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Handbook of Solvents - George Wypych - ChemTech - Ventech!

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14.8 Electronic industry 897<br />

4) special cleaning processes.<br />

In an aqueous cleaning process, 5<br />

cleaning is achieved by using water or a<br />

water-based cleaning agent. In order to<br />

avoid drying spots, rinsing is carried out<br />

with deionized water. By soldering with<br />

water-soluble solder pastes only hot water<br />

is necessary for cleaning. However, the use<br />

<strong>of</strong> an alkaline water-based cleaning agent is<br />

effective to remove more critical flux residues<br />

with low or high pressure spray in<br />

cleaning equipment.<br />

In semi-aqueous processes, 4 cleaning is carried out using a high boiling mixture <strong>of</strong> organic<br />

solvents. Rinsing is achieved by using deionized water. The organic solvents used for<br />

these cleaners are predominantly based on alkoxypropanols, terpenes, high-boiling alcohols,<br />

or mixtures <strong>of</strong> different chemistries.<br />

In applications based on solvents such as isopropanol or alkoxypropanols 6 a rinse with<br />

deionized water is not imperative, since these chemistries do not leave any residues if used<br />

for rinsing. Especially when using an uniformly boiling solvent-based cleaning agent, vapor<br />

rinsing with solvent vapor is possible. All there mentioned cleaning process will be discussed<br />

more detailed in the following sections.<br />

Less widespread applications in the electronic industry include:<br />

• Cleaning using supercritical carbon dioxide (SCF). 7<br />

• Cleaning using plasma. 7<br />

Figure 14.8.3. PCB cleaning.<br />

SCF cleaning alternative is especially useful for extremely sensitive and complex assemblies.<br />

At temperatures above 31°C and pressures above 73 bar, carbon dioxide transforms<br />

into a supercritical phase. Supercritical carbon dioxide reveals an extremely low<br />

surface tension. Consequently, the wetting <strong>of</strong> small gaps and complex assembly architectures<br />

can be achieved. However, the contamination that should be removed has to be<br />

nonpolar, and the compounds should be resistant to high pressures. Due to these basic limitations<br />

and the high costs <strong>of</strong> this cleaning process, this process does not play an important<br />

part in the electronic industry.<br />

The advantage <strong>of</strong> plasma cleaning is in almost waste-free removal <strong>of</strong> contaminations.<br />

The contaminations are transformed into carbon dioxide and water. However, this cleaning<br />

process is only suitable for removal <strong>of</strong> the small amounts <strong>of</strong> residue from the substrate surface.<br />

Combinations with aqueous cleaning processes are feasible and common in the field.<br />

14.8.2.1 Water based systems; advantages and disadvantages<br />

14.8.2.1.1 Cleaning with DI - water<br />

Cleaning without using any kind <strong>of</strong> cleaning agent in the electronic assembly process is possible<br />

when water-based fluxes are used for the soldering process. Since these aqueous<br />

fluxes are highly activated, aggressive residues occur after the soldering process. These residues<br />

have to be removed immediately to avoid severe corrosion <strong>of</strong> solder joints. The use <strong>of</strong><br />

water-based fluxes is very common in the US electronic market due to the main advantage<br />

<strong>of</strong> a large soldering process window for soldering. DI-water is used for this purpose since it<br />

is able to solubilize the polar residues. However, physical energy, such as high-spray-pres-

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