Bulletin 2011/50 - European Patent Office
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Bulletin 2011/50 - European Patent Office

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(C23C) I.1(1)<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) EP 2010/000684 04.02.2010<br />

(87) WO 2010/089110 2010/32 12.08.2010<br />

(30) 04.02.2009 PCT/EP2009/0007<strong>50</strong><br />

(54) • VERFAHREN ZUM BESCHICHTEN VON<br />

DISKRETEN ARTIKELN MIT AUF ZINK<br />

BASIERENDER LEGIERUNGSSCHICHT<br />

• PROCESS FOR COATING DISCRETE ARTI-<br />

CLES WITH A ZINC-BASED ALLOYED<br />

LAYER<br />

• PROCÉDÉ POUR REVÊTIR DES ARTICLES<br />

INDIVIDUELS AVEC UNE COUCHE D'AL-<br />

LIAGE À BASE DE ZINC<br />

(71) Umicore, Rue du Marais 31, 1000 Brussels,<br />

BE<br />

(72) GAY, Bruno, B-1000 Brussels, BE<br />

PETIT, Etienne, F-57155 Marly, FR<br />

(74) Pilate, André, Umicore Research <strong>Patent</strong><br />

Department Kasteelstraat 7, B-22<strong>50</strong> Olen, BE<br />

(51) C23C 14/22 (11) 2 393 957 A1*<br />

G11C 16/02 H01L 27/24<br />

H01L 45/00<br />

(25) En (26) En<br />

(21) 10702188.3 (22) 26.01.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) US 2010/022035 26.01.2010<br />

(87) WO 2010/090900 2010/32 12.08.2010<br />

(30) 04.02.2009 US 365473<br />

(54) • VERFAHREN ZUR BILDUNG EINER SPEI-<br />

CHERZELLE UNTER VERWENDUNG VON<br />

GASCLUSTERIONENSTRAHLEN<br />

• METHOD OF FORMING MEMORY CELL<br />

USING GAS CLUSTER ION BEAMS<br />

• PROCÉDÉ DE FORMATION D'UNE CEL-<br />

LULE DE MÉMOIRE EN UTILISANT DES<br />

FAISCEAUX D'IONS D'AMAS GAZEUX<br />

(71) Micron Technology, Inc., 800 South Federal<br />

Way, Boise, ID 83707-0006, US<br />

(72) SMYTHE, John, Boise, ID 83709, US<br />

(74) Small, Gary James, Carpmaels & Ransford<br />

One Southampton Row, London WC1B 5HA,<br />

GB<br />

(51) C23C 14/56 (11) 2 393 958 A2*<br />

(25) En (26) En<br />

(21) 10707142.5 (22) 01.02.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) LV 2010/000001 01.02.2010<br />

(87) WO 2010/090<strong>50</strong>4 2010/32 12.08.2010<br />

(88) 18.11.2010<br />

(30) 03.02.2009 LV 090016<br />

(54) • HOCHPRODUKTIVES GERÄT ZUR<br />

VAKUUMBESCHICHTUNG VON WALZEN-<br />

SUBSTRATEN<br />

• HIGHLY PRODUCTIVE APPARATUS FOR<br />

VACUUM COATING ROLL SUBSTRATES<br />

• APPAREIL HAUTEMENT PRODUCTIF<br />

POUR LA VAPORISATION SOUS VIDE DE<br />

SUBSTRATS EN ROULEAU<br />

(71) Sidrabe, Inc., 17 Krustpils Str., LV-1073<br />

Riga, LV<br />

(72) JADINS, Edgars, LV-2008 Jurmala, LV<br />

AUSVALDS, Eduards, LV-1021Riga, LV<br />

GAIDLAZDA, Aivars, LV-1009 Riga, LV<br />

(51) C23C 16/26 (11) 2 393 959 A2*<br />

C01B 31/02<br />

H01M 4/96<br />

H01G 9/042<br />

(25) En (26) En<br />

(21) 10739228.4 (22) 08.02.2010<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) US 2010/023484 08.02.2010<br />

(87) WO 2010/091352 2010/32 12.08.2010<br />

(88) 14.04.<strong>2011</strong><br />

(30) 09.02.2009 US 151159 P<br />

25.02.2009 US 155454 P<br />

02.03.2009 US 156862 P<br />

30.06.2009 US 459313<br />

(54) • MESOPORÖSE KOHLENSTOFFMATERIA-<br />

LIEN FÜR ENERGIESPEICHERUNG<br />

• MESOPOROUS CARBON MATERIAL FOR<br />

ENERGY STORAGE<br />

• MATÉRIAU À BASE DE CARBONE À<br />

MÉSOPORES POUR STOCKAGE D'ÉNER-<br />

GIE<br />

(71) Applied Materials, Inc., 30<strong>50</strong> Bowers Avenue,<br />

Santa Clara, CA 9<strong>50</strong>54, US<br />

(72) LOPATIN, Sergey, Morgan Hill, California<br />

9<strong>50</strong>37, US<br />

BACHRACH, Robert Z., Burlingame, California<br />

94010, US<br />

BREVNOV, Dmitri A., Santa Clara, California<br />

9<strong>50</strong>54, US<br />

LAZIK, Christopher S., Fremont, California<br />

94555, US<br />

JIN, Miao, San Jose, California 95131, US<br />

URITSKY, Yuri, Newark, California 94560,<br />

US<br />

(74) Zimmermann & Partner, Josephspitalstr. 15,<br />

80331 München, DE<br />

C23C 16/40 → (51) B05D 7/24<br />

(51) C23C 16/455 (11) 2 393 960 A1*<br />

(25) Fi (26) En<br />

(21) 10738248.3 (22) 08.02.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) FI 2010/0<strong>50</strong>077 08.02.2010<br />

