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Bulletin 2010/31 - European Patent Office

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(C23C) II.1(1)<br />

Bucci, David Vincent, Simpsonville, SC<br />

29681, US<br />

(74) Szary, Anne Catherine, GE International Inc.<br />

Global <strong>Patent</strong> Operation - Europe 15 John<br />

Adam Street, London WC2N 6LU, GB<br />

(51) C23C 8/02 (11) 1 544 <strong>31</strong>7 B1<br />

C23C 8/36 F16G 5/16<br />

(25) Ja (26) En<br />

(21) 03798439.0 (22) 22.09.2003<br />

(84) DE GB NL<br />

(43) 22.06.2005<br />

(86) JP 2003/012081 22.09.2003<br />

(87) WO 2004/029320 2004/15 08.04.2004<br />

(30) 24.09.2002 JP 2002277898<br />

15.04.2003 JP 200<strong>31</strong>09727<br />

15.04.2003 JP 200<strong>31</strong>09728<br />

(54) • VERFAHREN ZUM NITRIEREN VON<br />

METALLRINGEN UND VORRICHTUNG<br />

DAFÜR<br />

• METHOD OF NITRIDING METAL RING AND<br />

APPARATUS THEREFOR<br />

• PROCEDE DE NITRURATION D'UN<br />

ANNEAU METALLIQUE ET APPAREIL<br />

CORRESPONDANT<br />

(73) HONDA GIKEN KOGYO KABUSHIKI KAISHA,<br />

1-1, Minami Aoyama 2-chome, Minato-ku,<br />

Tokyo 107-8556, JP<br />

(72) SUZUKI, Teiji, Sayama-shi, Saitama 350-<br />

13<strong>31</strong>, JP<br />

SARUYAMA, Masaomi, Sayama-shi, Saitama<br />

350-13<strong>31</strong>, JP<br />

TAKAGAKI, Masashi, Sayama-shi, Saitama<br />

350-13<strong>31</strong>, JP<br />

NARITA, Naoki, Sayama-shi, Saitama 350-<br />

13<strong>31</strong>, JP<br />

(74) Cheyne, John Robert Alexander M., Haseltine<br />

Lake LLP Redcliff Quay, 120 Redcliff Street<br />

Bristol BS1 6HU, GB<br />

C23C 8/36 → (51) C23C 8/02<br />

C23C 14/02 → (51) G02B 5/08<br />

C23C 14/04 → (51) B32B 9/00<br />

C23C 14/06 → (51) C23C 14/34<br />

(51) C23C 14/08 (11) 1 847 632 B1<br />

C23C 14/28 C23C 14/34<br />

C23C 14/58<br />

(25) En (26) En<br />

(21) 07002426.0 (22) 05.02.2007<br />

(84) DE FI FR GB IT<br />

(43) 24.10.2007<br />

(30) 17.04.2006 US 405020<br />

(54) • Vorrichtung und Verfahren zur Herstellung<br />

von p-Halbleiterfilmen auf Zinkoxidbasis<br />

• Apparatus and process for the preparation<br />

of p-type semiconductor zinc oxide films<br />

• Appareillage et méthode de fabrication de<br />

films d'oxyde de zinc semi-conducteur de<br />

type p<br />

(73) Imra America, Inc., 1044 Woodridge Avenue,<br />

Ann Arbor, MI 48105, US<br />

(72) Liu, Bing, Michigan, US<br />

Hu, Zhendong, Ann Arbor Michigan, US<br />

Che, Yong, Ann Arbor Michigan, US<br />

Uehara, Yuzuru, Ann Arbor Michigan, US<br />

(74) Epping - Hermann - Fischer, <strong>Patent</strong>anwaltsgesellschaft<br />

