Bulletin 2009/07 - European Patent Office
Bulletin 2009/07 - European Patent Office
Bulletin 2009/07 - European Patent Office
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
(G03B) I.1(2)<br />
G03B 5/00 → (51) H04N 5/232<br />
(51) G03B 7/093 (11) 2 023 198 A2<br />
H04N 5/235<br />
(25) En (26) En<br />
(21) 08006401.7 (22) 31.03.2008<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HR HU IE IS IT LI LT LU LV MC MT NL<br />
NO PL PT RO SE SI SK TR<br />
AL BA MK RS<br />
(30) 31.<strong>07</strong>.20<strong>07</strong> US 831612<br />
(54) • Szenenabhängige automatische Belichtungskontrolle<br />
• Scene-dependent auto exposure control<br />
• Contrôle d'exposition automatique dépendant<br />
de la scène<br />
(71) Qualcomm Incorporated, 5775 Morehouse<br />
Drive, San Diego, CA 92121-1714, US<br />
(72) Hung, Szepo Robert, c/o Qualcomm Inc.,<br />
San Diego, CA 92121-1714, US<br />
Li, Hsiang-Tsun, c/o Qualcomm Inc., San<br />
Diego, CA 92121-1714, US<br />
Li, Jingqiang, c/o Qualcomm Inc., San Diego,<br />
CA 92121-1714, US<br />
(74) Heselberger, Johannes, et al, <strong>Patent</strong>- und<br />
Rechtsanwälte Bardehle - Pagenberg - Dost<br />
Altenburg - Geissler Galileiplatz 1, 81679<br />
München, DE<br />
(51) G03B 7/16 (11) 2 023 199 A2<br />
(25) En (26) En<br />
(21) 08167960.7 (22) 06.09.1999<br />
(84) DE FR GB<br />
(30) <strong>07</strong>.09.1998 JP 25308498<br />
<strong>07</strong>.09.1998 JP 25308598<br />
<strong>07</strong>.09.1998 JP 25308698<br />
<strong>07</strong>.09.1998 JP 25308798<br />
<strong>07</strong>.09.1998 JP 25308898<br />
<strong>07</strong>.09.1998 JP 25258898<br />
11.09.1998 JP 25853498<br />
(54) • Blitzsystem<br />
• Flash system<br />
• Système Flash<br />
(71) Canon Kabushiki Kaisha, 30-2 Shimomaruko<br />
3-chome Ohta-ku, Tokyo 146-8501, JP<br />
(72) Fukui, Hajime, Tokyo Tokyo 146-8501, JP<br />
(74) TBK-<strong>Patent</strong>, Bavariaring 4-6, 80336<br />
München, DE<br />
(62) 99117540.7 / 0 985 958<br />
G03B 15/00 → (51) G01N 21/78<br />
(51) G03B 21/00 (11) 2 023 200 A1<br />
G02F 1/13<br />
(25) Ja (26) En<br />
(21) <strong>07</strong>743485.0 (22) 16.05.20<strong>07</strong><br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU LV MC MT NL PL PT<br />
RO SE SI SK TR<br />
AL BA HR MK RS<br />
(86) JP 20<strong>07</strong>/060050 16.05.20<strong>07</strong><br />
(87) WO 20<strong>07</strong>/138860 20<strong>07</strong>/49 06.12.20<strong>07</strong><br />
(30) 26.05.2006 JP 2006146531<br />
(54) • REFLEKTIERENDER FLÜSSIGKRISTALL-<br />
PROJEKTOR UND BILDWIEDERGABE-<br />
VORRICHTUNG<br />
• REFLECTIVE LIQUID CRYSTAL PROJECT-<br />
OR AND IMAGE REPRODUCING APPAR-<br />
ATUS<br />
• PROJECTEUR A CRISTAUX LIQUIDES<br />
REFLECHISSANT ET APPAREIL DE<br />
REPRODUCTION D'IMAGE<br />
(71) Sony Corporation, 1-7-1 Konan, Minato-ku,<br />
Tokyo 108-0<strong>07</strong>5, JP<br />
(72) KAISE, Kikuo, Tokyo; 108*0<strong>07</strong>5, JP<br />
Europäisches <strong>Patent</strong>blatt<br />
<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />
<strong>Bulletin</strong> européen des brevets<br />