(87) WO 2010/089459 2010/32 12.08.2010<br />

(30) 09.02.2009 FI 20095124<br />

(54) • REAKTIONSKAMMER<br />

• REACTION CHAMBER<br />

• CHAMBRE DE RÉACTION<br />

(71) Beneq Oy, Ensimmäinen savu, 01510 Vantaa,<br />

FI<br />

(72) PELTONIEMI, Janne, FI-03300 Otalampi, FI<br />

SOININEN, Pekka, FI-00100 Helsinki, FI<br />

(74) Keinänen, Anu, BORENIUS & Co Oy Ab<br />

Itämerenkatu 5, 00180 Helsinki, FI<br />

(51) C23C 16/455 (11) 2 393 961 A1*<br />

C23C 16/458 C23C 16/54<br />

(25) Fi (26) En<br />

(21) 107382<strong>50</strong>.9 (22) 08.02.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) FI 2010/0<strong>50</strong>080 08.02.2010<br />

(87) WO 2010/089461 2010/32 12.08.2010<br />

(30) 09.02.2009 FI 20095126<br />

(54) • ATOMLAGENABSCHEIDUNGSREAKTOR,<br />

VERFAHREN ZUR BELADUNG EINES<br />

ATOMLAGENABSCHEIDUNGSREAKTOR<br />

UND FERTIGUNGSLINIE<br />

• ALD REACTOR, METHOD FOR LOADING<br />

ALD REACTOR, AND PRODUCTION LINE<br />

• RÉACTEUR ALD, PROCÉDÉ DE CHARGE-<br />

MENT DE RÉACTEUR ALD ET CHAÎNE DE<br />

PRODUCTION<br />

(71) Beneq Oy, Ensimmäinen savu, 01510 Vantaa,<br />

FI<br />

(72) SOININEN, Pekka, FI-00100 Helsinki, FI<br />

SKARP, Jarmo, FI-027<strong>50</strong> Espoo, FI<br />

99<br />

Anmeldungen<br />

Applications<br />

Demandes (<strong>50</strong>/<strong>2011</strong>) 14.12.<strong>2011</strong><br />

(74) Keinänen, Anu, et al, BORENIUS & Co Oy Ab<br />

Itämerenkatu 5, 00180 Helsinki, FI<br />

C23C 16/458 → (51) C23C 16/455<br />

C23C 16/54 → (51) C23C 16/455<br />

C23C 16/54 → (51) G01N 21/25<br />

C23C 22/83 → (51) B05D 1/38<br />

C23F 13/00 → (51) C23F 13/18<br />

(51) C23F 13/18 (11) 2 393 962 A1*<br />

C23F 13/00<br />

(25) Fi (26) En<br />

(21) 10738246.7 (22) 05.02.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) FI 2010/0<strong>50</strong>073 05.02.2010<br />

(87) WO 2010/089457 2010/32 12.08.2010<br />

(30) 05.02.2009 FI 20095105<br />

(54) • ELEKTRODENELEMENT UND VERFAHREN<br />

ZUR VERBINDUNG DES ELEKTRODENE-<br />

LEMENTS UND ANORDNUNG FÜR<br />

ELEKTROCHEMISCHEN SCHUTZ<br />

• ELECTRODE ELEMENT AND A METHOD<br />

FOR CONNECTING THE ELECTRODE ELE-<br />

MENT AND AN ARRANGEMENT FOR<br />

ELECTROCHEMICAL PROTECTION<br />

• ÉLÉMENT ÉLECTRODE ET PROCÉDÉ DE<br />

CONNEXION DE L'ÉLÉMENT ÉLECTRODE<br />

ET AGENCEMENT POUR PROTECTION<br />

ÉLECTROCHIMIQUE<br />

(71) Leion OY, Esseninkatu 15, <strong>50</strong>170 Mikkeli, FI<br />

(72) ELFVING, Jouko, FI-<strong>50</strong>170 Mikkeli, FI<br />

(74) Helke, Kimmo Kalervo, Kespat Oy P.O. Box<br />

601, 40101 Jyväskylä, FI<br />

(51) C23F 13/20 (11) 2 393 963 A1*<br />

G01F 1/58 G01F 1/60<br />

G01F 15/00<br />

(25) En (26) En<br />

(21) 09776359.3 (22) 04.02.2009<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK TR<br />

(86) EP 2009/000746 04.02.2009<br />

(87) WO 2010/088921 2010/32 12.08.2010<br />

(54) • ELEKTROMAGNETISCHER STRÖMUNGS-<br />

MESSER MIT KORROSIONSSCHUTZ VON<br />

MESSELEKTRODEN UND VERFAHREN<br />

DAMIT<br />

• ELECTROMAGNETIC FLOWMETER HAV-<br />

ING CORROSION PROTECTION OF MEA-<br />

SURING ELECTRODES, AND METHOD<br />

INCORPORATING THE SAME<br />

• DÉBITMÈTRE ÉLECTROMAGNÉTIQUE<br />

AYANT UNE PROTECTION CONTRE LA<br />

CORROSION D'ÉLECTRODES DE MESURE,<br />

ET PROCÉDÉ L'INCORPORANT<br />

(71) Siemens Aktiengesellschaft, Wittelsbacherplatz<br />

2, 80333 München, DE<br />

(72) MATZEN, Steen Moellebjerg, DK-6470<br />

Sydals, DK<br />

C25B 11/04 → (51) H01M 4/02<br />

(51) C25D 5/10 (11) 2 393 964 A1*<br />

H01L 31/032<br />

(25) En (26) En<br />

(21) 10739244.1 (22) 08.02.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) US 2010/023517 08.02.2010<br />

(87) WO 2010/091369 2010/32 12.08.2010

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