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characterization, modeling, and design of esd protection circuits

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30 Chapter 2. ESD Circuit Characterization <strong>and</strong> Design Issues<br />

width <strong>of</strong> the device, the width, b, is related to the gate length, <strong>and</strong> the depth, c, is<br />

approximately equal to the drain diffusion depth. Such a model is reasonable because<br />

simulations <strong>and</strong> experiments show that the junction sidewall is the region <strong>of</strong> highest<br />

electric field <strong>and</strong> current density <strong>and</strong> is where most <strong>of</strong> the potential drop occurs. Although<br />

the current density is about the same on the source side, the electric field here is very low.<br />

In the model, failure is defined as the time at which the temperature <strong>of</strong> the hottest pointthe<br />

center <strong>of</strong> the box--reaches a critical value, Tc . This critical temperature could be<br />

1688K, the silicon melting point, or, more accurately, the temperature at which the<br />

intrinsic carrier concentration exceeds the doping level (about 1280K for a doping level <strong>of</strong><br />

10 18 cm -3 ), i.e., the onset <strong>of</strong> second breakdown. Initially, the temperature gradient in the<br />

box changes in all three dimensions until thermal equilibrium is reached in the shortest<br />

dimension, usually c, the junction depth. The time needed to reach equilibrium in the c<br />

dimension is tc c , where D is the thermal diffusivity <strong>of</strong> silicon <strong>and</strong> is equal to<br />

, where κ is the thermal conductivity, ρ is the density, <strong>and</strong> Cp is the specific heat<br />

capacity (all assumed to be independent <strong>of</strong> temperature in this model). If at time tc the<br />

peak temperature is less than Tc , the temperature gradient will continue to change in the<br />

other two dimensions until thermal equilibrium is reached in the b direction at time<br />

. Again, if the peak temperature is less than Tc at time tb , the temperature<br />

gradient in the device width direction will continue to change until time .<br />

For times greater than ta , the temperature pr<strong>of</strong>ile in the box is constant. This can be seen<br />

from the heat flow equation:<br />

2 = ⁄ 4πD<br />

κ ⁄ ρCp tb b2 = ⁄ 4πD<br />

ta a2 = ⁄ 4πD<br />

∂T<br />

ρCp∂ t<br />

= H + ∇ ( κ ( T)<br />

∇T)<br />

. (2.2)<br />

In the steady-state condition the temperature distribution must be constant because the<br />

heat source, H, is constant.<br />

By applying the T = T0 (300K) boundary conditions on the sides <strong>of</strong> the box, the heat<br />

equation can be solved to express the power to failure ( Pf = Vt2 × It2) as a function <strong>of</strong> the<br />

time-to-failure (tf , synonymous with t2 ), the dimensions <strong>of</strong> the box, <strong>and</strong> the temperature<br />

difference Tc - T0 at the center <strong>of</strong> the box. As derived in [39], the temperature at the center<br />

<strong>of</strong> the box is<br />

t<br />

P<br />

T() t T0 ------------------------- erf⎛<br />

a<br />

-------------- ⎞erf⎛ b<br />

-------------- ⎞ c<br />

=<br />

+<br />

erf⎛--------------<br />

⎞ , (2.3)<br />

ρCp ( abc)<br />

∫<br />

dτ<br />

⎝4 Dτ⎠<br />

⎝4 Dτ⎠<br />

⎝4 Dτ⎠<br />

0

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