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characterization, modeling, and design of esd protection circuits

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Chapter 5<br />

Design <strong>and</strong> Optimization <strong>of</strong> ESD<br />

Protection Transistor Layout<br />

To ensure electrostatic discharge (ESD) robustness, a chip <strong>design</strong>er must follow certain<br />

guidelines concerning size <strong>and</strong> placement <strong>of</strong> diode <strong>and</strong> transistor clamps between different<br />

power-supply buses as well as between I/Os <strong>and</strong> supply lines. These guidelines may<br />

typically be provided by technology <strong>design</strong> rules which include minimum transistor<br />

width, optimal contact-to-gate spacing (CGS), <strong>and</strong> examples for placement <strong>and</strong> hook-up<br />

<strong>of</strong> the various <strong>protection</strong> <strong>circuits</strong>. If all <strong>of</strong> the ESD <strong>design</strong> rules are followed, the circuit<br />

<strong>design</strong>er presumes that some minimal ESD requirement will be met, typically a humanbody<br />

model (HBM) withst<strong>and</strong> voltage <strong>of</strong> 2000V. However, until actual silicon is packaged<br />

<strong>and</strong> tested, the <strong>design</strong>er usually does not know what HBM voltage the product will<br />

withst<strong>and</strong> or what quantitative changes must be made in <strong>protection</strong>-circuit layout<br />

parameters to reach a certain level <strong>of</strong> ESD robustness. The aim <strong>of</strong> this chapter is to<br />

provide circuit <strong>design</strong>ers with a methodology enabling the <strong>design</strong> <strong>of</strong> ESD circuitry which<br />

meets a product’s specific reliability needs. Provided a quantitative model, or layout rules<br />

based on this model, a circuit <strong>design</strong>er can create the optimal <strong>design</strong> for a given area <strong>and</strong><br />

have a good idea <strong>of</strong> how robust the <strong>design</strong> will be.<br />

As discussed in Chapter 2, numerous papers have analyzed the effectiveness <strong>of</strong><br />

transmission-line pulsing (TLP) measurements in characterizing the ESD response <strong>of</strong><br />

CMOS processes <strong>and</strong> <strong>circuits</strong> [21,23]. The dependence <strong>of</strong> MOS snapback I-V<br />

characteristics on layout parameters, addressed in Section 2.4, is well known [8]. While<br />

layout optimization for ESD <strong>circuits</strong> has been investigated [65,66], only recently has work<br />

been presented on a methodology which uses TLP measurements to quantitatively predict<br />

the HBM withst<strong>and</strong> voltage <strong>of</strong> any <strong>protection</strong> transistor for a given technology or to<br />

139

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