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Bulletin 2010/31 - European Patent Office

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(H01H) I.1(2)<br />

(84) CH DE FR LI<br />

(30) 16.05.2005 JP 2005142057<br />

(54) • Gasisolierte Hochspannungsanlage<br />

• Gas-insulated equipment<br />

• Equipement haute tension à isolation<br />

gazeuse<br />

(71) Mitsubishi Denki K.K., 7-3, Marunouchi 2chome<br />

Chiyoda-ku, Tokyo 100-8<strong>31</strong>0, JP<br />

(72) Hama, Hiroyuki, Tokyo Tokyo 100-8<strong>31</strong>0, JP<br />

Sadakuni, Hitoshi, Tokyo Tokyo 100-8<strong>31</strong>0,<br />

JP<br />

Otsuka, Takuya, Tokyo Tokyo 100-8<strong>31</strong>0, JP<br />

Inami, Kiyoshi, Tokyo Tokyo 100-8<strong>31</strong>0, JP<br />

Nagao, Eiichi, Tokyo Tokyo 100-8<strong>31</strong>0, JP<br />

(74) Popp, Eugen, Meissner, Bolte & Partner GbR<br />

Postfach 86 06 24, 81633 München, DE<br />

(62) 06010100.3 / 1 724 802<br />

(51) H01H 50/02 (11) 2 214 192 A2<br />

(25) En (26) En<br />

(21) 10000607.1 (22) 21.01.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

AL BA RS<br />

(30) 02.02.2009 JP 2009021438<br />

(54) • Elektromagnetisches Relais<br />

• Electromagnetic relay<br />

• relais electromagnetique<br />

(71) Anden Co., Ltd., 10-banchi 1-chome,<br />

Sasame-cho Anjo-city Aichi 446-8503, JP<br />

(72) Kamiya, Makoto, Anjo-city Aici 446-8503, JP<br />

Ozaki, Manabu, Anjo-city, Aichi-pref., 446-<br />

8503, JP<br />

(74) Kuhnen & Wacker, <strong>Patent</strong>- und Rechtsanwaltsbüro<br />

Prinz-Ludwig-Strasse 40A, 85354<br />

Freising, DE<br />

H01J 1/63 → (51) C09K 11/64<br />

H01J 9/02 → (51) B01J 21/18<br />

(51) H01J 11/02 (11) 2 214 193 A1<br />

(25) Ja (26) En<br />

(21) 08851775.0 (22) 12.11.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

AL BA MK RS<br />

(86) JP 2008/003278 12.11.2008<br />

(87) WO 2009/066424 2009/22 28.05.2009<br />

(30) 21.11.2007 JP 2007301492<br />

(54) • PLASMAANZEIGETAFEL<br />

• PLASMA DISPLAY PANEL<br />

• ÉCRAN D'AFFICHAGE À PLASMA<br />

(71) Panasonic Corporation, 1006, Oaza Kadoma,<br />

Kadoma-shi Osaka 571-8501, JP<br />

(72) MIZOKAMI, Kaname, Osaka 540-6207, JP<br />

ISHINO, Shinichiro, Osaka 540-6207, JP<br />

SAKAMOTO, Koyo, Osaka 540-6207, JP<br />

SHIOKAWA, Akira, Osaka 540-6207, JP<br />

KADOU, Hiroyuki, Osaka 540-6207, JP<br />

OOE, Yoshinao, Osaka 540-6207, JP<br />

KAWARAZAKI, Hideji, Osaka 540-6207, JP<br />

UETANI, Kazuo, Osaka 540-6207, JP<br />

(74) Pautex Schneider, Nicole Véronique, et al,<br />

Novagraaf International SA 25, avenue du<br />

Pailly, 1220 Les Avanchets - Geneva, CH<br />

(51) H01J 37/04 (11) 2 214 194 A1<br />

H01J 37/09 H01J 37/302<br />

H01J 37/<strong>31</strong>7<br />

(25) En (26) En<br />

(21) 10450006.1 (22) 27.01.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

AL BA RS<br />

(30) 28.01.2009 EP 09450018<br />

(54) • Verfahren zur Herstellung einer Vorrichtung<br />

mit Mehrstrahlen-Ablenkanordnung mit<br />

Elektroden<br />

• Method for producing a multi-beam<br />

deflector array device having electrodes<br />

• Procédé pour la fabrication d'un dispositif<br />

de réseau de déflecteurs à plusieurs<br />

faisceaux doté d'électrodes<br />

(71) IMS Nanofabrication AG, Schreygasse 3,<br />

1020 Vienna, AT<br />

(72) Platzgummer, Elmar, 1090 Wien, AT<br />

Fragner, Heinrich, 1180 Wien, AT<br />

(74) <strong>Patent</strong>anwaltskanzlei Matschnig & Forsthuber<br />

OG, Siebensterngasse 54, 1071 Wien, AT<br />

H01J 37/09 → (51) H01J 37/04<br />

H01J 37/302 → (51) H01J 37/04<br />

H01J 37/<strong>31</strong>7 → (51) H01J 37/04<br />

H01J 37/32 → (51) C23C 14/56<br />

H01J 37/32 → (51) H01L 21/3065<br />

H01J 37/34 → (51) C23C 14/34<br />

H01J 37/34 → (51) C23C 14/56<br />

(51) H01J 61/12 (11) 2 214 195 A2<br />

(25) En (26) En<br />

(21) 10151137.6 (22) 20.01.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

AL BA RS<br />

(30) 29.01.2009 JP 2009018628<br />

(54) • Quecksilberfreie Bogenentladungsröhre für<br />

