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characterization, modeling, and design of esd protection circuits

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20 Chapter 2. ESD Circuit Characterization <strong>and</strong> Design Issues<br />

+<br />

V i<br />

-<br />

R i =1MΩ<br />

S<br />

DUT<br />

Fig. 2.4 Circuit model for the CDM. A ground pin <strong>of</strong> the device under<br />

test (DUT) is charged to a voltage V i , after which the switch S<br />

is thrown, removing the voltage source <strong>and</strong> connecting a<br />

different pin <strong>of</strong> the device to ground.<br />

while failing another, say the charged-device model [19]. It is even possible for a circuit to<br />

survive one level <strong>of</strong> a test while failing at a lower level <strong>of</strong> the same test. One well-known<br />

case is the failure window <strong>of</strong> the HBM: a device will pass HBM stresses less than 1kV <strong>and</strong><br />

greater than 2kV up to 6kV, but will tend to fail at stresses between 1kV <strong>and</strong> 2kV. Such a<br />

case is described in [20].<br />

There are many limitations to using the classical models to characterize ESD robustness <strong>of</strong><br />

<strong>circuits</strong>. Foremost is that the models <strong>of</strong>fer only restricted insight as to how the <strong>protection</strong><br />

<strong>circuits</strong> work <strong>and</strong> how <strong>and</strong> where they fail. The input pulses <strong>of</strong> the HBM <strong>and</strong> other models<br />

are complex <strong>and</strong> very brief, so the response <strong>of</strong> the circuit is also complex <strong>and</strong> is hard to<br />

measure. And although the dependence <strong>of</strong> increased leakage on the test stress level is<br />

tabulated, ESD qualifiers are normally only interested in whether the leakage is above or<br />

below a predefined failure level. In short, the classical models are used as a black box with<br />

a voltage-level stimulus <strong>and</strong> a simple “pass or fail” response.<br />

Transmission-line pulsing, a relatively new ESD <strong>characterization</strong> method, provides a way<br />

<strong>of</strong> opening up this black box. Since this technique was first introduced in 1985 [21] it has<br />

become widely used to characterize <strong>and</strong> <strong>design</strong> ESD <strong>circuits</strong> [4,8,22-24]. A schematic <strong>of</strong> a<br />

TLP experiment is shown in Fig. 2.5, in which a coaxial transmission line is charged up to<br />

a certain voltage <strong>and</strong> then discharged into an I/O pin <strong>of</strong> the device with the ground or<br />

R s<br />

L s

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