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Suprem III - Stanford Technology CAD Home Page

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-44-<br />

<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />

24. Implant Statement<br />

---------------------------<br />

The IMPLANT statement is used to simulate the ion-implantation of impurities into the structure. Four<br />

types of implantation models are available, a numerical method based on the Boltzman transport equation, and three<br />

analytical methods based on simple Gaussian, two sided Gaussian, or Pearson type-IV distributions.<br />

IMPLANT<br />

DOSE= ENERGY=<br />

( ANTIMONY | ARSENIC | BF2 | BORON | PHOSPHOR )<br />

( GAUSSIAN<br />

| 2-GAUSSI<br />

| PEARSON<br />

| ( BOLTZMAN [ MINSTEPS= ] [ AT.WT= ] [ AT.NUMB= ] )<br />

)<br />

Name Type Description<br />

---- ---- -----------<br />

ANTIMONY Log Specifies that the ion to be implanted is antimony.<br />

(unit: )<br />

(default: false.)<br />

(synonym: SB)<br />

ARSENIC Log Specifies that the ion to be implanted is arsenic.<br />

(unit: )<br />

(default: false.)<br />

(synonym: AS)<br />

AT .NUMB Num The atomic number of the ion to be implanted.<br />

(unit: )<br />

(default: The last value specified in the corresponding impurity coefficient<br />

statement)<br />

(synonym: )<br />

AT .WT Num The atomic weight of the ion to be implanted.<br />

(unit: amu)<br />

(default: The last value specified in the corresponding impurity coefficient<br />

statement)<br />

(synonym: AT.MASS)<br />

BF2 Log Specifies that the ion to be implanted is boron-difluoride.<br />

(unit: )<br />

(default: false.)<br />

(synonym: )<br />

BOLTZMAN Log Specifies that the Boltzman transport model is to be used in simulating<br />

the implantation.<br />

(unit: )<br />

(default: false.)<br />

(synonym: )

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