Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA

like to thank all member of the Institute of Nanostructure Technologies
and Analytics (INA) for their sincere hospitality during my stay
in Germany.
I knowledge the cooperation with our project partner Paul Drude
Institute (PDI) -Berlin, especially Dr. Achim Trampert and the PhD
student Wu Mingjian for the TEM characterizations and the very
useful discussions.
Sohaib Afzal, Muhammad Usman, Vitalii Ivanov, Verena Zurbig and
Vitalii Sichkovskyi are acknowledged for providing research related
help and giving good company not only in the institute but also in
meetings and conferences.
I would like to acknownledge the team work in Monalisa project and
inside the laboratories with Muhammad Usman for the scientic discussions
and the nice time we spent in the laboratories. Thanks for all
the pre-patterning work of silicon substrates and the e-beam training
for Kerstin Fuchs.
I would like to acknowledge also the team work inside molecular beam
epitaxy (MBE) laboratory with Dr. Alexander Gushterov, Dr. Emil-
Mihai Pavelesco, Vitalii Ivanov for giving me the best training for
MBE system and for the useful scientic discussions.
I would like to thank Dr. Cyril Popov for his help in the chemical
laboratory for the wet etching processes and the full introduction of
all the chemicals inside INA as well as his continuous support and
encourage in managerial and general life issues.
I would like also to thank Dr. Alexander Gushterov and Tino Pfau
for giving me the excellent training to use atomic force microscopy
(AFM) system.
I acknowledge the nancial support and assistance of Federal Ministry
of Education and research Germany (BMBF) under the project
MONALISA for this research work.