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Suprem-III User´s Manual
IONFILE1 Char Specifies the primary ion implant range data file for implants using the
analytic distributions. This file will be searched for the range statistics
when implanting atomic antimony.
(unit: )
(default: the last file specified.)
(synonym: )
IONFILE2 Char Specifies the secondary ion implant range data file for implants using the
analytic distrbutions. This file will be searched for the range statistics
when implanting the compound ions containing antimony.
(unit: )
(default: the last file specified.)
(synonym: )
K.A Num Used in R. Reif’s epitaxial doping model (see reference in EPITAXY
statement). K.a is a thermodynamic constant relating the dopant
species concentration in solid silicon and adsorbed layer.
(unit: centimeters)
(default: the current value.)
(synonym: )
K.MF Num Used in R. Reif’s epitaxial doping model (see reference in EPITAXY
statement). K.mf is a kinetic coefficient controlling the rate-limiting
step of the dopant incorporation process.
(unit: centimetersˆ(-2) minutesˆ(-1) atmospheresˆ(-1))
(default: the current value.)
(synonym: )
K.P Num Used in R. Reif’s epitaxial doping model (see reference in EPITAXY
statement). K.p is a thermodynamic constant relating the dopant
species concentration in solid silicon and gas phase.
(unit: centimetersˆ(-3) atmospheresˆ(-1))
(default: the current value.)
(synonym: )
NAME Char The name of the impurity.
(unit: )
(default: the last name specified.)
(synonym: )
NITRIDE Log Specifies that the material dependent parameters apply to antimony in silicon
nitride.
(unit: )
(default: false.)
(synonym: )
OXIDE Log Specifies that the material dependent parameters apply to antimony in silicon
dioxide.
(unit: )
(default: false.)
(synonym: )
POLYSILI Log Specifies that the material dependent parameters apply to antimony in
polysilicon.
(unit: )
(default: false.)
(synonym: )