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tel-00117263, version 2 - 29 Jan 2007 Thierry DI GILIO B.2 Courant tunnel direct Dans le cas du courant tunnel direct, il faut considérer plusieurs composantes (Fig. III.34) : les électrons de la bande de conduction (ECB), les électrons de la bande de valence (EVB) qui participent au courant substrat et les trous de la bande de valence (HVB) 4 . Les expres- sions (B.2), (B.3) et (B.6) restent valables, mais cette fois ci, x1 = Tox. On obtient ainsi après intégration 3 : et � TDT (E,Et) = exp − 4 (2mox) 3 1/2 q� × (φS + EF S − E + mt/moxEt) 3/2 − (φS + EF S − E + mt/moxEt − qVox) 3/2 � JDT = � 1 − AF 2 OX � φS−qVOX φS � 1/2 � 2 exp � Fox − B FOX φ 3/2 S − (φS − qVOX) 3/2 φ 3/2 S � (B.11) Sur la Fig. B.2 on compare les mesures des densités de courant de Grille pour l’oxyde mince et pour les oxydes épais. La différence de comportement entre les deux modes est nette, le mode DT demande de très faibles tensions VGS pour donner une plus forte densité de courant. 4. W-C. Lee, C. Hu, “modeling CMOS tunneling currents through ultrathin oxide due to conduction- and valence-band electrons ans holes tunneling”, IEEE transactions on electronic devices, vol 48, no. 7, 1366- -1373 pp., 2001. 226
tel-00117263, version 2 - 29 Jan 2007 Annexes B FIG. B.2 – Mesures des densités des courants pour les trois technologies T1, T2 et T3. 227
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