Bulletin 2012/02 - European Patent Office
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Bulletin 2012/02 - European Patent Office

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(H01H) II.1(1)<br />

(73) Arçelik Anonim Sirketi, E5 Ankara Asfalti<br />

Uzeri Tuzla, 34950 Istanbul, TR<br />

(72) YILMAZ, Namik, 34950 Istanbul, TR<br />

OZKAHRAMAN, Hakan, 34950 Istanbul, TR<br />

ERENAY, Kerem, 34950 Istanbul, TR<br />

TEZDUYAR, Latif, 34950 Istanbul, TR<br />

SONMEZOZ, Fehmi, 34950 Istanbul, TR<br />

H01H 83/22 → (51) H01H 71/66<br />

H01J 1/304 → (51) H01J 9/<strong>02</strong><br />

(51) H01J 9/<strong>02</strong> (11) 2 079 095 B1<br />

H01J 31/12 H01J 1/304<br />

(25) En (26) En<br />

(21) 08150191.8 (22) 11.01.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

(43) 15.07.2009<br />

(54) • Verfahren zur Herstellung einer Feldemissionsanzeige<br />

• Method of manufacturing a field emission<br />

display<br />

• Procédé de fabrication d'un dispositif<br />

d'affichage à émission de champ<br />

(73) UVIS Light AB, Erik Dahlbergsgatan 11A,<br />

411 26 Göteborg, SE<br />

(72) Hu, Qiu-Hong, 413 14 Göteborg, SE<br />

Komitov, Lachezar, 411 29 Göteborg, SE<br />

(74) Nilsson, Lars-Magnus, et al, Awapatent AB P.<br />

O. Box 11394, 404 28 Göteborg, SE<br />

H01J 9/24 → (51) H01J 17/49<br />

(51) H01J 17/49 (11) 1 492 149 B1<br />

H01J 9/24 C03C 4/00<br />

C03C 10/00<br />

(25) En (26) En<br />

(21) 04077433.3 (22) 24.<strong>02</strong>.1997<br />

(84) DE FR GB<br />

(43) 29.12.2004<br />

(30) 20.08.1996 KR 9634416<br />

(54) • Barriere in einer Farbplasma-Anzeigetafel<br />

und Herstellungsverfahren derselben<br />

• Barrier in color plasma display panel and<br />

method for manufacturing the same<br />

• Barrière dans un panneau de visualisation à<br />

plasma en couleurs et méthode de fabrication<br />

(73) LG Electronics, Inc., 20, Yoido-Dong,<br />

Youngdungpo-gu, Seoul, KR<br />

(72) Kim, Kun Woo, Kumi-si Kyungsangbukdo,<br />

KR<br />

(74) Palmer, Jonathan R., et al, Boult Wade<br />

Tennant Verulam Gardens 70 Gray's Inn<br />

Road, London WC1X 8BT, GB<br />

(62) 97301177.8 / 0 825 631<br />

(51) H01J 19/42 (11) 2 077 573 B1<br />

H01J 29/18 H01J 29/<strong>02</strong><br />

H01J 29/08 H01J 31/12<br />

(25) En (26) En<br />

(21) 090<strong>02</strong>957.0 (22) 15.01.1999<br />

(84) DE FR GB IT NL<br />

(43) 08.07.2009<br />

(30) 16.01.1998 US 8129<br />

(54) • Struktur und Herstellung von Flachbildschirmanzeigen<br />

mit speziell angeordnetem<br />

Spacer<br />

• Structure and fabrication of flat panel<br />

display with specially arranged spacer<br />

• Structure et fabrication d'écran plat avec<br />

espaceur spécialement arrangé<br />

(73) Canon Kabushiki Kaisha, 30-2 Shimomaruko<br />

3-chome Ohta-ku, Tokyo 146-8501, JP<br />