(74) Müller - Hoffmann & Partner, <strong>Patent</strong>anwälte<br />
Innere Wiener Strasse 17, 81667 München,<br />
DE<br />
G03B 21/00 → (51) C09B 56/04<br />
(51) G03B 21/16 (11) 2 023 201 A2<br />
(25) En (26) En<br />
(21) 08161053.7 (22) 24.<strong>07</strong>.2008<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HR HU IE IS IT LI LT LU LV MC MT NL<br />
NO PL PT RO SE SI SK TR<br />
AL BA MK RS<br />
(30) 27.<strong>07</strong>.20<strong>07</strong> JP 20<strong>07</strong>196743<br />
(54) • Bildprojektor<br />
• Image projection apparatus<br />
• Appareil de projection d'images<br />
(71) Canon Kabushiki Kaisha, 30-2 Shimomaruko<br />
3-chome Ohta-ku, Tokyo 146-8501, JP<br />
(72) NODA, Toshiyuki, Tokyo Tokyo 146-8501, JP<br />
(74) TBK-<strong>Patent</strong>, Bavariaring 4-6, 80336<br />
München, DE<br />
(51) G03B 21/16 (11) 2 023 202 A2<br />
(25) En (26) En<br />
(21) 08252091.7 (22) 18.06.2008<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HR HU IE IS IT LI LT LU LV MC MT NL<br />
NO PL PT RO SE SI SK TR<br />
AL BA MK RS<br />
(30) 08.08.20<strong>07</strong> JP 20<strong>07</strong>206493<br />
(54) • Projektionsvorrichtung<br />
• Projecting apparatus<br />
• Appareil de projection<br />
(71) Hitachi, Ltd., 6-6, Marunouchi 1-chome<br />
Chiyoda-ku, Tokyo 100-8280, JP<br />
(72) Fukui, Masayuki c/o Hitachi, Ltd., Intellectual<br />
Property Group, Tokyo 100-8220, JP<br />
Saito, Hideharu c/o Hitachi, Ltd., Intellectual<br />
Property Group, Tokyo 100-8220, JP<br />
(74) Calderbank, Thomas Roger, et al, Mewburn<br />
Ellis LLP 33 Gutter Lane, London EC2V 8AS,<br />
GB<br />
(51) G03F 7/033 (11) 2 023 203 A1<br />
G03F 7/038<br />
(25) En (26) En<br />
(21) 08013249.1 (22) 23.<strong>07</strong>.2008<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HR HU IE IS IT LI LT LU LV MC MT NL<br />
NO PL PT RO SE SI SK TR<br />
AL BA MK RS<br />
(30) 26.<strong>07</strong>.20<strong>07</strong> JP 20<strong>07</strong>194239<br />
(54) • Lichtempfindliche Zusammensetzung,<br />
lichtempfindlicher Harzübertragungsfilm,<br />
sowie Verfahren zur Herstellung eines<br />
Lichtabstandhalters und Substrat für eine<br />
Flüssigkristallanzeigenvorrichtung und<br />
Flüssigkristallanzeige<br />
• Photosensitive composition, photosensitive<br />
resin transfer film, and method for<br />
producing a photospacer, and substrate for<br />
a liquid crystal display device and liquid<br />
display device<br />
• Composition photosensible, film de transfert<br />
de résine photosensible, et procédé de<br />
production de photo-espaceur, et substrat<br />
pour dispositif d'affichage à cristaux liquides<br />
et dispositif d'affichage liquide<br />
(71) FUJIFILM Corporation, 26-30, Nishiazabu 2chome,<br />
Minato-ku Tokyo, JP<br />
(72) Nakamura, Hideyuki, Shizuoka-ken, JP<br />
Mochizuki, Kyohei, Shizuoka-ken, JP<br />
Fukushige, Yuuichi, Shizuoka-ken, JP<br />
Arioka, Daisuke, Shizuoka-ken, JP<br />
(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />
Arabellastrasse 4, 81925 München, DE<br />
324<br />
Anmeldungen<br />
