Bulletin 2010/15 - European Patent Office
Bulletin 2010/15 - European Patent Office
Bulletin 2010/15 - European Patent Office
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(G02F) II.1(1)<br />
(72) ZIMMERMAN, Scott, M., Basking Ridge, NJ<br />
07920, US<br />
BEESON, Karl, M., Princeton, NJ 08540, US<br />
ZOU, Han, Windsor, NJ 08561, US<br />
(74) Smee, Anthony James Michael, et al, Gill<br />
Jennings & Every LLP Broadgate House 7<br />
Eldon Street, London EC2M 7LH, GB<br />
(51) G02F 1/1337 (11) 1 647 857 B1<br />
G02F 1/139<br />
(25) En (26) En<br />
(21) 05109389.6 (22) 10.10.2005<br />
(84) DE FR GB<br />
(43) 19.04.2006<br />
(30) 13.10.2004 KR 2004081628<br />
(54) • Flüssigkristallanzeigevorrichtung und Herstellungsverfahren<br />
dafür<br />
• Liquid crystal display device and method of<br />
manufacturing the same<br />
• Dispositif d'affichage à cristaux liquides et<br />
son procédé de fabrication<br />
(73) Samsung Mobile Display Co., Ltd., 575 Shindong,<br />
Yeongtong-gu, Suwon-si Gyeonggido,<br />
KR<br />
(72) Jung, Tae-Hyeog, Legal & IP Team, Kiheung-<br />
Eup, Yongin-City, Kyeonggi-Do, KR<br />
Kim, Kee-Doo, Legal & IP Team, Kiheung-<br />
Eup, Yongin-City, Kyeonggi-Do, KR<br />
Heo, Hae-Jin, Legal & IP Team, Kiheung-<br />
Eup, Yongin-City, Kyeonggi-Do, KR<br />
(74) Hengelhaupt, Jürgen, Gulde Hengelhaupt<br />
Ziebig & Schneider <strong>Patent</strong>anwälte -<br />
Rechtsanwälte Wallstrasse 58/59, 10179<br />
Berlin, DE<br />
G02F 1/1337 → (51) G02F 1/1343<br />
(51) G02F 1/1343 (11) 0 731 374 B1<br />
G02F 1/1337<br />
(25) Fr (26) Fr<br />
(21) 96400396.6 (22) 26.02.1996<br />
(84) DE FR GB NL<br />
(43) 11.09.1996<br />
(30) 09.03.1995 FR 9502776<br />
(54) • Flüssigkristallanzeige mit verbessertem<br />
Sichtwinkel<br />
• Liquid crystal display with improved viewing<br />
angle<br />
• Ecran à cristaux liquides à angle de vue<br />
amélioré<br />
(73) THOMSON multimedia, 46 quai A. Le Gallo,<br />
92648 Boulogne Cédex, FR<br />
(72) Mulatier, Laurence, 92050 Paris La Défense<br />
Cedex, FR<br />
Haas, Gunther, 92050 Paris La Défense<br />
Cedex, FR<br />
Mourey, Bruno, 92050 Paris La Défense<br />
Cedex, FR<br />
(74) Ruellan-Lemonnier, Brigitte, et al, Thomson<br />
1, rue Jeanne d'Arc, 92443 Issy-les-Moulineaux<br />
Cedex, FR<br />
(51) G02F 1/139 (11) 2 068 195 B1<br />
(25) Fr (26) Fr<br />
(21) 07291466.6 (22) 06.12.2007<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU LV MC MT NL PL PT<br />
RO SE SI SK TR<br />
(43) 10.06.2009<br />
(54) • Verfahren zur Herstellung einer bistabilen<br />
Flüssigkristallzelle<br />
• Manufacturing method of a bistable liquid<br />
crystal display cell<br />
• Procédé de fabrication d'une cellule d'affichage<br />
bistable a cristal liquide<br />
(73) Nemoptic, Parc du Mérantais 1, rue Guynemer,<br />
78114 Magny-Les-Hameaux, FR<br />
(72) Vassili, V. Sergan, Carmichael, CA 95608, US<br />
