Bulletin 2012/02 - European Patent Office
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(C25D) I.1(2)<br />

(21) 10168657.4 (22) 07.07.2010<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO SE SI SK SM TR<br />

BA ME RS<br />

(54) • Poröse elektrogeformte Hülle für Mustererzeugung<br />

und ihr Herstellungsverfahren<br />

• Porous electroformed shell for patterning<br />

and manufacturing method thereof<br />

• Coque électroformée poreuse pour son<br />

procédé de formation et de fabrication<br />

(71) Moltex Co., Ltd., 273-2 Kyereuk-Ri, Miyang-<br />

Myeon, Anseong, Gyeonggi-Do 456-843, KR<br />

(72) Sung, Kie-Moon, 463-914, Gyeonggi-do, KR<br />

Weon, Man-Jae, 456-763, Gyeonggi-Do, KR<br />

Lee, Kyung-Ho, 142-882, Seoul, KR<br />

Park, Young-Min, 446-772, Gyeonggi-Do,<br />

KR<br />

(74) Bertsch, Florian Oliver, Kraus & Weisert<br />

<strong>Patent</strong>- und Rechtsanwälte Thomas-Wimmer-Ring<br />

15, 80539 München, DE<br />

C25D 1/10 → (51) C25D 1/08<br />

(51) C25D 3/58 (11) 2 405 034 A1<br />

(25) Ja (26) En<br />

(21) 10748805.8 (22) 04.03.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) JP 2010/053524 04.03.2010<br />

(87) WO 2010/101212 2010/36 10.09.2010<br />

(30) 04.03.2009 JP 2009050438<br />

(54) • ELEKTROPLATTIERUNGSBAD AUS EINER<br />

KUPFER-ZINK-LEGIERUNG UND PLAT-<br />

TIERUNGSVERFAHREN DAMIT<br />

• COPPER-ZINC ALLOY ELECTROPLATING<br />

BATH AND METHOD OF PLATING USING<br />

SAME<br />

• BAIN D'ÉLECTRO-PLACAGE D'ALLIAGE DE<br />

CUIVRE ET DE ZINC ET PROCÉDÉ DE<br />

PLACAGE AU MOYEN DE CELUI-CI<br />

(71) Bridgestone Corporation, 10-1, Kyobashi 1chome<br />

Chuo-ku, Tokyo 104-8340, JP<br />

(72) WADA, Yukiko, Kodaira-shi Tokyo 187-0031,<br />

JP<br />

(74) Lamb, Martin John Carstairs, Marks & Clerk<br />

LLP 90 Long Acre, London WC2E 9RA, GB<br />

C25D 11/12 → (51) C25D 17/10<br />

C25D 11/24 → (51) C25D 17/10<br />

C25D 13/00 → (51) C25D 13/10<br />

(51) C25D 13/10 (11) 2 405 035 A1<br />

C25D 13/00 C25D 13/18<br />

(25) Ja (26) En<br />

(21) 10748442.0 (22) 17.<strong>02</strong>.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) JP 2010/000965 17.<strong>02</strong>.2010<br />

(87) WO 2010/100839 2010/36 10.09.2010<br />

(30) <strong>02</strong>.03.2009 JP 2009048474<br />

(54) • ZUSAMMENSETZUNG ZUR BEHANDLUNG<br />

VON METALLOBERFLÄCHEN, VERFAHREN<br />

ZUR BEHANDLUNG VON METALLOBERF-<br />

LÄCHEN MIT DER ZUSAMMENSETZUNG<br />

UND BESCHICHTUNGSFILM ZUR<br />

BEHANDLUNG VON METALLOBERFLÄ-<br />

CHEN MIT DER ZUSAMMENSETZUNG<br />

UND DEM VERFAHREN<br />

• COMPOSITION FOR TREATING SURFACE<br />

OF METAL, METHOD FOR TREATING<br />

SURFACE OF METAL USING THE COM-<br />

POSITION, AND COATING FILM FOR<br />

TREATING SURFACE OF METAL UTILIZING<br />

THE COMPOSITION AND THE METHOD<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

