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Suprem III - Stanford Technology CAD Home Page

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-21-<br />

<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />

DIP.E Num The activation energy of the diffusion coefficient of the impurity diffusing<br />

with positive vacancies.<br />

(unit: electron volts.)<br />

(default: the current value.)<br />

(synonym: )<br />

DIX.0 Num The pre-exponential constant of the diffusion coefficient of the impurity<br />

diffusing with neutral vacancies.<br />

(unit: micronsˆ2/minute.)<br />

(default: the current value.)<br />

(synonym: )<br />

DIX.E Num The activation energy of the diffusion coefficient of the impurity diffusing<br />

with neutral vacancies.<br />

(unit: electron volts.)<br />

(default: the current value.)<br />

(synonym: )<br />

ELECT.ST Num The electric stopping power of the impurity in the specified material.<br />

(unit: KeV/micron.)<br />

(default: the current value.)<br />

(synonym: )<br />

ENTROPY Num The entropy factor. Used to calculate the equilibrium segregation factor<br />

at polysilicon grain boundaries.<br />

(unit: )<br />

(default: the current value.)<br />

(synonym: )<br />

FII.0 Num The pre-exponential constant of the fractional partial-interstitialcy contribution.<br />

(unit: (microns/minute)ˆ(-1/2))<br />

(default: the current value.)<br />

(synonym: )<br />

FII.E Num The activation energy of the fractional partial-interstitialcy contribution.<br />

(unit: electron volts.)<br />

(default: the current value.)<br />

(synonym: )<br />

HEAT.SEG Num The activation energy of the equilibrium segregation factor at polysilicon<br />

grain boundaries.<br />

(unit: electron volts.)<br />

(default: the current value.)<br />

(synonym: )<br />

IONFILE1 Char Specifies the primary ion implant range data file for implants using the<br />

analytic distributions. This file will be searched for the range statistics<br />

when implanting atomic boron.<br />

(unit: )<br />

(default: the last file specified.)<br />

(synonym: )<br />

IONFILE2 Char Specifies the secondary ion implant range data file for implants using the<br />

analytic distributions. This file will be searched for the range statistics<br />

when implanting BF2 ions.<br />

(unit: )<br />

(default: the last file specified.)<br />

(synonym: )

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