Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
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<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />
(synonym: )<br />
The three oxidation model statements, DRYO2, WETO2, and NITROGEN, use identical parameters, differing<br />
only in the values assigned. The parameters NIOX.C, NIOX.E, and NIOX.F are used in modeling the oxidation<br />
of silicon nitride while the others deal with the oxidation of single and polycrystalline silicon.<br />
The effects of chlorine in the ambient gas on the oxidation rate of silicon are currently modeled by an empirical<br />
expression whose only variable is defined by the L.CLDEP and P.CLDEP for the linear and parabolic rates<br />
respectively. To date no convenient function is available to calculate the chlorine dependence as a function of temperature<br />
and amount of chlorine present, therefor a table of values defines the chlorine dependence factors at those<br />
temperatures and percentages for which reliable data is available. For those temperatures and chlorine percentages<br />
between the values in the table, linear interpolation is employed to calculate the value used. For temperatures or percentages<br />
outside the range of values present in the table, the values whose conditions most nearly match the current<br />
conditions are used. For example, if the current conditions are a temperature of 1175 degrees with three percent<br />
chlorine, but the highest temperature entry in the table is 1150 degrees and the nearest chlorine percentages are for<br />
two and four percent, then a value halfway between the values at 1150 degrees and two and four percent chlorine<br />
will be used.
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