mbH Ridlerstrasse 55, 80339<br />

München, DE<br />

(60) 09170202.7<br />

10158794.7<br />

(51) C23C 14/12 (11) 1 8<strong>31</strong> 421 B1<br />

C23C 14/24<br />

H05B 33/10<br />

H01L 51/40<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

(25) En (26) En<br />

(21) 05813907.2 (22) 26.10.2005<br />

(84) DE GB NL<br />

(43) 12.09.2007<br />

(86) US 2005/038767 26.10.2005<br />

(87) WO 2006/052467 2006/20 18.05.2006<br />

(30) 09.11.2004 US 984667<br />

(54) • STEUERUNG DES AUFBRINGENS VON<br />

VERDAMPFTEM ORGANISCHEM MATE-<br />

RIAL<br />

• CONTROLLING THE APPLICATION OF<br />

VAPORIZED ORGANIC MATERIAL<br />

• REGULATION DE L'APPLICATION D'UN<br />

MATERIAU ORGANIQUE VAPORISE<br />

(73) Global OLED Technology LLC, 1209 Orange<br />

Street, Wilmington, Delaware 19801, US<br />

(72) GRACE, Jeremy, Matthew, Penfield, New<br />

York 14526, US<br />

LONG, Michael, Hilton, New York 14468, US<br />

BOROSON, Michael, Louis, Rochester, New<br />

York 14610, US<br />

ZHANG, Jinmei, Pittsford, New York 14534,<br />

US<br />

KOPPE, Bruce, Edward, Calendonia, New<br />

York 14423, US<br />

PALONE, Thomas, William, Rochester, New<br />

York 14626, US<br />

REDDEN, Neil, Peter, Sodus Point, New York<br />

14555, US<br />

(74) Wibbelmann, Jobst, et al, Wuesthoff &<br />

Wuesthoff <strong>Patent</strong>- und Rechtsanwälte<br />

Schweigerstrasse 2, 81541 München, DE<br />

(60) 10004193.8<br />

C23C 14/24 → (51) C23C 14/12<br />

C23C 14/28 → (51) C23C 14/08<br />

(51) C23C 14/34 (11) 1 757 712 B1<br />

C04B 35/50 G11B 7/24<br />

G11B 7/26<br />

(25) Ja (26) En<br />

(21) 05719882.2 (22) 03.03.2005<br />

(84) CH LI<br />

(43) 28.02.2007<br />

(86) JP 2005/003578 03.03.2005<br />

(87) WO 2005/121393 2005/51 22.12.2005<br />

(30) 09.06.2004 JP 2004171205<br />

(54) • SPUTTERTARGET, OPTISCHES INFORMA-<br />

TIONSAUFZEICHNUNGSMEDIUM UND<br />

HERSTELLUNGSVERFAHREN DAFÜR<br />

• SPUTTERING TARGET, OPTICAL INFOR-<br />

MATION RECORDING MEDIUM AND<br />

METHOD FOR PRODUCING SAME<br />

• CIBLE DE PULVÉRISATION CATHODIQUE,<br />

SUPPORT D"ENREGISTREMENT D"INFOR-<br />

MATIONS OPTIQUES ET PROCEDE DE<br />

FABRICATION DE CELUI-CI<br />

(73) Nippon Mining & Metals Co., Ltd., 10-1,<br />

Toranomon 2-chome, Minato-ku Tokyo 105-<br />

0001, JP<br />

(72) TAKAMI, H., Isohara Fact. of Nikko Mat. Co.,<br />

Ltd., Kitaibaraki-shi, Ibaraki <strong>31</strong>91535, JP<br />

YAHAGI, M., Isohara Factory of Nikko Mat.<br />

Co.,Ltd., Kitaibaraki-shi, Ibaraki <strong>31</strong>91535, JP<br />

(74) Hoarton, Lloyd Douglas Charles, et al,<br />

Forrester & Boehmert Pettenkoferstrasse 20-<br />

22, 80336 Munich, DE<br />

(51) C23C 14/34 (11) 1 846 588 B1<br />

C23C 14/06<br />

(25) Fr (26) Fr<br />

(21) 06709475.5 (22) 03.02.2006<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HU IE IS IT LI LT LU LV MC NL PL PT RO<br />

SE SI SK TR<br />

(43) 24.10.2007<br />

(86) FR 2006/050094 03.02.2006<br />

(87) WO 2006/085020 2006/33 17.08.2006<br />

624<br />

<strong>Patent</strong>e<br />

<strong>Patent</strong>s<br />

Brevets (<strong>31</strong>/<strong>2010</strong>) 04.08.<strong>2010</strong><br />

