Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
Suprem III - Stanford Technology CAD Home Page
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<strong>Suprem</strong>-<strong>III</strong> User´s Manual<br />
(synonym: )<br />
DIX.0 Num The pre-exponential constant of the diffusion coefficient of the impurity<br />
diffusing with neutral vacancies.<br />
(unit: micronsˆ2/minute.)<br />
(default: the current value.)<br />
(synonym: )<br />
DIX.E Num The activation energy of the diffusion coefficient of the impurity diffusing<br />
with neutral vacancies.<br />
(unit: electron volts.)<br />
(default: the current value.)<br />
(synonym: )<br />
DONOR Log Specifies that the impurity is a donor in silicon.<br />
(unit: )<br />
(default: the current value.)<br />
(synonym: )<br />
ELECT.ST Num The electric stopping power of the impurity in the specified material.<br />
(unit: KeV/micron.)<br />
(default: the current value.)<br />
(synonym: )<br />
ENTROPY Num The entropy factor. Used to calculate the equilibrium segregation factor<br />
at polysilicon grain boundaries.<br />
(unit: )<br />
(default: the current value.)<br />
(synonym: )<br />
FII.0 Num The pre-exponential constant of the fractional partial-interstitialcy contribution.<br />
(unit: (microns/minute)ˆ(-1/2))<br />
(default: the current value.)<br />
(synonym: )<br />
FII.E Num The activation energy of the fractional partial-interstitialcy contribution.<br />
(unit: electron volts.)<br />
(default: the current value.)<br />
(synonym: )<br />
HEAT.SEG Num The activation energy of the equilibrium segregation factor at polysilicon<br />
grain boundaries.<br />
(unit: electron volts.)<br />
(default: the current value.)<br />
(synonym: )<br />
IMPLANT Log Specifies that the impurity clustering coefficients apply to the impurity<br />
from an implanted source.<br />
(unit: )<br />
(default: false.)<br />
(synonym: )<br />
IONFILE1 Char Specifies the primary ion implant range data file for implants using the<br />
analytic distributions. This file will be searched for the range statistics<br />
when implanting atomic phosphorus.<br />
(unit: )<br />
(default: the last file specified.)<br />
(synonym: )