• COMPOSITION DE TRAITEMENT DE SUR-<br />

FACE MÉTALLIQUE, PROCÉDÉ DE TRAI-<br />

TEMENT DE SURFACE MÉTALLIQUE<br />

UTILISANT LA COMPOSITION, ET FILM DE<br />

REVÊTEMENT DE TRAITEMENT DE SUR-<br />

FACE MÉTALLIQUE UTILISANT LA COM-<br />

POSITION ET LE PROCÉDÉ<br />

(71) Nihon Parkerizing Co., Ltd., 15-1 Nihonbashi<br />

1-chome Chuo-ku, Tokyo 103-0<strong>02</strong>7, JP<br />

(72) KAWAGOSHI, Ryosuke, Tokyo 103-0<strong>02</strong>7, JP<br />

YABE, Kosei, Tokyo 103-0<strong>02</strong>7, JP<br />

(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />

Arabellastraße 4, 81925 München, DE<br />

C25D 13/18 → (51) C25D 13/10<br />

C25D 13/20 → (51) C23C 22/12<br />

(51) C25D 17/10 (11) 2 405 036 A1<br />

B29C 33/38 C25D 11/12<br />

C25D 11/24 G<strong>02</strong>B 1/11<br />

(25) Ja (26) En<br />

(21) 10748493.3 (22) <strong>02</strong>.03.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) JP 2010/001403 <strong>02</strong>.03.2010<br />

(87) WO 2010/100894 2010/36 10.09.2010<br />

(30) 05.03.2009 JP 20090525<strong>02</strong><br />

(54) • VERFAHREN ZUR HERSTELLUNG EINER<br />

FORM UND ELEKTRODENSTRUKTUR<br />

DAFÜR<br />

• MOLD MANUFACTURING METHOD AND<br />

ELECTRODE STRUCTURE FOR USE<br />

THEREIN<br />

• PROCÉDÉ DE FABRICATION DE MOULE ET<br />

STRUCTURE D'ÉLECTRODE À UTILISER<br />

DANS CELUI-CI<br />

(71) Sharp Kabushiki Kaisha, 22-22, Nagaike-cho<br />

Abeno-ku, Osaka-shi, Osaka 545-8522, JP<br />

(72) HAYASHI, Hidekazu, Osaka 545-8522, JP<br />

Taguchi,Tokio, Osaka 545-8522, JP<br />

TSUDA,Kazuhiko, Osaka 545-8522, JP<br />

(74) Müller - Hoffmann & Partner, <strong>Patent</strong>anwälte<br />

Innere Wiener Strasse 17, 81667 München,<br />

DE<br />

(51) C30B 7/00 (11) 2 405 037 A1<br />

B82B 3/00 C01B 19/00<br />

C01G 9/08 C09K 11/<strong>02</strong><br />

C30B 29/60 H01L 31/<strong>02</strong>96<br />

B82Y 30/00<br />

(25) En (26) En<br />

(21) 11007709.6 (22) 14.08.2006<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HU IE IS IT LI LT LU LV MC NL PL PT RO<br />

SE SI SK TR<br />

(30) 12.08.2005 GB 0516598<br />

(54) • Nanopartikeln<br />

• Nanoparticles<br />

• Nanoparticules<br />

(71) Nanoco Technologies Ltd, 46 Grafton Street,<br />

Manchester M13 9NT, GB<br />

(72) Pickett, Nigel, East Croyden CR0 6JQ, GB<br />

Daniels, Steven, Catterall Garstang PR3 0HA,<br />

GB<br />

O'Brien, Paul, High Peak, Cheshire SK23<br />

7RE, GB<br />

(74) Dauncey, Mark Peter, et al, Marks & Clerk<br />

LLP 1 New York Street, Manchester, M1<br />

4HD, GB<br />

(62) 06765279.2 / 1 913 182<br />

C30B 23/06 → (51) C30B 29/06<br />

(51) C30B 29/06 (11) 2 405 038 A1<br />

C30B 23/06<br />

H01L 21/203<br />

C30B 29/36<br />

241<br />

Anmeldungen<br />

Applications<br />

Demandes (<strong>02</strong>/<strong>2012</strong>) 11.01.<strong>2012</strong><br />

