Inte
- Page 230 and 231:
A development in long haul communic
- Page 232 and 233:
3.3 THE 4K-INTERMEDIATE TEMPERATURE
- Page 234 and 235:
There is another option to employ D
- Page 236 and 237:
TABLE 1. COMPONENT TECHNOLOGY DEVEL
- Page 238 and 239:
6. FUNDING There are efforts that w
- Page 240 and 241:
MULTI-CHIP MODULES AND BOARDS In or
- Page 242 and 243:
Lead Inductance (pH) 1,000 100 10 T
- Page 244 and 245:
For system-in-stack purposes, it wa
- Page 246 and 247:
Enclosures and Shields Enclosures a
- Page 248 and 249:
Several issues need to be resolved
- Page 250 and 251:
The Northrop Grumman Space Technolo
- Page 252 and 253:
Another issue is the cost of the re
- Page 254 and 255:
To maximize both the magnetic and r
- Page 256 and 257:
243