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Handbook of Solvents - George Wypych - ChemTech - Ventech!

Handbook of Solvents - George Wypych - ChemTech - Ventech!

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14.6 Cosmetics and personal care products 881<br />

process is very energy efficient. Previous experiences with radiation curing technology<br />

show that the process has been successfully implemented in several industries such as paper,<br />

plastic processing, and wood coating where long term economic gains made the<br />

changes viable.<br />

Comparison <strong>of</strong> solvent-based fluoropolymer and fluorocarbon powder coating developed<br />

in Japan 4 shows that elimination <strong>of</strong> solvent is not only good for environment but also<br />

improves performance (UV stability especially is improved). The study was carried out<br />

with a very well designed testing program to evaluate the weathering performance <strong>of</strong> the<br />

material.<br />

These two technologies show that there is extensive activity to improve coil coatings<br />

with simultaneous elimination <strong>of</strong> solvents. Two recent patents contribute more information<br />

on the developments in the coil coating industry. 5,6 One problem in the industry is with the<br />

poor adhesion <strong>of</strong> the coating to steel. 2,3 A primer developed contains dipropylene glycol<br />

methyl ether and PM acetate which allows the deposition <strong>of</strong> relatively thick layers (20-40<br />

μm) without blistering and at suitable rate <strong>of</strong> processing. However, the primer has a low solids<br />

content (30-45%). 5 A new retroreflective coating was also developed 6 which is based on<br />

ethyl acrylate-styrene copolymer and contains a mixture <strong>of</strong> xylene with another aromatic<br />

hydrocarbon (Solvesso 150) at relatively low concentration (11-12%).<br />

REFERENCES<br />

1 B P Whim, P G Johnson, Directory <strong>of</strong> <strong>Solvents</strong>, Blackie Academic & Pr<strong>of</strong>essional, London, 1996.<br />

2 A L Perou, J M Vergnaud, Polym. Testing, 16, No.1, 19-31 (1997).<br />

3 G M Miasik, Surface Coatings International, 79, No.6, 258-67 (1996).<br />

4 C Sagawa, T Suzuki, T Tsujita, K Maeda, S Okamoto, Surface Coatings International, 78, No.3, 94-8<br />

(1995).<br />

5 M T Keck, R J Lewarchik, J C Allman, US Patent 5,688,598, Morton International, Inc., 1997.<br />

6 G L Crocker, R L Beam, US Patent 5,736,602, 1998.<br />

14.6 COSMETICS AND PERSONAL CARE PRODUCTS<br />

<strong>George</strong> <strong>Wypych</strong><br />

ChemTec Laboratories, Inc., Toronto, Canada<br />

Several cosmetic products contain solvents. These include nail polish, nail polish remover,<br />

fragrances, hair dyes, general cleaners, hair sprays and setting lotions. In most cases,<br />

ethanol is the only solvent. Nail polish and nail polish remover contain a large variety <strong>of</strong><br />

solvents. Several recent patents 3-6 give information on current developmental work in this<br />

area.<br />

Nitrocellulose, polyester, acrylic and methacrylic ester copolymer, formaldehyde<br />

resin, rosin, cellulose acetate butyrate are the most frequently used polymers in nail polish<br />

formulations. <strong>Solvents</strong> were selected to suit the polymer used. These include acetone,<br />

methyl acetate, ethyl acetate, butyl acetate, methyl glycol acetate, methyl ethyl ketone,<br />

methyl isobutyl ketone, toluene, xylene, isopropyl alcohol, methyl chlor<strong>of</strong>orm, and naphtha.<br />

<strong>Solvents</strong> constitute a substantial fraction <strong>of</strong> the composition usually around 70%. Reformulation<br />

is ongoing to improve the flexibility and durability <strong>of</strong> the nail polish. 3 Other<br />

efforts are directed to improve antifungal properties, 4 to eliminate ketones and formaldehyde<br />

resin (ketones because <strong>of</strong> their toxicity and irritating smell and formaldehyde resins<br />

because they contribute to dermatitis), 5 and elimination <strong>of</strong> yellowing. 6 All efforts are di-

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