(30) 08.02.2005 FR 0550358<br />

(54) • VERFAHREN ZUR HERSTELLUNG EINES<br />

SILICIUM- UND ZIRCONIUMBASIERTEN<br />

TARGETS DURCH THERMISCHES SPRÜ-<br />

HEN<br />

• METHOD FOR PREPARING BY THERMAL<br />

SPRAYING A SILICON- AND ZIRCONIUM-<br />

BASED TARGET<br />

• PROCÉDÉ D'ÉLABORATION PAR PROJEC-<br />

TION THERMIQUE D'UNE CIBLE À BASE<br />

DE SILICIUM ET DE ZIRCONIUM<br />

(73) SAINT-GOBAIN GLASS FRANCE, 18, avenue<br />

d'Alsace, 92400 Courbevoie, FR<br />

(72) NADAUD, Nicolas, F-94250 Gentilly, FR<br />

BILLIERES, Dominique, 1, Lotissement du<br />

Moulin, F-84450 Saint Saturnin les Avignon,<br />

FR<br />

(74) Colombier, Christian, Département Propriété<br />

Industrielle SAINT-GOBAIN RECHERCHE 39<br />

Quai Lucien Lefranc, 93300 Aubervilliers, FR<br />

C23C 14/34 → (51) C23C 14/08<br />

C23C 14/58 → (51) C23C 14/08<br />

C23C 16/04 → (51) B32B 9/00<br />

(51) C23C 16/34 (11) 1 727 925 B1<br />

C23C 16/452<br />

(25) De (26) De<br />

(21) 05736348.3 (22) 22.03.2005<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HU IE IS IT LI LT LU MC NL PL PT RO SE<br />

SI SK TR<br />

(43) 06.12.2006<br />

(86) DE 2005/000549 22.03.2005<br />

(87) WO 2005/09<strong>31</strong>25 2005/40 06.10.2005<br />

(30) 23.03.2004 DE 102004015217<br />

(54) • VERFAHREN ZUR AUSBILDUNG DÜNNER<br />

SCHICHTEN AUS SILIZIUMNITRID AUF<br />

SUBSTRATOBERFLÄCHEN<br />

• METHOD FOR FORMING THIN SILICON<br />

NITRIDE LAYERS ON THE SURFACE OF<br />

SUBSTRATES<br />

• PROCEDE POUR FORMER DE FINES<br />

COUCHES DE NITRURE DE SILICIUM SUR<br />

DES SURFACES SUPPORTS<br />

(73) Fraunhofer-Gesellschaft zur Förderung der<br />

angewandten Forschung e.V., Hansastrasse<br />

27c, 80686 München, DE<br />

(72) ROGLER, Daniela, 01277 Dresden, DE<br />

HOPFE, Volkmar, 01814 Kleingiesshübel, DE<br />

MÄDER, Gerrit, 01187 Dresden, DE<br />

(74) Pfenning, Meinig & Partner GbR, <strong>Patent</strong>- und<br />

Rechtsanwälte An der Frauenkirche 20,<br />

01067 Dresden, DE<br />

C23C 16/452 → (51) C23C 16/34<br />

(51) C23C 16/46 (11) 1 570 107 B1<br />

C30B 25/12 C30B 25/10<br />

C30B <strong>31</strong>/12 H05B 6/02<br />

F27B 14/06 H01L 21/00<br />

(25) En (26) En<br />

(21) 02808222.0 (22) 10.12.2002<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR IE IT LI LU MC NL PT SE SI SK TR<br />

(43) 07.09.2005<br />

(86) IT 2002/000773 10.12.2002<br />

(87) WO 2004/05<strong>31</strong>87 2004/26 24.06.2004<br />

(54) • SUSZEPTORSYSTEM<br />

• SUSCEPTOR SYSTEM<br />

• SYSTEME DE SUSCEPTEUR ET APPAREIL<br />

L'UTILISANT<br />

(73) E.T.C. Epitaxial Technology Center SRL,<br />

Corso Italia, 207, 95127 Catania, IT<br />

(72) MACCALLI, Giacomo, Nicolao, I-20026<br />

Novate Milanese, IT<br />

KORDINA, Olle, Oldsmar, FL 34677, US

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