Bulletin 2010/31 - European Patent Office
Bulletin 2010/31 - European Patent Office
Bulletin 2010/31 - European Patent Office
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(C23C) II.1(1)<br />
Bucci, David Vincent, Simpsonville, SC<br />
29681, US<br />
(74) Szary, Anne Catherine, GE International Inc.<br />
Global <strong>Patent</strong> Operation - Europe 15 John<br />
Adam Street, London WC2N 6LU, GB<br />
(51) C23C 8/02 (11) 1 544 <strong>31</strong>7 B1<br />
C23C 8/36 F16G 5/16<br />
(25) Ja (26) En<br />
(21) 03798439.0 (22) 22.09.2003<br />
(84) DE GB NL<br />
(43) 22.06.2005<br />
(86) JP 2003/012081 22.09.2003<br />
(87) WO 2004/029320 2004/15 08.04.2004<br />
(30) 24.09.2002 JP 2002277898<br />
15.04.2003 JP 200<strong>31</strong>09727<br />
15.04.2003 JP 200<strong>31</strong>09728<br />
(54) • VERFAHREN ZUM NITRIEREN VON<br />
METALLRINGEN UND VORRICHTUNG<br />
DAFÜR<br />
• METHOD OF NITRIDING METAL RING AND<br />
APPARATUS THEREFOR<br />
• PROCEDE DE NITRURATION D'UN<br />
ANNEAU METALLIQUE ET APPAREIL<br />
CORRESPONDANT<br />
(73) HONDA GIKEN KOGYO KABUSHIKI KAISHA,<br />
1-1, Minami Aoyama 2-chome, Minato-ku,<br />
Tokyo 107-8556, JP<br />
(72) SUZUKI, Teiji, Sayama-shi, Saitama 350-<br />
13<strong>31</strong>, JP<br />
SARUYAMA, Masaomi, Sayama-shi, Saitama<br />
350-13<strong>31</strong>, JP<br />
TAKAGAKI, Masashi, Sayama-shi, Saitama<br />
350-13<strong>31</strong>, JP<br />
NARITA, Naoki, Sayama-shi, Saitama 350-<br />
13<strong>31</strong>, JP<br />
(74) Cheyne, John Robert Alexander M., Haseltine<br />
Lake LLP Redcliff Quay, 120 Redcliff Street<br />
Bristol BS1 6HU, GB<br />
C23C 8/36 → (51) C23C 8/02<br />
C23C 14/02 → (51) G02B 5/08<br />
C23C 14/04 → (51) B32B 9/00<br />
C23C 14/06 → (51) C23C 14/34<br />
(51) C23C 14/08 (11) 1 847 632 B1<br />
C23C 14/28 C23C 14/34<br />
C23C 14/58<br />
(25) En (26) En<br />
(21) 07002426.0 (22) 05.02.2007<br />
(84) DE FI FR GB IT<br />
(43) 24.10.2007<br />
(30) 17.04.2006 US 405020<br />
(54) • Vorrichtung und Verfahren zur Herstellung<br />
von p-Halbleiterfilmen auf Zinkoxidbasis<br />
• Apparatus and process for the preparation<br />
of p-type semiconductor zinc oxide films<br />
• Appareillage et méthode de fabrication de<br />
films d'oxyde de zinc semi-conducteur de<br />
type p<br />
(73) Imra America, Inc., 1044 Woodridge Avenue,<br />
Ann Arbor, MI 48105, US<br />
(72) Liu, Bing, Michigan, US<br />
Hu, Zhendong, Ann Arbor Michigan, US<br />
Che, Yong, Ann Arbor Michigan, US<br />
Uehara, Yuzuru, Ann Arbor Michigan, US<br />
(74) Epping - Hermann - Fischer, <strong>Patent</strong>anwaltsgesellschaft<br />
mbH Ridlerstrasse 55, 80339<br />
München, DE<br />
(60) 09170202.7<br />
10158794.7<br />
(51) C23C 14/12 (11) 1 8<strong>31</strong> 421 B1<br />
C23C 14/24<br />
H05B 33/10<br />
H01L 51/40<br />
