Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
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<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />
22. Etch Statement<br />
-----------------------<br />
The ETCH statement is used to etch a specified material from the top of the current structure.<br />
ETCH<br />
( SILICON | POLYSILI | OXIDE | NITRIDE | ALUMINUM )<br />
[ ( THICKNES= | ALL ) ]<br />
Name Type Description<br />
---- ---- -----------<br />
ALL Log Specifies that all of the specified material is to be etched.<br />
(unit: )<br />
(default: true.)<br />
(synonym: )<br />
ALUMINUM Log Specifies that the material to be etched is aluminum.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
NITRIDE Log Specifies that the material to be etched is silicon nitride.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
OXIDE Log Specifies that the material to be etched is silicon dioxide.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
POLYSILI Log Specifies that the material to be etched is poly-crystalline silicon.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
SILICON Log Specifies that the material to be etched is single crystal silicon.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
THICKNESS Num The amount of the material to be etched.<br />
(unit: microns.)<br />
(default: the surface layer thickness.)<br />
(synonym: AMOUNT)<br />
The ETCH statement is used to etch a specified amount of the specified material from the top of the existing<br />
structure. If the material at the top of the structure is not the material specified then no etching takes place. If<br />
the amount to be etched is not specified then the entire layer is removed.
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