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characterization, modeling, and design of esd protection circuits

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4.3. Device Failure Results 129<br />

actually agrees quite well with experiment, in contrast to the st<strong>and</strong>ard structure used for<br />

calibration, which has a CGS <strong>of</strong> 4.5µm. This good agreement suggests that structures with<br />

lower contact-to-gate spacing may be better suited for use in calibration <strong>of</strong> the thermal<br />

boundary conditions.<br />

While the power to failure appears to continually increase with CGS, Fig. 4.51 shows that<br />

the current to failure tends to level <strong>of</strong>f for contact-to-gate spacings greater than about<br />

6µm. This indicates that the added power in structures with larger CGS is being dissipated<br />

in the increased active regions <strong>of</strong> the device (the regions between the gate <strong>and</strong> the source/<br />

drain contacts). Since the increase in voltage to failure at higher CGS is dropped across<br />

the active regions, the results also suggest that the failure point is always in the intrinsic<br />

region <strong>of</strong> the device because the voltage across the drain junction <strong>and</strong> the current density<br />

in the junction--<strong>and</strong> therefore the power generation in the junction--at the time <strong>of</strong> failure<br />

I f / Amps<br />

1.0<br />

0.8<br />

0.6<br />

0.4<br />

0.2<br />

0.0<br />

0 2 4 6 8 10<br />

Source <strong>and</strong> Drain Contact-to-Gate Spacing / µm<br />

Fig. 4.51 Experimental current-to-failure, If , vs. contact-to-gate spacing for<br />

50 ⁄ 0.75µm test structures subjected to 200ns TLP pulses.

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