Europäisches <strong>Patent</strong>blatt<br />
<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />
<strong>Bulletin</strong> européen des brevets<br />
(25) En (26) En<br />
(21) 05813907.2 (22) 26.10.2005<br />
(84) DE GB NL<br />
(43) 12.09.2007<br />
(86) US 2005/038767 26.10.2005<br />
(87) WO 2006/052467 2006/20 18.05.2006<br />
(30) 09.11.2004 US 984667<br />
(54) • STEUERUNG DES AUFBRINGENS VON<br />
VERDAMPFTEM ORGANISCHEM MATE-<br />
RIAL<br />
• CONTROLLING THE APPLICATION OF<br />
VAPORIZED ORGANIC MATERIAL<br />
• REGULATION DE L'APPLICATION D'UN<br />
MATERIAU ORGANIQUE VAPORISE<br />
(73) Global OLED Technology LLC, 1209 Orange<br />
Street, Wilmington, Delaware 19801, US<br />
(72) GRACE, Jeremy, Matthew, Penfield, New<br />
York 14526, US<br />
LONG, Michael, Hilton, New York 14468, US<br />
BOROSON, Michael, Louis, Rochester, New<br />
York 14610, US<br />
ZHANG, Jinmei, Pittsford, New York 14534,<br />
US<br />
KOPPE, Bruce, Edward, Calendonia, New<br />
York 14423, US<br />
PALONE, Thomas, William, Rochester, New<br />
York 14626, US<br />
REDDEN, Neil, Peter, Sodus Point, New York<br />
14555, US<br />
(74) Wibbelmann, Jobst, et al, Wuesthoff &<br />
Wuesthoff <strong>Patent</strong>- und Rechtsanwälte<br />
Schweigerstrasse 2, 81541 München, DE<br />
(60) 10004193.8<br />
C23C 14/24 → (51) C23C 14/12<br />
C23C 14/28 → (51) C23C 14/08<br />
(51) C23C 14/34 (11) 1 757 712 B1<br />
C04B 35/50 G11B 7/24<br />
G11B 7/26<br />
(25) Ja (26) En<br />
(21) 05719882.2 (22) 03.03.2005<br />
(84) CH LI<br />
(43) 28.02.2007<br />
(86) JP 2005/003578 03.03.2005<br />
(87) WO 2005/121393 2005/51 22.12.2005<br />
(30) 09.06.2004 JP 2004171205<br />
(54) • SPUTTERTARGET, OPTISCHES INFORMA-<br />
TIONSAUFZEICHNUNGSMEDIUM UND<br />
HERSTELLUNGSVERFAHREN DAFÜR<br />
• SPUTTERING TARGET, OPTICAL INFOR-<br />
MATION RECORDING MEDIUM AND<br />
METHOD FOR PRODUCING SAME<br />
• CIBLE DE PULVÉRISATION CATHODIQUE,<br />
SUPPORT D"ENREGISTREMENT D"INFOR-<br />
MATIONS OPTIQUES ET PROCEDE DE<br />
FABRICATION DE CELUI-CI<br />
(73) Nippon Mining & Metals Co., Ltd., 10-1,<br />
Toranomon 2-chome, Minato-ku Tokyo 105-<br />
0001, JP<br />
(72) TAKAMI, H., Isohara Fact. of Nikko Mat. Co.,<br />
Ltd., Kitaibaraki-shi, Ibaraki <strong>31</strong>91535, JP<br />
YAHAGI, M., Isohara Factory of Nikko Mat.<br />
Co.,Ltd., Kitaibaraki-shi, Ibaraki <strong>31</strong>91535, JP<br />
(74) Hoarton, Lloyd Douglas Charles, et al,<br />
Forrester & Boehmert Pettenkoferstrasse 20-<br />
22, 80336 Munich, DE<br />
(51) C23C 14/34 (11) 1 846 588 B1<br />
C23C 14/06<br />
(25) Fr (26) Fr<br />
(21) 06709475.5 (22) 03.02.2006<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU LV MC NL PL PT RO<br />
SE SI SK TR<br />
(43) 24.10.2007<br />
(86) FR 2006/050094 03.02.2006<br />
(87) WO 2006/085020 2006/33 17.08.2006<br />
624<br />