Applications<br />
Demandes (<strong>07</strong>/<strong>2009</strong>) 11.02.<strong>2009</strong><br />
(51) G03F 7/038 (11) 2 023 204 A2<br />
B41J 2/16<br />
(25) En (26) En<br />
(21) 08154749.9 (22) 17.04.2008<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HR HU IE IS IT LI LT LU LV MC MT NL<br />
NO PL PT RO SE SI SK TR<br />
AL BA MK RS<br />
(30) <strong>07</strong>.08.20<strong>07</strong> KR 20<strong>07</strong>0<strong>07</strong>9170<br />
(54) • Fotolackzusammensetzung, Verfahren zur<br />
Formung eines Musters mit der Fotolackzusammensetzung<br />
und Tintenstrahldruckverfahren<br />
• Photoresist composition, method of forming<br />
pattern using the photoresist composition<br />
and inkjet print head<br />
• Composition de photoréserve, procédé<br />
pour la formation d'un motif utilisant la<br />
composition de photoréserve et tête d'impression<br />
à jet d'encre<br />
(71) Samsung Electronics Co., Ltd., 416, Maetandong,<br />
Yeongtong-gu, Suwon-si Gyeonggi-do<br />
443-742, KR<br />
Korea Advanced Institute of Science and<br />
Technology, 373-1, Guseong-dong,<br />
Yuseong-ku, Daejeon-si, KR<br />
(72) Kim, Kyu-sik c/o Samsung Advanced Institute<br />
of Technology, Gyeonggi-do, KR<br />
Kim, Jin-baek c/o Korea Advanced Inst. of<br />
Science and Technology, Daejeon, KR<br />
Park, Byung-ha c/o Samsung Advanced<br />
Institute of Technology, Gyeonggi-do, KR<br />
Ha, Young-ung c/o Samsung Advanced<br />
Institute of Technology, Gyeonggi-do, KR<br />
Kim, Su-min c/o Korea Advanced Inst. of<br />
Science and Technology, Daejeon, KR<br />
(74) Zijlstra, Robert Wiebo Johan, Elkington and<br />
Fife LLP Prospect House 8 Pembroke Road,<br />
Sevenoaks, Kent TN13 1XR, GB<br />
G03F 7/038 → (51) G03F 7/033<br />
(51) G03F 7/20 (11) 2 023 205 A2<br />
(25) En (26) En<br />
(21) 08012920.8 (22) 17.<strong>07</strong>.2008<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HR HU IE IS IT LI LT LU LV MC MT NL<br />
NO PL PT RO SE SI SK TR<br />
AL BA MK RS<br />
(30) 09.08.20<strong>07</strong> KR 20<strong>07</strong>0080268<br />
(54) • Gerät zum Formen von Nano-Mustern und<br />
Verfahren zum Formen von Nano-Mustern<br />
unter Verwendung dieses Geräts<br />
• Apparatus for forming nano pattern and<br />
method for forming the nano pattern using<br />
the same<br />
• Appareil pour la formation d'un nanomotif<br />
et procédé pour la formation d'un nanomotif<br />
l'utilisant<br />
(71) Samsung Electro-Mechanics Co., Ltd., 314<br />
Maetan3-dong, Yeongtong-gu Suwon<br />
Gyunggi-do, KR<br />
(72) Park, Moo Youn, Gwangmyeong-si<br />
Gyeonggi-do 423-737, KR<br />
Kim, Jin Ha, Seongnam-si Gyeonggi-do 463-<br />
480, KR<br />
Hwang, Soo Ryong, Gunpo-si Gyeonggi-do<br />
435-050, KR<br />
Jung, Il Hyung, Seoul 135-080, KR<br />
Lee, Jong Ho, Seoul 139-054, KR<br />
(74) Böck, Bernhard, Advotec. <strong>Patent</strong>- und<br />
Rechtsanwälte Beethovenstrasse 5, 97080<br />
Würzburg, DE<br />
(51) G03F 7/20 (11) 2 023 206 A1<br />
(25) En (26) En<br />
(21) 08162028.8 (22) <strong>07</strong>.08.2008
Change language