Perny, Sebastien, 750<strong>15</strong> Paris, FR<br />
Europäisches <strong>Patent</strong>blatt<br />
<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />
<strong>Bulletin</strong> européen des brevets<br />
Faget, Luc, 92350 Le Plessis Robinson, FR<br />
Dozov, Ivan, 91400 Orsay, FR<br />
G02F 1/139 → (51) G02F 1/1337<br />
G03B 17/14 → (51) G02B 27/00<br />
(51) G03C 1/73 (11) 1 872 173 B1<br />
C09K 9/02 G02B 5/23<br />
C07D 279/06 C07D 311/92<br />
C07D 319/04 C07D 339/06<br />
C07D 339/08<br />
(25) En (26) En<br />
(21) 06735605.5 (22) 21.02.2006<br />
(84) DE ES FR GB IT<br />
(43) 02.01.2008<br />
(86) US 2006/006016 21.02.2006<br />
(87) WO 2006/110221 2006/42 19.10.2006<br />
(30) 08.04.2005 US 102279<br />
(54) • FOTOCHROME MATERIALIEN MIT<br />
ERWEITERTEN PI-KONJUGIERTEN SYS-<br />
TEMEN UND ZUSAMMENSETZUNGEN<br />
UND ARTIKEL DAMIT<br />
• PHOTOCHROMIC MATERIALS HAVING<br />
EXTENDED PI-CONJUGATED SYSTEMS<br />
AND COMPOSITIONS AND ARTICLES<br />
INCLUDING THE SAME<br />
• MATERIAUX PHOTOCHROMIQUES PRE-<br />
SENTANT DES SYSTEMES $G(P)-CONJU-<br />
GUES ETENDUS ET COMPOSITIONS ET<br />
ARTICLES LES COMPRENANT<br />
(73) TRANSITIONS OPTICAL, INC., 9251 Belcher<br />
Road, Pinellas Park, FL 33782, US<br />
(72) KIM, Beon-kyu, Gibsonia, Pennsylvania<br />
<strong>15</strong>044, US<br />
DENG, Jun, Murrysville, Pennsylvania<br />
<strong>15</strong>668, US<br />
XIAO, Wenjing, Murrysville, Pennsylvania<br />
<strong>15</strong>668, US<br />
VAN GEMERT, Barry, Pitcairn, Pennsylvania<br />
<strong>15</strong>140, US<br />
CHOPRA, Anu, Pittsburgh, Pennsylvania<br />
<strong>15</strong>239, US<br />
(74) Lüdcke, Joachim Moritz, et al, Fleischer,<br />
Godemeyer, Kierdorf & Partner, <strong>Patent</strong>anwälte<br />
polypatent Braunsberger Feld 29, D-<br />
51429 Bergisch Gladbach, DE<br />
(51) G03F 1/14 (11) 0 945 761 B1<br />
H01L 21/027<br />
(25) Ja (26) En<br />
(21) 97947962.3 (22) 16.12.1997<br />
(84) DE FR GB IT NL<br />
(43) 29.09.1999<br />
(86) JP 1997/004640 16.12.1997<br />
(87) WO 1998/027460 1998/25 25.06.1998<br />
(30) 16.12.1996 JP 33555996<br />
21.05.1997 JP 13084097<br />
30.05.1997 JP 14128297<br />
17.10.1997 JP 28591297<br />
(54) • VERFAHREN ZUR HERSTELLUNG EINER<br />
MEMBRANABDECKUNG UND EINE IN<br />
DIESEM VERFAHREN EINGESETZTE VOR-<br />
RICHTUNG ZUM BESCHNEIDEN DER<br />
MEMBRANE<br />
• METHOD OF MANUFACTURING A PELLI-<br />
CLE AND PELLICLE MANUFACTURING<br />
TRIMMING JIG<br />
• PROCEDE DE PRODUCTION DE PELLI-<br />
CULE ET DISPOSITIF DE DECOUPE DE<br />
PELLICULE CORRESPONDANT<br />
(73) Mitsui Chemicals, Inc., 5-2, Higashi-Shimbashi<br />
1-Chome Minato-ku, Tokyo, JP<br />
(72) KONDOU, Masahiro, Mitsui Chemicals, Inc.,<br />
Kuga-gun, Yamaguchi 740, JP<br />
FUJITA, Minoru, Mitsui Chemicals, Inc.,<br />
Kuga-gun, Yamaguchi 740, JP<br />
NAKAGAWA, Hiroaki, Mitsui Chemicals, Inc.,<br />