(72) Spindt, Christopher J., Menlo Park, CA<br />

94<strong>02</strong>5, US<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

Field, John E., Dorrington, CA 95223, US<br />

(74) TBK, Bavariaring 4-6, 80336 München, DE<br />

(62) 999<strong>02</strong>333.6 / 1 055 247<br />

H01J 29/<strong>02</strong> → (51) H01J 19/42<br />

H01J 29/08 → (51) H01J 19/42<br />

H01J 29/18 → (51) H01J 19/42<br />

H01J 31/12 → (51) H01J 9/<strong>02</strong><br />

H01J 31/12 → (51) H01J 19/42<br />

(51) H01J 37/32 (11) 1 729 322 B1<br />

H01B 7/30<br />

(25) En (26) En<br />

(21) 06252784.1 (22) 30.05.2006<br />

(84) DE FR GB<br />

(43) 06.12.2006<br />

(30) 31.05.2005 US 685853 P<br />

(54) • Plasmaverarbeitungseinrichtung<br />

• Plasma processing device<br />

• Dispositif de traitement au plasma<br />

(73) NGK Insulators, Ltd., 2-56 Suda-cho,<br />

Mizuho-ku, Nagoya-City, Aichi Pref. 467-<br />

8530, JP<br />

(72) Tomita, Yasumitsu, NGK Insulators, Ltd.,<br />

Nagoya City Aichi-ken 467-8530, JP<br />

Unno, Yutaka, NGK Insulators, Ltd., Nagoya<br />

City Aichi-ken 467-8530, JP<br />

(74) Paget, Hugh Charles Edward, et al, Mewburn<br />

Ellis LLP 33 Gutter Lane, London EC2V 8AS,<br />

GB<br />

H01J 37/32 → (51) H05H 1/54<br />

H01J 49/06 → (51) G01N 27/64<br />

(51) H01L 21/00 (11) 1 849 182 B1<br />

H01L 21/687<br />

(25) En (26) En<br />

(21) 06714039.2 (22) 13.<strong>02</strong>.2006<br />

(84) DE FR GB IT<br />

(43) 31.10.2007<br />

(86) JP 2006/3<strong>02</strong>898 13.<strong>02</strong>.2006<br />

(87) WO 2006/088166 2006/34 24.08.2006<br />

(30) 15.<strong>02</strong>.2005 JP 2005037805<br />

(54) • HALBLEITER-OXIDATIONSVORRICHTUNG<br />

UND VERFAHREN ZUR HERSTELLUNG<br />

VON HALBLEITERELEMENTEN<br />

• SEMICONDUCTOR OXIDATION APPAR-<br />

ATUS AND METHOD OF PRODUCING<br />

SEMICONDUCTOR ELEMENTS<br />

• APPAREIL D'OXYDATION A SEMI-<br />

CONDUCTEUR ET PROCEDE DE PRODUC-<br />

TION DES ELEMENTS A SEMI-CONDUC-<br />

TEUR<br />

(73) Ricoh Company, Ltd., 3-6, Nakamagome 1chome<br />

Ohta-ku, Tokyo 143-8555, JP<br />

(72) SATO, Shunichi, Miyagi 9892351, JP<br />

JIKUTANI, Naoto, Miyagi 9811106, JP<br />

ITOH, Akihiro, Watari-gun, Miyagi 9892324,<br />

JP<br />

UMEMOTO, Shinya, Kyoto-shi, Kyoto<br />

6018142, JP<br />

ZENNO, Yoshiaki, Kyoto-shi, Kyoto 6018142,<br />

JP<br />

YAMAMOTO, Takatoshi, Kyoto-shi, Kyoto<br />

6018142, JP<br />

(74) Leeming, John Gerard, J.A. Kemp & Co. 14<br />

South Square Gray's Inn, London WC1R 5JJ,<br />

GB<br />

H01L 21/00 → (51) H01L 21/78<br />

(51) H01L 21/<strong>02</strong> (11) 1 341 218 B1<br />

(25) En (26) En<br />

634<br />

<strong>Patent</strong>e<br />

<strong>Patent</strong>s<br />

Brevets (<strong>02</strong>/<strong>2012</strong>) 11.01.<strong>2012</strong><br />

