Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
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<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />
24. Implant Statement<br />
---------------------------<br />
The IMPLANT statement is used to simulate the ion-implantation of impurities into the structure. Four<br />
types of implantation models are available, a numerical method based on the Boltzman transport equation, and three<br />
analytical methods based on simple Gaussian, two sided Gaussian, or Pearson type-IV distributions.<br />
IMPLANT<br />
DOSE= ENERGY=<br />
( ANTIMONY | ARSENIC | BF2 | BORON | PHOSPHOR )<br />
( GAUSSIAN<br />
| 2-GAUSSI<br />
| PEARSON<br />
| ( BOLTZMAN [ MINSTEPS= ] [ AT.WT= ] [ AT.NUMB= ] )<br />
)<br />
Name Type Description<br />
---- ---- -----------<br />
ANTIMONY Log Specifies that the ion to be implanted is antimony.<br />
(unit: )<br />
(default: false.)<br />
(synonym: SB)<br />
ARSENIC Log Specifies that the ion to be implanted is arsenic.<br />
(unit: )<br />
(default: false.)<br />
(synonym: AS)<br />
AT .NUMB Num The atomic number of the ion to be implanted.<br />
(unit: )<br />
(default: The last value specified in the corresponding impurity coefficient<br />
statement)<br />
(synonym: )<br />
AT .WT Num The atomic weight of the ion to be implanted.<br />
(unit: amu)<br />
(default: The last value specified in the corresponding impurity coefficient<br />
statement)<br />
(synonym: AT.MASS)<br />
BF2 Log Specifies that the ion to be implanted is boron-difluoride.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
BOLTZMAN Log Specifies that the Boltzman transport model is to be used in simulating<br />
the implantation.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )