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characterization, modeling, and design of esd protection circuits

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76 Chapter 3. Simulation: Methods <strong>and</strong> Applications<br />

(a)<br />

I device / amps<br />

(b)<br />

10 0<br />

10 -2<br />

10 -4<br />

10 -6<br />

10 -8<br />

10 -10<br />

10 -12<br />

10 0<br />

10 -2<br />

10 -4<br />

10 -6<br />

10 -8<br />

10 -10<br />

10 -12<br />

+<br />

V in<br />

-<br />

50Ω<br />

500Ω<br />

50Ω<br />

V dev<br />

DUT<br />

0 2 4 6 8 10<br />

V device / volts<br />

Fig. 3.29 I-V curves for curve-tracing (solid line) <strong>and</strong> TLP (points) simulations for<br />

a 20/0.5µm MOSFET with (a) a 2000Ω gate resistor <strong>and</strong> (b) an 8000Ω<br />

gate resistor, with the TLP circuit shown inset. Each point represents one<br />

non-catastrophic (maximum temperature < 1688K) 100ns TLP<br />

simulation with a unique pulse height. The 2000Ω TLP results are<br />

virtually identical to the curve-tracing results while the 8000Ω results are<br />

markedly different. In the 8000Ω TLP simulations the device current<br />

jumps from 1nA to 7mA with only a 0.06V increment in the pulse height.<br />

I dev

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