Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA
Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA
Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA
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Hetero<strong>epitaxial</strong> Growth <strong>of</strong> <strong>III</strong>-V Semiconductor on Silicon Substrates<br />
stress and strain introduced by mismatched system and crystal defects. The purpose<br />
<strong>of</strong> this chapter is to review the properties and challenges <strong>of</strong> the <strong>epitaxial</strong><br />
integration <strong>of</strong> <strong>III</strong>-V <strong>semiconductor</strong>s on silicon substrates that bear on these aspects<br />
<strong>of</strong> heteroepitaxy, including crystallographic properties, elastic properties,<br />
surface properties as well as the dierent types <strong>of</strong> structural defects.<br />
3.2 The Concept <strong>of</strong> Epitaxy<br />
The term "<strong>epitaxial</strong>" is applied to a lm grown on top <strong>of</strong> the crystalline substrate<br />
in ordered fashion that atomic arrangement <strong>of</strong> the lm accepts crystallographic<br />
structure <strong>of</strong> the substrate. Epitaxial <strong>growth</strong> is one <strong>of</strong> the most important<br />
techniques to fabricate various "state <strong>of</strong> the art" electronic and optical devices.<br />
Modern devices require very sophisticated structures, which are composed <strong>of</strong> thin<br />
layers with various compositions. Quality, performance and lifetime <strong>of</strong> these devices<br />
are determined by the purity, structural perfection and homogeneity <strong>of</strong> the<br />
<strong>epitaxial</strong> layers [31]. Epitaxial crystal <strong>growth</strong> resulting in <strong>epitaxial</strong> layer perfection,<br />
surface atness and interface abruptness depend on a number <strong>of</strong> factors like:<br />
The <strong>epitaxial</strong> layer <strong>growth</strong> method, the interfacial energy between substrate and<br />
<strong>epitaxial</strong> lm, as well as the <strong>growth</strong> parameters - thermodynamic driving force,<br />
substrate and layer mist, substrate misorientation, <strong>growth</strong> temperature, etc.<br />
Recently <strong>epitaxial</strong> <strong>growth</strong> is used intensively for the fabrication <strong>of</strong> <strong>semiconductor</strong><br />
quantum structures like quantum dots giving highly perfect structures with high<br />
density.<br />
3.2.1 Fundamental Processes During Epitaxy<br />
Regardless <strong>of</strong> the <strong>growth</strong> technique, atoms and molecules are delivered to the<br />
substrate surface, and a large fraction <strong>of</strong> these species adsorb on the surface. Once<br />
adsorbed, there are three things that can happen to an adatom. It can either form<br />
a strong chemical bond to the surface where it is trapped, diuse on the surface<br />
to nd an energetically preferred location prior to strong chemical bonding or<br />
desorb. Once adsorbed chemically, the adatoms can diuse on the surface and<br />
this diusion can be highly anisotropic, depending on the symmetry and nature <strong>of</strong><br />
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