Bulletin 2009/49 - European Patent Office
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(C01G) I.1(2)<br />

• SPHERICAL FERRITE NANOPARTICLE<br />

AND METHOD FOR PRODUCTION<br />

THEREOF<br />

• NANOPARTICULES SPHÉRIQUES DE FER-<br />

RITE ET LEUR PROCÉDÉ DE FABRICATION<br />

(71) Tokyo Institute of Technology, 2-12-1,<br />

Ookayama Meguro-ku, Tokyo 152-8500, JP<br />

Tamagawa Seiki Kabushiki Kaisha, 1879,<br />

Ooyasumi, Iida-shi, Nagano 395-8515, JP<br />

(72) ABE, Masanori, Meguro-ku Tokyo 152-8550,<br />

JP<br />

HANDA, Hiroshi, Meguro-ku Tokyo 152-<br />

8550, JP<br />

NAKAGAWA, Takashi, Meguro-ku Tokyo<br />

152-8550, JP<br />

TADA, Masaru, Meguro-ku Tokyo 152-8550,<br />

JP<br />

SHIMAZU, Ryuichi, Meguro-ku Tokyo 152-<br />

8550, JP<br />

TANAKA, Toshiyuki, Meguro-ku Tokyo 152-<br />

8550, JP<br />

(74) Kramer - Barske - Schmidtchen, <strong>European</strong><br />

<strong>Patent</strong> Attorneys Landsberger Strasse 300,<br />

80687 München, DE<br />

(51) C01G 53/00 (11) 2 128 096 A1<br />

H01M 4/02 H01M 4/52<br />

(25) Ja (26) En<br />

(21) 08704381.6 (22) 28.01.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

(86) JP 2008/051702 28.01.2008<br />

(87) WO 2008/091028 2008/31 31.07.2008<br />

(30) 26.01.2007 JP 2007017155<br />

(54) • LITHIUMÜBERGANGSMETALLOXID MIT<br />

SCHICHTSTRUKTUR<br />

• LITHIUM TRANSITION METAL OXIDE<br />

HAVING LAYERED STRUCTURE<br />

• OXYDE DE LITHIUM ET DE MÉTAL DE<br />

TRANSITION AYANT UNE STRUCTURE EN<br />

COUCHES<br />

(71) Mitsui Mining & Smelting Co., Ltd, 11-1,<br />

Osaki 1-chome, Shinagawa-ku Tokyo 141-<br />

8584, JP<br />

(72) TAKEUCHI, Tomoya, Takehara-shi Hiroshima<br />

725-0025, JP<br />

KAGEI, Shinya, Takehara-shi Hiroshima 725-<br />

0025, JP<br />

KUMADA, Naoki, Takehara-shi Hiroshima<br />

725-0025, JP<br />

MYIANOHARA, Keisuke, Takehara-shi Hiroshima<br />

725-0025, JP<br />

(74) Gille Hrabal Struck Neidlein Prop Roos,<br />

<strong>Patent</strong>anwälte Brucknerstrasse 20, 40593<br />

Düsseldorf, DE<br />

C02F 1/48 → (51) A23L 2/50<br />

C02F 3/22 → (51) C02F 3/30<br />

(51) C02F 3/30 (11) 2 128 097 A1<br />

C02F 3/22<br />

(25) Fr (26) Fr<br />

(21) 08009794.2 (22) 29.05.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

AL BA MK RS<br />

(54) • Belebtschlamm Vorrichtung zur Klärung<br />

kommunaler Abwässer mit Hilfe von in<br />

einem geschlossenen Reaktor<br />

• Device for treating urban waste water by<br />

activated sludge in a sealed reaction<br />

chamber<br />

• Dispositif d'épuration d'eaux résiduaires<br />

urbaines par boues activées en réacteur<br />

fermé<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

(71) Welter, André, 29 Rue de Beringen, 7517<br />

Mersch, LU<br />

(72) Welter, André, 7517 Mersch, LU<br />

(74) pronovem, <strong>Office</strong> Van Malderen 261 Route<br />

d'Arlon, 8002 Strassen, LU<br />

C02F 11/08 → (51) C05F 17/00<br />

(51) C03B 19/09 (11) 2 128 098 A1<br />

C30B 15/10 C30B 35/00<br />

(25) En (26) En<br />

(21) 09007070.7 (22) 27.05.<strong>2009</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK TR<br />

(30) 28.05.2008 JP 20081394<strong>49</strong><br />

(54) • Quarzglastiegel und Verfahren zu seiner<br />

Herstellung<br />

• Silica glass crucible and method for<br />

manufacturing the same<br />

• Creuset en verre de silice et son procédé de<br />

fabrication<br />

(71) Japan Super Quartz Corporation, 5-14-3<br />

Barajima, Akita-shi Akita 010-0065, JP<br />

(72) Kishi, Hiroshi, Akita-shi Akita, 010-0065, JP<br />

(74) Banzer, Hans-Jörg, Kraus & Weisert <strong>Patent</strong>und<br />

Rechtsanwälte Thomas-Wimmer-Ring<br />

15, 80539 München, DE<br />

(51) C03B 23/027 (11) 2 128 099 A1<br />

C03B 23/03<br />

(25) Ja (26) En<br />

(21) 07850829.8 (22) 18.12.2007<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HU IE IS IT LI LT LU LV MC MT NL PL PT<br />

