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characterization, modeling, and design of esd protection circuits

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3.6. Extraction <strong>of</strong> MOSFET Pf vs. tf Curve 85<br />

It is clear, however, that by applying boundary conditions with large thermal resistances<br />

around the 2D simulation structure the peak temperature is increased for a given input<br />

power, which means the simulated power to failure is reduced. This method will be used<br />

in the next chapter to calibrate simulated Pf vs. tf curves to experimental curves, but it is<br />

apparent that caution should be taken against using thermal resistances which are higher<br />

than physically justifiable, a definite risk considering the inherent overestimation <strong>of</strong> the<br />

power to failure in the 2D model.<br />

This section has focused on the use <strong>of</strong> monitoring the peak lattice temperature in<br />

predicting thermal failure <strong>of</strong> ESD <strong>protection</strong> devices. Presumably, when the peak<br />

temperature reaches a critical value, second breakdown occurs <strong>and</strong> device damage follows<br />

instantaneously due to gross melting. If the object <strong>of</strong> simulation were to correlate<br />

simulations with this analytical thermal-model definition <strong>of</strong> failure, then it would only be<br />

necessary to monitor the peak temperature in the simulations. But although device failure,<br />

which is really defined by an increase in leakage current above a specified threshold level,<br />

correlates well with the occurrence <strong>of</strong> second breakdown for stress times greater than<br />

about 100ns, as mentioned in Chapter 2 for very short pulses device leakage can be<br />

increased above the failure level without the device exhibiting second breakdown because<br />

the damage site is too localized to reduce the resistance <strong>of</strong> the entire device. Since there is<br />

no unique series <strong>of</strong> events which leads to thermal failure, various phenomena should be<br />

monitored both experimentally <strong>and</strong> in simulations. During a transmission-line pulse test <strong>of</strong><br />

a real structure, it is not possible to monitor the transient temperature pr<strong>of</strong>ile, so thermally<br />

induced damage must be inferred by observing second breakdown on an oscilloscope<br />

during a pulse <strong>and</strong>/or confirmed by measuring an increased amount <strong>of</strong> leakage after the<br />

pulse. In contrast, simulations can be used to study not only the voltage drop due to second<br />

breakdown but also to study the 2D pr<strong>of</strong>iles <strong>of</strong> the lattice temperature, electric field, heat<br />

generation ( J ⋅<br />

E),<br />

<strong>and</strong> intrinsic carrier concentration (ni ). Considering the difference<br />

between the 2D <strong>and</strong> 3D thermal models, it may even be beneficial to compare<br />

experimental <strong>and</strong> simulated current to failure rather than power to failure, as suggested by<br />

Diaz [24]. Thus, while much effort was devoted to analyzing the thermal model’s ability<br />

to predict Pf vs. tf behavior, the larger goal <strong>of</strong> electrothermal simulation is to be able to<br />

predict thermal failure in actual devices using any physical characteristics accessible in a<br />

calibrated simulation.

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