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characterization, modeling, and design of esd protection circuits

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2.5. Design Methodology 53<br />

enter second breakdown <strong>and</strong> incur thermal damage. By <strong>design</strong>ing Vt2 to be larger than Vt1 ,<br />

turn-on <strong>of</strong> all fingers can be ensured, thus maximizing the thermal-failure threshold.<br />

It is now apparent that optimization <strong>of</strong> a multifinger MOSFET <strong>protection</strong> circuit requires<br />

more than just optimizing the robustness <strong>of</strong> the individual devices. The parameters Vt1 ,<br />

Vsb , Rsb , <strong>and</strong> Vt2 <strong>of</strong> the single device must be manipulated so that Vt2 is greater than Vt1 .<br />

In such multifinger <strong>circuits</strong> Rsb is also called the ballast resistance because it is meant to<br />

stabilize the circuit by providing the necessary voltage to turn on all fingers. Adding a<br />

poly or diffused resistor between each drain <strong>and</strong> the common input or increasing the drain<br />

contact-to-gate spacing will increase the ballast resistance, but care must be taken not to<br />

push Vt2 beyond the dielectric threshold level. Another way to increase the ballast<br />

resistance is to decrease the number or reduce the size <strong>of</strong> active-metal <strong>and</strong> interlayer<br />

metal-metal contacts, but this technique is dangerous because it increases the current<br />

density per contact <strong>and</strong> thus thermal failure may occur at the contacts. As an alternative to<br />

adjusting Rsb , Vt1 can be reduced through gate bounce or, if possible, by floating the<br />

substrate. If Vt1 is reduced to the point where it is less than Vsb , i.e., the BVceo <strong>of</strong> the<br />

parasitic bipolar transistor, then turn-on <strong>of</strong> all fingers is assured. Again, it is important that<br />

Vt1 not be reduced within the operating level <strong>of</strong> the IC.<br />

The analysis <strong>of</strong> one-dimensional layout variations <strong>of</strong> single-finger structures should<br />

suggest which approaches are best for device optimization. Failure analysis, including<br />

TLP leakage measurements as well as SEM (scanning electron microscopy) <strong>and</strong> EMMI<br />

(emission microscope for multilayer inspection), should be incorporated in the <strong>design</strong><br />

process to ascertain where device failures are occurring. As described in the next chapter,<br />

numerical device simulations can also be instrumental in <strong>design</strong>ing devices <strong>and</strong><br />

determining where <strong>and</strong> how devices will fail. Once the potential single-finger structures<br />

have been narrowed down to a few <strong>design</strong>s, complete multifinger ESD <strong>circuits</strong> should be<br />

laid out <strong>and</strong> fabricated for testing. The structures should be connected to simple functional<br />

<strong>circuits</strong> which are representative <strong>of</strong> the actual circuitry being protected in the final IC<br />

<strong>design</strong> to verify that not only is the <strong>protection</strong> circuit surviving an ESD stress but also is<br />

truly protecting the internal circuit from ESD.

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