(21) <strong>02</strong>257693.8 (22) 06.11.20<strong>02</strong><br />

(84) DE FR GB IT<br />

(43) 03.09.2003<br />

(30) 28.<strong>02</strong>.20<strong>02</strong> JP 20<strong>02</strong>054440<br />

(54) • Halbleiteranordnungsherstellungsmethode<br />

• Semiconductor device manufacturing<br />

method<br />

• Procédé de fabrication d'un dispositif<br />

semiconducteur<br />

(73) Fujitsu Semiconductor Limited, 2-10-23<br />

Shin-Yokohama, Kohoku-ku, Yokohama-shi<br />

Kanagawa 222-0033, JP<br />

(72) Kikuchi, Hideaki, c/o Fujitsu Limited, Kawasakai-shi,<br />

Kanagawa 211-8588, JP<br />

Komuro, Genichi, c/o Fujitsu Limited, Kawasakai-shi,<br />

Kanagawa 211-8588, JP<br />

(74) Fenlon, Christine Lesley, et al, Haseltine Lake<br />

LLP Lincoln House, 5th Floor 300 High<br />

Holborn, London WC1V 7JH, GB<br />

(60) 05012335.5 / 1 592 046<br />

(51) H01L 21/<strong>02</strong>7 (11) 1 901 336 B1<br />

G03F 7/20<br />

(25) Ja (26) En<br />

(21) 06732588.6 (22) 15.05.2006<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HU IE IS IT LI LT LU LV MC NL PL PT RO<br />

SE SI SK TR<br />

(43) 19.03.2008<br />

(86) JP 2006/309657 15.05.2006<br />

(87) WO 2007/004358 2007/<strong>02</strong> 11.01.2007<br />

(30) 06.07.2005 JP 2005197031<br />

(54) • BELICHTUNGSVORRICHTUNG<br />

• EXPOSURE APPARATUS<br />

• DISPOSITIF D'EXPOSITION<br />

(73) NIKON CORPORATION, 12-1, Yurakucho 1chome,<br />

Chiyoda-ku Tokyo 100-8331, JP<br />

(72) SHIRAISHI Masayuki, Tokyo 1008331, JP<br />

(74) Viering, Jentschura & Partner, Postfach 22<br />

14 43, 80504 München, DE<br />

H01L 21/<strong>02</strong>7 → (51) G03F 7/<strong>02</strong>3<br />

H01L 21/<strong>02</strong>7 → (51) H01L 21/687<br />

(51) H01L 21/04 (11) 1 641 030 B1<br />

H01L 29/78 H01L 29/24<br />

H01L 29/267<br />

(25) En (26) En<br />

(21) 05<strong>02</strong>0617.6 (22) 21.09.2005<br />

(84) DE FR GB<br />

(43) 29.03.2006<br />

(30) 28.09.2004 JP 2004280950<br />

28.09.2004 JP 2004281661<br />

28.09.2004 JP 2004281700<br />

(54) • Verfahren zur Herstellung eines Halbleiterbauelements<br />

• Method of manufacturing a semiconductor<br />

device<br />

• Procédé de fabrication d'un dispositif<br />

semi-conducteur<br />

(73) NISSAN MOTOR CO., LTD., 2 Takara-cho,<br />

Kanagawa-ku, Yokohama-shi Kanagawa-ken,<br />

JP<br />

(72) Hayashi, Tetsuya, Yokosuka-shi, Kanagawaken,<br />

JP<br />

Hoshi, Masakatsu, Yokohama-shi, Kanagawa-ken,<br />

JP<br />

Shimoida, Yoshio, Yokosuka-shi, Kanagawaken,<br />

JP<br />

Tanaka, Hideaki, Yokohama-shi, Kanagawaken,<br />

JP<br />

(74) Grünecker, Kinkeldey, Stockmair & Schwanhäusser,<br />

Anwaltssozietät Leopoldstrasse 4,<br />

808<strong>02</strong> München, DE<br />

H01L 21/20 → (51) H01S 3/098

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