Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA
Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA
Molecular beam epitaxial growth of III-V semiconductor ... - KOBRA
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
Theoretical Background <strong>of</strong> Semiconductor Nanostructures<br />
level can enhance material functions and characteristics, leading to considerable<br />
energy savings and environmental load reduction. However, according to this<br />
approach which is based on the monolithic integration <strong>of</strong> nanostructures <strong>semiconductor</strong>,<br />
such as (quantum dots QDs, quantum wells QWs, etc.) on silicon<br />
substrates. Nanostructures, such as quantum dots (QDs), can be fabricated with<br />
either a top-down technique or bottom-up technique. Top-down techniques are<br />
great for generating a uniform distribution <strong>of</strong> diameters. Unfortunately, top-down<br />
approaches like lithography are limited by the diraction limit and implies material<br />
damage and defects. The most common way to create a QD is through a<br />
bottom-up approach. This can be done either with metal-organic chemical vapor<br />
deposition (MOCVD) or MBE. Self-assembled quantum dots (SAQDs) nucleate<br />
spontaneously under certain conditions during MBE and metal-organic vapor<br />
phase epitaxy (MOVPE), when a material is grown on a substrate to which<br />
it is not lattice-matched. The resulting strain produces coherently strained islands<br />
on top <strong>of</strong> a two-dimensional wetting layer. This <strong>growth</strong> mode is known as<br />
Stranski-Krastanov (SK) <strong>growth</strong> (like InAs QDs on GaAs system). The islands<br />
can be subsequently buried to form the quantum dot. Therefore, the fundamental<br />
understanding <strong>of</strong> low-dimensional <strong>semiconductor</strong> physics and the electronic con-<br />
nement inside these structures is essential for the <strong>growth</strong> and characterization<br />
<strong>of</strong> these systems including their new structural and optical properties, etc. The<br />
next section will bring the focus on the underlaying physics, which explains these<br />
interesting nanostructures.<br />
2.3 Low-Dimensional Semiconductor (Nanostrtuctures)<br />
With the advent <strong>of</strong> <strong>epitaxial</strong> <strong>growth</strong> techniques like molecular <strong>beam</strong> epitaxy<br />
(MBE), the realization <strong>of</strong> low-dimensional structures became feasible. However,<br />
when one <strong>of</strong> the three spatial dimensions <strong>of</strong> a bulk solid, like in <strong>semiconductor</strong><br />
material, is <strong>of</strong> a size comparable to de Broglie wavelength (λ B ) (Eq. 2.1) <strong>of</strong> the<br />
electrons or smaller, this means we are dealing with a material or a structure<br />
<strong>of</strong> low-dimensionality (nanostructure) [18], which is referred as two-dimension<br />
12