<strong>Patent</strong>e<br />
<strong>Patent</strong>s<br />
Brevets (<strong>31</strong>/<strong>2010</strong>) 04.08.<strong>2010</strong><br />
(30) 08.02.2005 FR 0550358<br />
(54) • VERFAHREN ZUR HERSTELLUNG EINES<br />
SILICIUM- UND ZIRCONIUMBASIERTEN<br />
TARGETS DURCH THERMISCHES SPRÜ-<br />
HEN<br />
• METHOD FOR PREPARING BY THERMAL<br />
SPRAYING A SILICON- AND ZIRCONIUM-<br />
BASED TARGET<br />
• PROCÉDÉ D'ÉLABORATION PAR PROJEC-<br />
TION THERMIQUE D'UNE CIBLE À BASE<br />
DE SILICIUM ET DE ZIRCONIUM<br />
(73) SAINT-GOBAIN GLASS FRANCE, 18, avenue<br />
d'Alsace, 92400 Courbevoie, FR<br />
(72) NADAUD, Nicolas, F-94250 Gentilly, FR<br />
BILLIERES, Dominique, 1, Lotissement du<br />
Moulin, F-84450 Saint Saturnin les Avignon,<br />
FR<br />
(74) Colombier, Christian, Département Propriété<br />
Industrielle SAINT-GOBAIN RECHERCHE 39<br />
Quai Lucien Lefranc, 93300 Aubervilliers, FR<br />
C23C 14/34 → (51) C23C 14/08<br />
C23C 14/58 → (51) C23C 14/08<br />
C23C 16/04 → (51) B32B 9/00<br />
(51) C23C 16/34 (11) 1 727 925 B1<br />
C23C 16/452<br />
(25) De (26) De<br />
(21) 05736348.3 (22) 22.03.2005<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU MC NL PL PT RO SE<br />
SI SK TR<br />
(43) 06.12.2006<br />
(86) DE 2005/000549 22.03.2005<br />
(87) WO 2005/09<strong>31</strong>25 2005/40 06.10.2005<br />
(30) 23.03.2004 DE 102004015217<br />
(54) • VERFAHREN ZUR AUSBILDUNG DÜNNER<br />
SCHICHTEN AUS SILIZIUMNITRID AUF<br />
SUBSTRATOBERFLÄCHEN<br />
• METHOD FOR FORMING THIN SILICON<br />
NITRIDE LAYERS ON THE SURFACE OF<br />
SUBSTRATES<br />
• PROCEDE POUR FORMER DE FINES<br />
COUCHES DE NITRURE DE SILICIUM SUR<br />
DES SURFACES SUPPORTS<br />
(73) Fraunhofer-Gesellschaft zur Förderung der<br />
angewandten Forschung e.V., Hansastrasse<br />
27c, 80686 München, DE<br />
(72) ROGLER, Daniela, 01277 Dresden, DE<br />
HOPFE, Volkmar, 01814 Kleingiesshübel, DE<br />
MÄDER, Gerrit, 01187 Dresden, DE<br />
(74) Pfenning, Meinig & Partner GbR, <strong>Patent</strong>- und<br />
Rechtsanwälte An der Frauenkirche 20,<br />
01067 Dresden, DE<br />
C23C 16/452 → (51) C23C 16/34<br />
(51) C23C 16/46 (11) 1 570 107 B1<br />
C30B 25/12 C30B 25/10<br />
C30B <strong>31</strong>/12 H05B 6/02<br />
F27B 14/06 H01L 21/00<br />
(25) En (26) En<br />
(21) 02808222.0 (22) 10.12.2002<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR IE IT LI LU MC NL PT SE SI SK TR<br />
(43) 07.09.2005<br />
(86) IT 2002/000773 10.12.2002<br />
(87) WO 2004/05<strong>31</strong>87 2004/26 24.06.2004<br />
(54) • SUSZEPTORSYSTEM<br />
• SUSCEPTOR SYSTEM<br />
• SYSTEME DE SUSCEPTEUR ET APPAREIL<br />
L'UTILISANT<br />
(73) E.T.C. Epitaxial Technology Center SRL,<br />
Corso Italia, 207, 95127 Catania, IT<br />
(72) MACCALLI, Giacomo, Nicolao, I-20026<br />
Novate Milanese, IT<br />
KORDINA, Olle, Oldsmar, FL 34677, US