Bulletin 2010/31 - European Patent Office
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(C23C) I.1(2)<br />

AL BA MK RS<br />

(86) JP 2008/069161 22.10.2008<br />

(87) WO 2009/054420 2009/18 30.04.2009<br />

(30) 22.10.2007 JP 2007273948<br />

(54) • VERFAHREN ZUR STROMLOSEN<br />

METALLABSCHEIDUNG FÜR LEGIE-<br />

RUNGSBESCHICHTUNGSFILM UND<br />

ABSCHEIDUNGSFLÜSSIGKEIT<br />

• ELECTROLESS PLATING METHOD FOR<br />

ALLOY COATING FILM AND PLATING<br />

LIQUID<br />

• PROCÉDÉ DE DÉPÔT AUTOCATALYTIQUE<br />

POUR FILM DE REVÊTEMENT D'ALLIAGE<br />

ET LIQUIDE DE DÉPÔT<br />

(71) National Institute for Materials Science, 2-1<br />

Sengen 1-chome, Tsukuba-shi, Ibaraki 305-<br />

0047, JP<br />

(72) MURAKAMI, Hideyuki, Tsukuba-shi Ibaraki<br />

305-0047, JP<br />

MATSUBARA, Yukio, Tsukuba-shi Ibaraki<br />

305-0047, JP<br />

MORIIZUMI, Syunsuke, Tsukuba-shi Ibaraki<br />

305-0047, JP<br />

MURAKAMI, Hiromichi, Tsukuba-shi Ibaraki<br />

305-0047, JP<br />

YOSHIDA, Mikiyo, Tsukuba-shi Ibaraki 305-<br />

0047, JP<br />

(74) Calamita, Roberto, et al, Dehns St Bride's<br />

House 10 Salisbury Square, London EC4Y<br />

8JD, GB<br />

(51) C23C 22/78 (11) 2 213 767 A1<br />

(25) Ja (26) En<br />

(21) 08845169.5 (22) 10.10.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

AL BA MK RS<br />

(86) JP 2008/068430 10.10.2008<br />

(87) WO 2009/057435 2009/19 07.05.2009<br />

(30) 01.11.2007 JP 2007285491<br />

(54) • VERFAHREN ZUR HERSTELLUNG EINES<br />

ALUMINIUMGUSSES MIT OBERFLÄCHEN-<br />

REGULIERUNG<br />

• PROCESS FOR PRODUCING SURFACE-<br />

REGULATED ALUMINUM CAST<br />

• PROCÉDÉ DE PRODUCTION D'UNE PIÈCE<br />

EN ALUMINIUM COULÉE À SURFACE<br />

RÉGULARISÉE<br />

(71) Henkel AG & Co. KGaA, Henkelstrasse 67,<br />

40589 Düsseldorf, DE<br />

(72) SATOH, Hiroyuki, Tokyo 103-0027, JP<br />

WATANABE, Masaki, Tokyo 103-0027, JP<br />

OGINO, Takao, Tokyo 103-0027, JP<br />

C23C 24/04 → (51) C23C 4/08<br />

C23C 28/00 → (51) C23C 2/02<br />

C23C 28/00 → (51) C23C 14/02<br />

C23C 28/02 → (51) C23C 2/02<br />

C23C 30/00 → (51) F01N 7/16<br />

(51) C25B 1/04 (11) 2 213 768 A1<br />

C02F 1/46 C02F 1/461<br />

(25) Es (26) En<br />

(21) 08850376.8 (22) 11.11.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

AL BA MK RS<br />

(86) ES 2008/000697 11.11.2008<br />

(87) WO 2009/06<strong>31</strong>07 2009/21 22.05.2009<br />

(30) 14.11.2007 ES 200703012<br />

(54) • VERFAHREN UND VORRICHTUNG ZUR<br />

VERWENDUNG VON WASSERSTOFF<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

• METHOD AND APPARATUS FOR USING<br />

HYDROGEN<br />

• PROCÉDÉ ET APPAREIL PERMETTANT<br />

D'EXPLOITER L'HYDROGÈNE<br />

(71) Franco Gonzalez, Fidel, C/Bacardi 12-14 At.<br />

3, 08028 Barcelona, ES<br />

Miguel Sanchez, Alexandra, C/Muntaner 187<br />

bis 1°2ª, 08036 Barcelona, ES<br />

Ruiz Rodriguez, Alberto, C/Francesc Macia<br />

24, 08760 Martorell (Barcelona), ES<br />

(72) Franco Gonzalez, Fidel, 08028 Barcelona, ES<br />

Miguel Sanchez, Alexandra, 08036 Barcelona,<br />

ES<br />

Ruiz Rodriguez, Alberto, 08760 Martorell<br />

(Barcelona), ES<br />

(74) Durán Moya, Luis-Alfonso, et al, Durán-<br />

Corretjer Còrsega, 329, 08037 Barcelona, ES<br />

(51) C25B 1/08 (11) 2 213 769 A1<br />

C25B 9/20<br />

(25) En (26) En<br />

(21) 10275010.6 (22) 01.02.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(30) 03.02.2009 KR 20090008464<br />

