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-137- Suprem-III User´s Manual Suprem-III simulation after the channel implant, gate oxide growth, poly deposition and doping. Phosphorus diffusion from the poly gate into the gate oxide is evident.
-138- Suprem-III User´s Manual ********************************* *** Suprem-III *** *** version 1B rev. 8628 *** ********************************* Tue Oct 27 15:51:52 1987 Commands input from file: s3ex1b.in 1... Title SUPREM-III Example 1. NMOS Silicon Gate 2... Comment Gate region. 3... $ File s3ex1b 4... Comment Initialize silicon substrate. 5... Initialize Structure=s3e1as 6... Comment Implant Arsenic for source/drain regions. 7... Implant Arsenic Dose=5E15 Energy=150 8... Comment Drive-in Arsenic and re-oxidize source/drain regions. 9... Diffusion Temperature=1000 Time=30 DryO2 10... Comment Etch contact holes to gate, source, and drain regions. 11... Etch Oxide 12... Comment Deposit Phosphorus doped SiO2 using CVD. 13... Deposit Oxide Thickness=.7500 Phosphorus Concentration=1.E21 14... Comment Increase the diffusivity of phosphorus in oxide by 15... $ two orders of magnitude. 16... Phosphorus Oxide Dix.0=4.56E7 17... Comment Reflow glass to smooth surface and dope contact holes. 18... Diffusion Temperature=1000 Time=30 19... Comment Reopen contact holes. 20... Etch Oxide 21... Comment Deposit Aluminum. 22... Deposit Aluminum Thickness=1.2 Spaces=10 23... Comment Plot the chemical impurity distributions at this point. 24... Print Layer 25... Plot Chemical Boron Xmax=2.5 Clear Âxis Linetype=2 26... Plot Chemical Arsenic Xmax=2.5 ˆClear Âxis Linetype=3 27... Plot Chemical Phosphorus Xmax=2.5 ˆClear Âxis Linetype=6 28... Plot Chemical Net Xmax=2.5 ˆClear Axis 29... Comment Save the structure. 30... Save Structure File=s3e1bs 31... Stop End of SUPREM-III Example 1.
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