RO SE SI SK TR<br />

(86) JP 2007/074343 18.12.2007<br />

(87) WO 2008/075694 2008/26 26.06.2008<br />

(30) 19.12.2006 JP 2006341471<br />

(54) • VERFAHREN UND VORRICHTUNG ZUM<br />

FORMEN EINER GEKRÜMMTEN GLAS-<br />

PLATTE<br />

• METHOD AND APPARATUS FOR FORMING<br />

CURVED GLASS PLATE<br />

• PROCÉDÉ ET APPAREIL PERMETTANT DE<br />

FORMER UNE PLAQUE DE VERRE BOM-<br />

BÉE<br />

(71) Asahi Glass Company, Limited, 12-1 Yurakucho<br />

1-chome, Chiyoda-ku Tokyo 100-<br />

8405, JP<br />

(72) FUKAMI, Masao, Chiyoda-ku Tokyo 100-<br />

8405, JP<br />

MORI, Taisei, Chiyoda-ku Tokyo 100-8405,<br />

JP<br />

KITAJIMA, Yutaka, Chiyoda-ku Tokyo 100-<br />

8405, JP<br />

IZUMI, Koji, Nishio-shi Aichi 445-0891, JP<br />

(74) Müller-Boré & Partner <strong>Patent</strong>anwälte, Grafinger<br />

Strasse 2, 81671 München, DE<br />

C03B 23/03 → (51) C03B 23/027<br />

(51) C03B 37/014 (11) 2 128 100 A1<br />

C03B 37/018<br />

(25) En (26) En<br />

(21) 09160044.5 (22) 12.05.<strong>2009</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK TR<br />

(30) 13.05.2008 JP 2008126148<br />

(54) • Verfahren zur Herstellung poröser Glasgrundwerkstoffe<br />

und Vorrichtung zur<br />

Steuerung der Gasdurchflussrate<br />

• Porous Glass Base Material Manufacturing<br />

Method and Gas Flow Rate Control<br />

Apparatus<br />

• Procédé de fabrication de matériau de base<br />

de verre poreux et appareil de contrôle du<br />

débit de gaz<br />

480<br />

Anmeldungen<br />

Applications<br />

Demandes (<strong>49</strong>/<strong>2009</strong>) 02.12.<strong>2009</strong><br />

(71) Shin-Etsu Chemical Co., Ltd., 6-1, Otemachi<br />

2-chome, Chiyoda-ku, Tokyo 100-0004, JP<br />

(72) Yoshida, Makoto, Ibaraki 314-0102, JP<br />

(74) Michalski Hüttermann & Partner <strong>Patent</strong>anwälte,<br />

Neuer Zollhof 2, 40221 Düsseldorf, DE<br />

C03B 37/018 → (51) C03B 37/014<br />

C03C 3/064 → (51) C03C 21/00<br />

C03C 3/066 → (51) C03C 21/00<br />

C03C 3/068 → (51) C03C 21/00<br />

C03C 3/072 → (51) C03C 21/00<br />

C03C 3/074 → (51) C03C 21/00<br />

(51) C03C 3/087 (11) 2 128 101 A1<br />

C03C 3/091<br />

(25) En (26) En<br />

(21) 09161441.2 (22) 28.05.<strong>2009</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK TR<br />

(30) 30.05.2008 US 130474 P<br />

(54) • Boraluminiumsilicat-Gläser<br />

• Boroalumino silicate glasses<br />

• Verres en boroaluminosilicate<br />

(71) Corning Inc., 1 Riverfront Plaza, Corning, NY<br />

14831, US<br />

(72) Ellison, Adam James, New York, NY 14870,<br />

US<br />

(74) Marchant, James Ian, Elkington and Fife LLP<br />

Prospect House 8 Pembroke Road, Sevenoaks,<br />

Kent TN13 1XR, GB<br />

C03C 3/091 → (51) C03C 3/087<br />

C03C 3/11 → (51) C03C 21/00<br />

(51) C03C 3/247 (11) 2 128 102 A1<br />

(25) En (26) En<br />

(21) 09161350.5 (22) 28.05.<strong>2009</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK TR<br />

(30) 30.05.2008 JP 2008142950<br />

(54) • Optisches Glas, Glasmaterial zum Formpressen,<br />

Rohling für optisches Element,<br />

optisches Element und Herstellungsverfahren<br />

dafür<br />

• Optical glass, glass material for press<br />

molding, optical element blank, optical<br />

element and manufacturing method thereof<br />

• Verre optique, matériau de verre pour<br />

moulage par compression, ébauche d'élément<br />

optique, élément optique et son<br />

procédé de fabrication<br />

(71) Hoya Corporation, 2-7-5 Naka-Ochiai, Shinjuku-ku,<br />

Tokyo 161-8525, JP<br />

(72) Ikenishi, Mikio, Tokyo 161-8525, JP<br />

(74) Schaumburg, Thoenes, Thurn, Landskron,<br />

Eckert, <strong>Patent</strong>anwälte Postfach 86 07 48,<br />

81634 München, DE<br />

C03C 13/00 → (51) D01F 9/08<br />

C03C 13/02 → (51) C01G 25/00<br />

C03C 13/02 → (51) D01F 9/08<br />

(51) C03C 17/30 (11) 2 128 103 A1<br />

C03C 27/04 C08G 18/10<br />

C09D 183/08 C09J 175/00<br />

C09J 175/02 C09J 175/04<br />

(25) De (26) De<br />

(21) 08157104.4 (22) 28.05.2008

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