Kuga-gun, Yamaguchi 740, JP<br />
628<br />
<strong>Patent</strong>e<br />
<strong>Patent</strong>s<br />
Brevets (<strong>15</strong>/<strong>2010</strong>) 14.04.<strong>2010</strong><br />
KURATA, Hiroyuki, Mitsui Chemicals, Inc.,<br />
Kuga-gun, Yamaguchi 740, JP<br />
(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />
Arabellastrasse 4, 81925 München, DE<br />
(51) G03F 7/00 (11) 1 112 530 B1<br />
H05K 3/00<br />
(25) De (26) De<br />
(21) 99900049.0 (22) 14.01.1999<br />
(84) DE GB<br />
(43) 04.07.2001<br />
(86) CH 1999/000016 14.01.1999<br />
(87) WO 2000/013062 2000/10 09.03.2000<br />
(30) 28.08.1998 CH 176398<br />
(54) • VERFAHREN ZUR MIKROLOCHERZEU-<br />
GUNG<br />
• METHOD FOR PRODUCING MICRO-<br />
OPENINGS<br />
• PROCEDE DE PRODUCTION DE MICRO-<br />
ORIFICES<br />
(73) Dyconex AG, Grindelstrasse 40, 8303 Bassersdorf,<br />
CH<br />
(72) SCHMIDT, Walter, CH-8332 Russikon, CH<br />
(74) Frei, Alexandra Sarah, Frei <strong>Patent</strong>anwaltsbüro<br />
Postfach 1771, 8032 Zürich, CH<br />
(51) G03F 7/004 (11) 1 117 002 B1<br />
G03F 7/038<br />
(25) En (26) En<br />
(21) 01100188.0 (22) 17.01.2001<br />
(84) BE DE<br />
(43) 18.07.2001<br />
(30) 17.01.2000 JP 2000008229<br />
23.05.2000 JP 2000<strong>15</strong>1477<br />
03.08.2000 JP 2000235949<br />
(54) • Negativ-arbeitende Resists<br />
• Negative-working resist composition<br />
• Réserve de type négatif<br />
(73) FUJIFILM Corporation, 26-30, Nishiazabu 2chome,<br />
Minato-ku Tokyo, JP<br />
(72) Uenishi, Kazuya, Fuji Photo Film Co., Ltd.,<br />
Haibara-gun, Shizuoka, JP<br />
Adegawa, Yutaka, Fuji Photo Film Co., Ltd.,<br />
Haibara-gun, Shizuoka, JP<br />
Shirakawa, Koji, Fuji Photo Film Co., Ltd.,<br />
Haibara-gun, Shizuoka, JP<br />
(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />
Arabellastrasse 4, 81925 München, DE<br />
G03F 7/028 → (51) C12Q 1/70<br />
G03F 7/031 → (51) G03F 7/037<br />
(51) G03F 7/037 (11) 1 577 708 B1<br />
C08G 73/10 G03F 7/031<br />
G03F 7/40<br />
(25) En (26) En<br />
(21) 05005613.4 (22) <strong>15</strong>.03.2005<br />
(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />
GR HU IE IS IT LI LT LU MC NL PL PT RO SE<br />
SI SK TR<br />
(43) 21.09.2005<br />
(30) 17.03.2004 JP 2004076146<br />
(54) • Lichtempfindliche Harzzusammensetzung<br />
und deren Verwendung<br />
• Photosensitive resin composition and use<br />
of the same<br />
• Composition de résine photosensible et<br />
son utilisation<br />
(73) NITTO DENKO CORPORATION, 1-2, Shimohozumi<br />
1-chome Ibaraki-shi, Osaka, JP<br />
(72) Fujii, Hirofumi, Ibaraki-shi Osaka, JP<br />
Funada, Yasuhito, Ibaraki-shi Osaka, JP<br />
Tanigawa, Satoshi, Ibaraki-shi Osaka, JP<br />
(74) Grünecker, Kinkeldey, Stockmair & Schwanhäusser<br />
Anwaltssozietät, Leopoldstrasse 4,<br />
80802 München, DE
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