Entladungslampeneinheit<br />

• Mercury-free arc tube for discharge lamp<br />

unit<br />

• Tube d'arc sans mercure pour unité de<br />

lampe à décharge<br />

(71) Koito Manufacturing Co., Ltd., 8-3, Takanawa<br />

4-chome, Minato-ku, Tokyo 108-8711,<br />

JP<br />

(72) Takagaki, Michio, Shizuoka-shi Shizuoka, JP<br />

Homma, Akira, Shizuoka-shi Shizuoka, JP<br />

Fukuyo, Takeshi, Shizuoka-shi Shizuoka, JP<br />

(74) Grünecker, Kinkeldey, Stockmair & Schwanhäusser<br />

Anwaltssozietät, Leopoldstrasse 4,<br />

80802 München, DE<br />

(51) H01J 61/92 (11) 2 214 196 A1<br />

F21S 8/00 F21V 5/02<br />

(25) De (26) De<br />

(21) 10000756.6 (22) 26.01.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

AL BA RS<br />

(30) 28.01.2009 DE 102009006438<br />

(54) • Leuchte mit einer Gasentladungslampe<br />

• Lighting fixture with a gas discharge lamp<br />

• Dispositif d'éclairage doté d'une lampe à<br />

décharge<br />

(71) E.K.O. Energie Kosten Optimierung GmbH,<br />

Dr. Hans-Lechner-Strasse 3, 5071 Wals-<br />

Siezenheim, AT<br />

(72) Renner, Robert, 5071 Wals bei Salzburg, AT<br />

Plöbst, Siegfried, 5630 Bad Hofgastein, AT<br />

(74) Haft, von Puttkamer, Berngruber, Karakatsanis,<br />

<strong>Patent</strong>anwälte Türkenstrasse 9, 80333<br />

München, DE<br />

355<br />

Anmeldungen<br />

Applications<br />

Demandes (<strong>31</strong>/<strong>2010</strong>) 04.08.<strong>2010</strong><br />

H01L 21/00 → (51) C23C 14/50<br />

(51) H01L 21/18 (11) 2 214 197 A1<br />

H01L 21/20 H01L 21/205<br />

H01L 33/00<br />

(25) En (26) En<br />

(21) 10151354.7 (22) 22.01.<strong>2010</strong><br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MK MT<br />

NL NO PL PT RO SE SI SK SM TR<br />

AL BA RS<br />

(30) 23.01.2009 JP 2009013327<br />

(54) • Verfahren zur Herstellung einer nitridbasierten<br />

Halbleiteroptikvorrichtung<br />

• Method of Fabricating Nitride-Based Semiconductor<br />

Optical Device<br />

• Procédé de fabrication d'un dispositif<br />

optique semi-conducteur à base de nitrure<br />

(71) Sumitomo Electric Industries, Ltd., 5-33<br />

Kitahama 4-chome, Chuo-ku, Osaka-shi,<br />

Osaka 541-0041, JP<br />

(72) Enya, Yohei, Itami-shi Hyogo 664-0016, JP<br />

Yoshizumi, Yusuke, Itami-shi Hyogo 664-<br />

0016, JP<br />

Ueno, Masaki, Itami-shi Hyogo 664-0016, JP<br />

Kyono, Takashi, Itami-shi Hyogo 664-0016,<br />

JP<br />

Akita, Katsushi, Itami-shi Hyogo 664-0016,<br />

JP<br />

(74) Grünecker, Kinkeldey, Stockmair & Schwanhäusser<br />

Anwaltssozietät, Leopoldstrasse 4,<br />

80802 München, DE<br />

H01L 21/18 → (51) H01L 33/00<br />

H01L 21/20 → (51) H01L 21/18<br />

H01L 21/205 → (51) B65G 49/06<br />

H01L 21/205 → (51) H01L 21/18<br />

H01L 21/288 → (51) C25D 17/10<br />

(51) H01L 21/30 (11) 2 214 198 A2<br />

H01L 21/46 H01L 21/3205<br />

H01L 21/332 H01L 21/336<br />

H01L 21/425 H01L 29/72<br />

H01L 29/76 H01L 29/94<br />

H01L <strong>31</strong>/062<br />

(25) En (26) En<br />

(21) 10158458.9 (22) 13.08.2003<br />

(84) DE GB IT NL<br />

(30) 14.08.2002 US 218668<br />

(54) • ISOLIERTE KOMPLEMENTÄR-MOS-BAUE-<br />

LEMENTE IN EPI-LOSEM SUBSTRAT<br />

• Isolated complementary MOS devices in<br />

EPI-less substrate<br />

• Dispositif MOS complémentaire isolé dans<br />

un substrat dépourvu de couche épitaxiale<br />

(71) Advanced Analogic Technologies, Inc., 3230<br />

Scott Boulevard, Santa Clara, CA 95054, US<br />

(72) Williams, Richard K., Cupertino, CA 95014,<br />

US<br />

Cornell, Michael E., Campbell, CA 95008, US<br />

Chan, Wai Tien, Hong Kong, CN<br />

(74) Kirschner, Klaus Dieter, Puschmann Borchert<br />

Bardehle <strong>Patent</strong>anwälte Partnerschaft Bajuwarenring<br />

21, D-82041 Oberhaching, DE<br />

(62) 03788439.2 / 1 543 546<br />

H01L 21/304 → (51) B24B 9/06<br />

(51) H01L 21/3065 (11) 2 214 199 A1<br />

H01L 21/687 H01J 37/32<br />

(25) En (26) En<br />

(21) 10275003.1 (22) 20.01.<strong>2010</strong>

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