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characterization, modeling, and design of esd protection circuits

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78 Chapter 3. Simulation: Methods <strong>and</strong> Applications<br />

ionization, for ESD simulation its most important application is the <strong>modeling</strong> <strong>of</strong> gross<br />

device heating which leads to thermal runaway. In transient simulations, if the conduction<br />

<strong>of</strong> heat away from a device is accurately modeled by the thermal boundary conditions <strong>and</strong><br />

if the defined device geometry <strong>and</strong> doping pr<strong>of</strong>iles produce the proper current densities<br />

<strong>and</strong> electric fields, electrothermal simulation should be able to predict at what time<br />

thermal failure will occur for a given input pulse <strong>and</strong> thus to generate a failure power vs.<br />

time to failure curve. Thermal runaway is inherently a three-dimensional phenomenon<br />

because the hot spot always forms at a point in a device, <strong>and</strong> after formation current rushes<br />

into the spot from all directions. Heat conduction theory predicts that if current is flowing<br />

uniformly across the width <strong>of</strong> a device <strong>and</strong> the device is surrounded by a spatially<br />

invariant heat sink, the hot spot will form in the center <strong>of</strong> the width dimension because this<br />

is the point <strong>of</strong> peak temperature. (Experimentally, it has been found that thermal runaway<br />

may originate at a “weak spot” where the electric field is slightly higher due to the erose<br />

drain edge <strong>of</strong> the gate oxide [52].) In contrast, 2D simulation can only model current<br />

rushing in from two dimensions after a hot spot forms. Although it cannot properly model<br />

the runaway itself, if current flows relatively uniformly in a device before second<br />

breakdown <strong>and</strong> the simulation cross-section is representative <strong>of</strong> the real cross-section<br />

containing the “weak spot,” 2D simulation should be able to predict the onset <strong>of</strong> second<br />

breakdown, i.e., the time at which the device voltage drops due to a reduction in overall<br />

device resistance. The simulated voltage does fall <strong>of</strong>f with time after the onset <strong>of</strong><br />

breakdown due to the negative differential resistance, but not as sharply as seen<br />

experimentally (e.g., Fig. 2.10) because current cannot rush in from the third dimension.<br />

It is illuminating to apply an analysis like that <strong>of</strong> the 3D thermal box model in<br />

Section 2.2.2 to 2D device simulation. If the assumptions are analogous, i.e., if all power<br />

generation occurs uniformly within a rectangle in the drain depletion region <strong>and</strong> second<br />

breakdown follows instantaneously when the peak temperature reaches a critical value,<br />

then it appears that the governing equation for peak temperature is just like that <strong>of</strong> the 3D<br />

case (Eq. (2.3)) except there are only two dimensions:<br />

t<br />

P′<br />

T() t T0 ---------------------- erf⎛<br />

b<br />

-------------- ⎞ c<br />

=<br />

+<br />

erf⎛--------------<br />

⎞ . (3.33)<br />

ρCp ( bc)<br />

∫<br />

dτ<br />

⎝4 Dτ⎠<br />

⎝4 Dτ⎠<br />

0<br />

Note that the width dimension, a, is omitted <strong>and</strong> the power, P, has been replaced by P´, the<br />

power per width in W/cm, which is the product <strong>of</strong> the voltage <strong>and</strong> the current per width in

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