Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
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<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />
16. Deposition Statement<br />
-------------------------------<br />
The DEPOSITION statement is used to deposit a specified material on top of the current structure. The<br />
material may be doped or undoped.<br />
DEPOSITION<br />
THICKNES=<br />
( SILICON ( | | )<br />
| POLYSILI<br />
TEMPERAT= [ PRESSURE= | GRAINSIZ= ]<br />
| OXIDE<br />
| NITRIDE<br />
| ALUMINUM<br />
)<br />
[ DX= ] [ XDX= ] [ SPACES= ] [ MIN.DX= ]<br />
[ CONCENTRATION=<br />
(ANTIMONY | ARSENIC | BORON | PHOSPHOR)<br />
]<br />
Name Type Description<br />
---- ---- -----------<br />
ALUMINUM Log Specifies that the material to be deposited is aluminum.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
ANTIMONY Log Specifies that the deposited material is to be uniformly doped with antimony.<br />
(unit: )<br />
(default: false.)<br />
(synonym: SB)<br />
ARSENIC Log Specifies that the deposited material is to be uniformly doped with arsenic.<br />
(unit: )<br />
(default: false.)<br />
(synonym: AS)<br />
BORON Log Specifies that the deposited material is to be uniformly doped with boron.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
CONCENTR Num The concentration at which the deposited material is to be uniformly<br />
doped.<br />
(unit: atoms/cmˆ3.)<br />
(default: 0.0)<br />
(synonym: )<br />
DX Num The nominal grid spacing to be used in the deposited layer at the location<br />
associated with the XDX parameter.<br />
(unit: microns.)<br />
(default: the nominal dx of the top layer if its material is the same as is
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