Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
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<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />
PAR.H.E Num The activation energy of the parabolic oxidation rate for temperatures<br />
above the breakpoint set by P.BREAKP.<br />
(unit: electron volts.)<br />
(default: the current value.)<br />
(synonym: )<br />
PAR.L.0 Num The pre-exponential constant of the parabolic oxidation rate for temperatures<br />
below the breakpoint set by P.BREAKP.<br />
(unit: micronsˆ2/minute.)<br />
(default: the current value.)<br />
(synonym: )<br />
PAR.L.E Num The activation energy of the parabolic oxidation rate for temperatures below<br />
the breakpoint set by P.BREAKP.<br />
(unit: electron volts.)<br />
(default: the current value.)<br />
(synonym: )<br />
PAR.PDEP Num The pressure dependence factor for the parabolic oxidation rate.<br />
(unit: )<br />
(default: the current value.)<br />
(synonym: )<br />
PRESSURE Num The default ambient pressure.<br />
(unit: atmospheres.)<br />
(default: the current value.)<br />
(synonym: )<br />
THINOX.0 Num The pre-exponential constant of the thin oxide growth rate parameter.<br />
(unit: microns/minute.)<br />
(default: the current value.)<br />
(synonym: )<br />
THINOX.E Num The activation energy of the thin oxide growth rate parameter.<br />
(unit: electron volts.)<br />
(default: the current value.)<br />
(synonym: )<br />
THINOX.L Num The characteristic length of the thin oxide growth rate parameter.<br />
(unit: microns.)<br />
(default: the current value.)<br />
(synonym: )<br />
Log Specifies that the linear growth rate and thin oxide growth rate parameters<br />
apply to orientation silicon.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
Log Specifies that the linear growth rate and thin oxide growth rate parameters<br />
apply to orientation silicon.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
Log Specifies that the linear growth rate and thin oxide growth rate parameters<br />
apply to orientation silicon.<br />
(unit: )<br />
(default: false.)