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characterization, modeling, and design of esd protection circuits

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3.1. Lattice Temperature <strong>and</strong> Temperature-Dependent Models 59<br />

effects to a reasonable degree. For example, some <strong>of</strong> the low-field/transverse-field models<br />

which do include temperature dependence use only a simple scaling factor to model surface<br />

mobility.<br />

In the high-field mobility region, the empirical Caughey-Thomas expression [48] is used<br />

to account for velocity saturation. For electrons, the high-field mobility is<br />

µ n<br />

=<br />

µ S, n<br />

⎛µ Sn , EII⎞ 1 ⎜---------------- sat ⎟<br />

⎝ ⎠<br />

β ⎛ n⎞<br />

⎜ +<br />

⎟<br />

⎝ ⎠<br />

1<br />

v n<br />

– β ⁄ n<br />

, (3.24)<br />

where µ S,n is the low-field mobility, E || is the electric field in the direction <strong>of</strong> current flow,<br />

sat<br />

vn is the saturation velocity, <strong>and</strong> βn is a fitting parameter. An analogous equation is used<br />

for hole mobility. Degradation <strong>of</strong> mobility at high electric fields is due to high-energy<br />

carriers interacting with optical phonons rather than acoustic phonons. Inherent in this<br />

situation is that the carriers are no longer in thermal equilibrium with the lattice, i.e.,<br />

electrons <strong>and</strong> holes have their own characteristic temperatures. However, since the carrier<br />

temperature is related to the local electric field [42], an expression such as Eq. (3.24)<br />

allows us to calculate mobility degradation without solving for carrier temperature (such<br />

<strong>modeling</strong> still neglects the non-local effects <strong>of</strong> extremely high fields on carrier transport).<br />

This mobility model is implicitly dependent on the lattice temperature through the<br />

temperature-dependent saturation-velocity [29],<br />

sat<br />

vn 7<br />

= 2.4×10<br />

⁄ ( 1 + 0.8exp ( T ⁄ 600)<br />

) . (3.25)<br />

Modeling <strong>of</strong> impact-ionization (II) generation <strong>of</strong> carriers is essential for the simulation <strong>of</strong><br />

breakdown <strong>and</strong> snapback phenomena in ESD <strong>protection</strong> MOSFETs. The II generation rate<br />

can be expressed as<br />

G II<br />

=<br />

Jn Jp αn ⋅ ------- + α<br />

q p ⋅ ------q<br />

, (3.26)<br />

in which αn <strong>and</strong> αp are the electron <strong>and</strong> hole ionization coefficients, respectively, with<br />

units <strong>of</strong> cm -1 . An expression for these coefficients commonly used in numerical<br />

simulation is [46]<br />

αnp ,<br />

=<br />

∞<br />

αnp ,<br />

crit<br />

β np<br />

⎛ ⎛E⎞ , ⎞<br />

np ,<br />

⋅ exp⎜–<br />

⎜--------- ⎟ ⎟ , (3.27)<br />

⎝ ⎝ EII ⎠ ⎠

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