(54) • Vorrichtung zur Herstellung von Wasserstoff-Sauerstoff<br />

• Hydrogen-oxygen generating apparatus<br />

• Appareil pour la production d'un mélange<br />

hydrogène-oxygène<br />

(71) Hwang, Boo-Sung, 402 New Sun-kyung<br />

Plaza 146-1, Imae 2 dong, Bun-dang gu<br />

Seong-nam si, Kyung-ki do, KR<br />

(72) Hwang, Boo-Sung, Kyung-ki do, KR<br />

(74) Hocking, Adrian Niall, Albright <strong>Patent</strong>s Eagle<br />

Tower Montpellier Drive, Cheltenham GL50<br />

1TA, GB<br />

C25B 1/24 → (51) C25B 11/12<br />

C25B 9/00 → (51) C02F 1/461<br />

C25B 9/20 → (51) C25B 1/08<br />

C25B 11/04 → (51) C25B 11/12<br />

(51) C25B 11/12 (11) 2 213 770 A1<br />

C25B 1/24 C25B 11/04<br />

(25) En (26) En<br />

(21) 10152341.3 (22) 02.02.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

(30) 02.02.2009 JP 2009021157<br />

(54) • Anode zur Elektrolyse und Verfahren zum<br />

elektrolytischen Synthetisieren einer fluorhaltigen<br />

Substanz mittels der Anode zur<br />

Elektrolyse<br />

• Anode for electrolysis and method of<br />

electrolytically synthesizing fluorine-containing<br />

substance using the anode for<br />

electrolysis<br />

• Anode pour électrolyse et procédé de<br />

synthèse électrolytique d'une substance<br />

contenant du fluor à l'aide de l'anode pour<br />

électrolyse<br />

(71) PERMELEC ELECTRODE LTD., 2023-15,<br />

Endo, Fujisawa-shi, Kanagawa 252-0816, JP<br />

(72) Tasaka, Akimasa, Kyoto-shi Kyoto 610-1125,<br />

JP<br />

Uno, Masaharu, Fujisawa-shi Kanagawa 252-<br />

0816, JP<br />

Nishiki, Yoshinori, Fujisawa-shi Kanagawa<br />

252-0816, JP<br />

Furuta, Tsuneto, Fujisawa-shi Kanagawa<br />

252-0816, JP<br />

305<br />

Anmeldungen<br />

Applications<br />

Demandes (<strong>31</strong>/<strong>2010</strong>) 04.08.<strong>2010</strong><br />

(74) Grünecker, Kinkeldey, Stockmair & Schwanhäusser<br />

Anwaltssozietät, Leopoldstrasse 4,<br />

80802 München, DE<br />

(51) C25D 11/04 (11) 2 213 771 A1<br />

B82B 1/00 C25D 11/20<br />

H01B 5/16 H01R 11/01<br />

(25) Ja (26) En<br />

(21) 08854900.1 (22) 21.08.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

AL BA MK RS<br />

(86) JP 2008/064909 21.08.2008<br />

(87) WO 2009/069350 2009/23 04.06.2009<br />

(30) 30.11.2007 JP 2007<strong>31</strong>0112<br />

(54) • MIKROFEINSTRUKTUR<br />

• MICROFINE STRUCTURE<br />

• STRUCTURE MICROFINE<br />

(71) FUJIFILM Corporation, 26-30, Nishiazabu 2chome<br />

Minato-ku, Tokyo 106-00<strong>31</strong>, JP<br />

(72) HATANAKA, Yusuke, Haibaragun Shizuoka<br />

421-0302, JP<br />

HOTTA, Yoshinori, Haibaragun Shizuoka<br />

421-0302, JP<br />

UESUGI, Akio, Haibaragun Shizuoka 421-<br />

0302, JP<br />

(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />

Arabellastrasse 4, 81925 München, DE<br />

C25D 11/20 → (51) C25D 11/04<br />

(51) C25D 17/10 (11) 2 213 772 A1<br />

C22C 9/00 H01L 21/288<br />

(25) Ja (26) En<br />

(21) 08843371.9 (22) 06.10.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

AL BA MK RS<br />

(86) JP 2008/068167 06.10.2008<br />

(87) WO 2009/057422 2009/19 07.05.2009<br />

(30) 01.11.2007 JP 2007285148<br />

(54) • KUPFERANODE ODER PHOSPHORHAL-<br />

TIGE KUPFERANODE, VERFAHREN ZUR<br />

GALVANISIERUNG VON KUPFER AUF<br />

EINEM HALBLEITERWAFER UND HALB-<br />

LEITERWAFER MIT NICHT SIGNIFIKANT<br />

DARAUF ABGELAGERTEM PARTIKEL<br />

• COPPER ANODE OR PHOSPHORUS-CON-<br />

TAINING COPPER ANODE, METHOD FOR<br />

ELECTROPLATING COPPER ON SEMI-<br />

CONDUCTOR WAFER, AND SEMICON-<br />

DUCTOR WAFER WITH PARTICLE NOT<br />

SIGNIFICANTLY DEPOSITED THEREON<br />

• ANODE DE CUIVRE OU ANODE DE CUIVRE<br />

CONTENANT DU PHOSPHORE, PROCÉDÉ<br />

DE DÉPÔT ÉLECTROLYTIQUE DE CUIVRE<br />

SUR PLAQUETTE SEMI-CONDUCTRICE, ET<br />

PLAQUETTE SEMI-CONDUCTRICE SANS<br />

DÉPÔT SIGNIFICATIF DE PARTICULES<br />

SUR CELLE-CI<br />

(71) Nippon Mining & Metals Co., Ltd., 10-1,<br />

Toranomon 2-chome Minato-ku, Tokyo 105-<br />

0001, JP<br />

(72) AIBA, Akihiro, Kitaibaraki-shi Ibaraki <strong>31</strong>9-<br />

1535, JP<br />

TAKAHASHI, Hirofumi, Kitaibaraki-shi Ibaraki<br />

<strong>31</strong>9-1535, JP<br />

(74) Hoarton, Lloyd Douglas Charles, Forrester &<br />

Boehmert Pettenkoferstrasse 20-22, 80336<br />

Munich, DE<br />

(51) D01H 4/48 (11) 2 213 773 A1<br />

D01H 15/00 B65H 67/08<br />

(25) En (26) En<br />

(21) 09178273.0 (22) 08.12.2009

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