(25) Ja (26) En<br />

(21) 10748793.6 (22) 25.<strong>02</strong>.2010<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(86) JP 2010/053483 25.<strong>02</strong>.2010<br />

(87) WO 2010/101200 2010/36 10.09.2010<br />

(30) 06.03.2009 JP 2009052893<br />

(54) • TIEGEL, VORRICHTUNG UND VERFAHREN<br />

ZUR HERSTELLUNG VON SILICIUMCAR-<br />

BID-EINZELKRISTALLEN<br />

• CRUCIBLE, APPARATUS, AND METHOD<br />

FOR PRODUCING SILICON CARBIDE SIN-<br />

GLE CRYSTALS<br />

• CREUSET, DISPOSITIF ET PROCÉDÉ DE<br />

PRODUCTION DE MONOCRISTAUX DE<br />

CARBURE DE SILICIUM<br />

(71) Nippon Steel Corporation, 6-1, Marunouchi<br />

2-chome Chiyoda-ku, Tokyo 100-8071, JP<br />

(72) KATSUNO, Masakazu, Tokyo 100-8071, JP<br />

FUJIMOTO, Tatsuo, Tokyo 100-8071, JP<br />

TSUGE, Hiroshi, Tokyo 100-8071, JP<br />

NAKABAYASHI, Masashi, Tokyo 100-8071,<br />

JP<br />

(74) Vossius & Partner, Siebertstrasse 4, 81675<br />

München, DE<br />

C30B 29/36 → (51) C30B 29/06<br />

C30B 29/60 → (51) C30B 7/00<br />

C40B 40/06 → (51) C12N 15/10<br />

C40B 40/08 → (51) C12N 15/10<br />

(51) D01H 5/22 (11) 2 405 039 A1<br />

D01H 5/44 D01H 5/56<br />

(25) En (26) En<br />

(21) 10007018.4 (22) 07.07.2010<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO SE SI SK SM TR<br />

BA ME RS<br />

(54) • Streckvorrichtung für Spinnmaschine<br />

• Drafting device for spinning machinery<br />

• Dispositif d'étirage pour machine de filature<br />

(71) Vantex Technologies GmbH, Miesingstr. 11,<br />

83727 Schliersee, DE<br />

(72) Micheletti, Umberto, 83727 Schliersee, DE<br />

(74) Rings, Rolf, RINGS & SPRANGER PATEN-<br />

TANWÄLTE Postfach 86 06 09, 81633<br />

München, DE<br />

D01H 5/44 → (51) D01H 5/22<br />

D01H 5/56 → (51) D01H 5/22<br />

(51) D<strong>02</strong>G 3/40 (11) 2 405 040 A1<br />

D03D 15/08 D04B 1/18<br />

D04B 21/16<br />

(25) En (26) En<br />

(21) 10007077.0 (22) 09.07.2010<br />

(84) AL AT BE BG CH CY CZ DE DK EE ES FI FR<br />

GB GR HR HU IE IS IT LI LT LU LV MC MK<br />

MT NL NO PL PT RO SE SI SK SM TR<br />

BA ME RS<br />

(54) • Verfahren zur Herstellung eines penetrationsbeständigen<br />

Stoffes, das Garnbruch<br />

während des Herstellungsverfahrens verhindert<br />

• A penetration-resistant fabric manufacturing<br />

method which prevents yarn breakage<br />

during the manufacturing process<br />

• Tissu résistant à la pénétration, procédé de<br />

fabrication qui empêche la cassure des fils<br />

pendant le procédé de fabrication

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