xxiii Ïανελληνιο ÏÏ Î½ÎµÎ´Ïιο ÏÏ ÏÎ¹ÎºÎ·Ï ÏÏεÏÎµÎ±Ï ÎºÎ±ÏαÏÏαÏÎ·Ï & εÏιÏÏÎ·Î¼Î·Ï ...
xxiii Ïανελληνιο ÏÏ Î½ÎµÎ´Ïιο ÏÏ ÏÎ¹ÎºÎ·Ï ÏÏεÏÎµÎ±Ï ÎºÎ±ÏαÏÏαÏÎ·Ï & εÏιÏÏÎ·Î¼Î·Ï ...
xxiii Ïανελληνιο ÏÏ Î½ÎµÎ´Ïιο ÏÏ ÏÎ¹ÎºÎ·Ï ÏÏεÏÎµÎ±Ï ÎºÎ±ÏαÏÏαÏÎ·Ï & εÏιÏÏÎ·Î¼Î·Ï ...
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
the deposited film in relation to the target material. The latter is ZrO 2 stabilized by 8 wt.% Y 2 O 3 in the form of lumps, ~2mm<br />
in diameter.<br />
The growth rate has been proportional to the electron gun power and for our purposes it has ranged from 5 to 25<br />
Å/sec. However, the deposition process is unstable and takes a lot of effort to keep the rate limited. Films deposited at lower<br />
rates presented better adhesion and uniformity, while films created at higher rates exhibited abnormalities. Different types of<br />
substrates were chosen in order to understand the influence of substrate material and structure on the film growth process. As<br />
seen in Fig. 2 the films possess the property of uniformity, as stated earlier. Only when we examine the film in the nanoscale<br />
region do we observe some texture, which consists of granules in the size of ~50nm. While observing the cross section of the<br />
film we observe typical columnar structures [7].<br />
Conclusion<br />
Figure 2. SEM Images of Film on K-glass and NiO-YSZ<br />
Vacuum deposition with the e-beam technique is suitable for preparing thin YSZ films on various substrates. This<br />
technique provides high deposition rates and the ability to control the film’s morphology. Depending on the deposition<br />
parameters, the films have a packing density ranging between 0.6 and 0.9 and a crystallity size of 40 – 70 nm. The deposition<br />
process is difficult to control; however, the adhesion of the film on the substrate and the homogeneity it presented was<br />
satisfactory.<br />
Acknowledgement<br />
The authors wish to thank the European Social Fund (ESF), Operational Program for<br />
Educational and Vocational Training, and particularly the Program (PENED 2003), for partial<br />
funding of this work.<br />
ΓΕΝΙΚΗ ΓΡΑΜΜΑΤΕΙΑ ΕΡΕΥΝΑΣ ΚΑΙ ΤΕΧΝΟΛΟΓΙΑΣ<br />
«ΠΡΟΓΡΑΜΜΑ ΕΝΙΣΧΥΣΗΣ ΤΟΥ ΕΡΕΥΝΗΤΙΚΟΥ ΔΥΝΑΜΙΚΟΥ (ΠΕΝΕΔ) 2003»<br />
References<br />
[1] W. Nernst, Z. Electrochem., 6 (1899) 41<br />
[2] S. C. Singhal, K. Kendall, High Temperature Solid Oxide Fuel Cells, Elsevier, 2003<br />
[3] F. Snijkers, A. de Wilde, S. Mullens, J. Luyten, J. Eur. Ceram. Soc. 24 (2004) 1107<br />
[4] H. B. Wang, C. R. Xia, G. Y. Meng, D. K. Peng, Mater. Lett. 44 (2000) 23<br />
[5] E. Wanzenberg, F. Tietz, D. Kek, P. Panjan, D. Stover, Sol. St. Ionics, 164 (2003) 121<br />
[6] J. H. Suh, S. H. Oh, H. S. Kim, S. Y. Choi, C. G. park, Vacuum 74 (3-4) (2004) 423<br />
[7] K. Wada, M. Yoshiya, N. Yamaguchi, H. Matsubara, Surf. & Coat. Technology, 200 (2006) 2725<br />
215